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1. 发明申请

WO2006107010A3 POSITIVE PHOTORESIST COMPOSITION, THICK FILM PHOTORESIST LAMINATE, METHOD FOR PRODUCING THICK FILM RESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL 审中-公开
标题翻译：积极光电组合物，厚膜光电陶瓷层压板，生产厚膜电阻图案的方法和生产连接端子的方法
公开(公告)号：WO2006107010A3
公开(公告)日：2007-12-27
申请号：PCT/JP2006307021
申请日：2006-03-28
申请人： TOKYO OHKA KOGYO CO LTD , MISUMI KOICHI , WASHIO YASUSHI , SENZAKI TAKAHIRO , SAITO KOJI
发明人： MISUMI KOICHI , WASHIO YASUSHI , SENZAKI TAKAHIRO , SAITO KOJI
IPC分类号： G03F7/004 , G03F7/039 , H01L21/60
CPC分类号： G03F7/0045 , G03F7/0397 , H01L24/11 , H01L24/13 , H01L2224/1146 , H01L2224/1147 , H01L2224/131 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/81192 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01057 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/15747 , H01L2924/15788 , H01L2924/3025 , H05K3/0076 , H05K3/0079 , H05K3/3452 , H01L2924/00014 , H01L2924/00
摘要： This positive photoresist composition is a positive photoresist composition for exposing to light having one or more wavelengths selected from g-rays, h-rays and i-rays, comprising: (A) a compound which generates an acid under irradiation with active rays or radiation, and (B) a resin whose solubility in an alkali is enhanced by an action of an acid, wherein the component (A) contains an onium salt (A1) having a naphthalene ring in the cation moiety.
摘要翻译：该正性光致抗蚀剂组合物是用于暴露于选自g射线，h射线和i射线的一种或多种波长的光的正性光致抗蚀剂组合物，其包含：（A）在用活性射线或辐射照射下产生酸的化合物（B）通过酸的作用使在碱中的溶解度增强的树脂，其中，成分（A）在阳离子部分含有具有萘环的鎓盐（A1）。

2. 发明申请

WO2006059757A3 PROCESS FOR PRODUCING RESIST PATTERN AND CONDUCTOR PATTERN 审中-公开
标题翻译：生产电阻图案和导体图案的方法
公开(公告)号：WO2006059757A3
公开(公告)日：2007-07-05
申请号：PCT/JP2005022255
申请日：2005-11-29
申请人： TOKYO OHKA KOGYO CO LTD , MISUMI KOICHI , SAITO KOJI , ISHIKAWA KAORU
发明人： MISUMI KOICHI , SAITO KOJI , ISHIKAWA KAORU
IPC分类号： G03F7/038 , G03F7/11
CPC分类号： G03F7/0382 , G03F7/11 , H05K3/108 , H05K3/384 , H05K2201/0317
摘要： This process for producing a resist pattern is a process for producing a resist pattern including: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) an photoresist layer consisting of a chemically amplified type negative photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to the photoresist laminate, and the step of developing the (c ) photoresist layer together with the (b) inorganic substance layer to form a resist pattern.
摘要翻译：制造抗蚀剂图案的方法是一种抗蚀剂图案的制造方法，包括以下步骤：层叠（a）具有铜的上表面的载体，（b）由无机物质层构成的无机物质层，无机物质源，和（c）由化学放大型负性光致抗蚀剂组合物构成的光致抗蚀剂层，以获得光致抗蚀剂层压体，选择性地将光或放射线照射到光致抗蚀剂层压体上的步骤，以及（c ）光致抗蚀剂层与（b）无机物质层一起形成抗蚀剂图案。

3. 发明申请

WO2004107379A1 UNBAKED LAMINATE FOR PRODUCING FRONT PLATE OF PLASMA DISPLAY DEVICE, AND METHOD FOR PRODUCING FRONT PLATE OF PLASMA DISPLAY DEVICE 审中-公开
标题翻译：用于制造等离子体显示装置的前板的联合层压板和用于生产等离子显示装置的前板的方法
公开(公告)号：WO2004107379A1
公开(公告)日：2004-12-09
申请号：PCT/JP2004/007549
申请日：2004-05-26
申请人： TOKYO OHKA KOGYO CO., LTD. , SETSUDA, Hitoshi , KUMAZAWA, Akira , OSHIO, Kiminori , OBIYA, Hiroyuki
发明人： SETSUDA, Hitoshi , KUMAZAWA, Akira , OSHIO, Kiminori , OBIYA, Hiroyuki
IPC分类号： H01J9/02
CPC分类号： H01J9/242 , H01J11/12 , H01J11/36
摘要： The present invention provides an unbaked laminate for producing a front plate (1) of a plasma display device, and a method for producing such a front plate (1). The laminate includes a burnable intermediate layer (14), and may include an unbaked dielectric layer (12A) and a photosensitive unbaked spacer material layer (16A). The burnable intermediate layer (14) positions between the dielectric layer (12) and the spacer material layer (16), and may burn up upon baking treatment, enabling removal of residues of the spacer material layer in the region subjected to its removal.
摘要翻译：本发明提供了一种用于制造等离子体显示装置的前板（1）的未烘烤层压板，以及用于制造这种前板（1）的方法。层压体包括可燃的中间层（14），并且可以包括未烘烤的电介质层（12A）和感光未烘烤间隔物材料层（16A）。可燃中间层（14）位于电介质层（12）和间隔材料层（16）之间，并且可以在烘烤处理时燃烧，从而能够去除在其去除区域中的间隔材料层的残留物。

4. 发明申请

WO2004107049A1 COMPOSITION FOR DIELECTRIC OF PLASMA DISPLAY PANEL, LAMINATE FOR DIELECTRIC, AND METHOD FOR FORMING THE DIELECTRIC 审中-公开
标题翻译：用于等离子体显示面板的电介质的组合物，用于介电层压体的组合物以及用于形成电介质的方法
公开(公告)号：WO2004107049A1
公开(公告)日：2004-12-09
申请号：PCT/JP2004/006998
申请日：2004-05-17
申请人： TOKYO OHKA KOGYO CO., LTD. , SETSUDA, Hitoshi , KUMAZAWA, Akira , OSHIO, Kiminori , OBIYA, Hiroyuki
发明人： SETSUDA, Hitoshi , KUMAZAWA, Akira , OSHIO, Kiminori , OBIYA, Hiroyuki
IPC分类号： G03F7/00
CPC分类号： H01J11/12 , C03C17/34 , C03C17/3405 , C03C2217/445 , C03C2217/475 , H01J9/02 , H01J11/38
摘要： A composition for a dielectric of a plasma display panel laminating a plurality of layers, includes: a lower layer composition containing inorganic powder and a binder resin, an upper layer composition containing inorganic powder, a binder resin, a photopolymerizable monomer and a photopolymerization initiator, the upper layer composition being provided above the lower layer, and an intermediate layer composition containing a thermally decomposable resin, the intermediate layer composition being provided between the lower layer and the upper layer.
摘要翻译：用于层叠多层的等离子体显示面板的电介质组合物包括：含有无机粉末和粘合剂树脂的下层组合物，含有无机粉末的上层组合物，粘合剂树脂，光聚合性单体和光聚合引发剂，上层组合物设置在下层上方，中间层组合物含有可热分解的树脂，中间层组合物设置在下层和上层之间。

5. 发明申请

WO2004069959A3 PROCESS FOR REFINING CRUDE RESIN FOR RESIST 审中-公开
标题翻译：炼油用原油的抗氧化工艺
公开(公告)号：WO2004069959A3
公开(公告)日：2004-12-09
申请号：PCT/JP2004000807
申请日：2004-01-29
申请人： TOKYO OHKA KOGYO CO LTD , HADA HIDEO , IWAI TAKESHI , MIYAIRI MIWA , MUROI MASAAKI , ATSUCHI KOTA , TOMIDA HIROAKI
发明人： HADA HIDEO , IWAI TAKESHI , MIYAIRI MIWA , MUROI MASAAKI , ATSUCHI KOTA , TOMIDA HIROAKI
IPC分类号： G03F7/039 , C08F6/06 , C08F6/12 , C08F220/28 , C10G20060101 , G03F7/26
CPC分类号： G03F7/0397 , C08F6/06 , C08F6/12
摘要： A process for refining a crude resin for a resist is provided, which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The process provides a refining process for the crude resin of a resist resin (A) used in a photoresist composition comprising at least the resist resin (A) and an acide generator (B) dissolved in a first organic solvent (C1), wherein if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution comprising the crude resin of the component (A) dissolved in a second organic solvent (C2) is labeled Y, then (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered.
摘要翻译：提供了一种精制抗蚀剂用粗制树脂的方法，其能够有效地除去粗树脂中所含的聚合物和低聚物等副产物。该方法提供了用于至少包含抗蚀剂树脂（A）和溶解在第一有机溶剂（C1）中的酸产生剂（B）的光致抗蚀剂组合物中的抗蚀剂树脂（A）的粗树脂的精制方法，其中如果（A）的粗树脂溶液中的组分（A）的粗树脂浓度溶解于第二有机溶剂（C2）中，该组分（A）的粗树脂浓度被标记为X，）标记为Y，则（i）制备粗树脂溶液，使得Y小于X，并且（ii）随后过滤粗树脂溶液。

6. 发明申请

WO2004067688A3 PROCESS FOR REFINING CRUDE RESIN FOR ELECTRONIC MATERIAL 审中-公开
标题翻译：电子材料精制树脂精制工艺
公开(公告)号：WO2004067688A3
公开(公告)日：2004-10-28
申请号：PCT/JP2004000776
申请日：2004-01-28
申请人： TOKYO OHKA KOGYO CO LTD , HADA HIDEO , IWAI TAKESHI , TAKESHITA MASARU , HAYASHI RYOTARO , MUROI MASAAKI , ATSUCHI KOTA , TOMIDA HIROAKI , SHIOTANI KAZUYUKI
发明人： HADA HIDEO , IWAI TAKESHI , TAKESHITA MASARU , HAYASHI RYOTARO , MUROI MASAAKI , ATSUCHI KOTA , TOMIDA HIROAKI , SHIOTANI KAZUYUKI
IPC分类号： C08F6/06 , C08F220/28 , C08J3/14 , C11B20060101 , G03F7/039 , G03F7/26
CPC分类号： C08J3/14 , C08J2333/04 , G03F7/0397
摘要： A process is provided for effectively removing by-products such as oligomers contained within a crude resin for an electronic material, thus producing a resin for an electronic material. In this process, a crude resin for an electronic material containing (al) structural units derived from a (meth)acrylate ester with a hydrophilic site is washed using (b1) an organic solvent which is capable of dissolving said crude resin for an electronic material and which separates into two layers when combined with water, and (b2) water.
摘要翻译：提供了一种方法，用于有效地除去副产物，例如包含在用于电子材料的粗树脂中的低聚物，从而制备用于电子材料的树脂。在该方法中，使用（b1）能够将所述粗树脂溶解在电子材料中的有机溶剂洗涤含有（a1）来自具有亲水部位的（甲基）丙烯酸酯的结构单元的电子材料用粗树脂当与水结合时分离成两层，（b2）水。

7. 发明申请

WO2004040377A1 CHEMICAL-AMPLIFICATION POSITIVE-WORKING PHOTORESIST COMPOSITION 审中-公开
标题翻译：化学放大正极工作光电组合物
公开(公告)号：WO2004040377A1
公开(公告)日：2004-05-13
申请号：PCT/JP2003/013723
申请日：2003-10-27
申请人： TOKYO OHKA KOGYO CO., LTD. , NITTA, Kazuyuki , MOTOIKE, Naoto
发明人： NITTA, Kazuyuki , MOTOIKE, Naoto
IPC分类号： G03F7/039
CPC分类号： G03F7/0392
摘要： Disclosed is a chemical-amplification positive-working photoresist composition having compliability to various types of resist patterns with excellent sensitivity and pattern resolution exhibiting high exposure margin and focusing depth latitude. Of the essential components including (A) a resin capable of being imparted with increased alkali-solubility by interacting with an acid and (B) an acid-generating compound, the component (A) is a combination of (a1) a first resin and (a2) a second resin each as a hydroxystyrene-based copolymeric resin partially substituted for the hydroxyl hydrogen atoms with acid-dissociable solubility-reducing substituent groups. Characteristically, in addition to the difference in the mass-average molecular weight being high for (a1) and low for (a2), the acid-dissociability of the substituents in the (a1) resin is higher than that in the (a2) resin as in a combination of 1-ethoxyethyl for (a1) and tetrahydropyranyl for (a2).
摘要翻译：公开了一种化学扩增正性光致抗蚀剂组合物，其具有对具有优异的灵敏度和图案分辨率的各种类型的抗蚀剂图案具有高曝光余量和聚焦深度纬度的适应性。在包括（A）能够通过与酸相互作用而赋予碱溶解性的树脂和（B）产酸化合物的基础组分中，组分（A）是（a1）第一树脂和（a2）第二树脂，各自作为部分被羟基氢原子取代的具有酸解离性溶解性降低取代基的羟基苯乙烯类共聚树脂。特别地，除了（a1）的质量平均分子量的差异和（a2）的低分子量之外，（a1）树脂中的取代基的酸解离性高于（a2）树脂如（a1）的1-乙氧基乙基和（a2）的四氢吡喃基的组合。

8. 发明申请

WO2014042289A1 HEATING MEDIUM COMPOSITION FOR SOLAR THERMAL POWER GENERATION SYSTEM 审中-公开
标题翻译：用于太阳能发电系统的加热中和组合物
公开(公告)号：WO2014042289A1
公开(公告)日：2014-03-20
申请号：PCT/JP2013/075394
申请日：2013-09-13
申请人： TOKYO OHKA KOGYO CO., LTD. , ABENGOA SOLAR NEW TECHNOLOGIES S.A.
发明人： ONO, Takashi , SUZUKI, Yasuo , VALENZUELA, Salvador Rubia , SANCHEZ, Hipolito Lobato , SANCHEZ, Alfonso Rodriguez , RIOS, Cristina Prieto
IPC分类号： C09K5/08 , C07F7/04
CPC分类号： C09K5/10
摘要： A heating medium composition for solar thermal power generation system, the heating medium composition including a silane coupling agent represented by formula (1) shown below and a heating medium containing diphenyl ether: (1) wherein each of OR 1 , OR 2 and OR 3 may be the same or different, and represents an alkoxy group of 1 to 5 carbon atoms, and X is a group selected from a 3-glycidoxypropyl group, a 3-methacryloxypropyl group, a 3-aminopropyl group, an N-phenyl-3-aminopropyl group and an N-2-(aminoethyl)-3-aminopropyl group.
摘要翻译：一种用于太阳能发电系统的加热介质组合物，包含下述式（1）所示的硅烷偶联剂和含有二苯醚的加热介质的加热介质组合物：（1）其中OR1，OR2和OR3各自可以是相同或不同，表示1〜5个碳原子的烷氧基，X为选自3-环氧丙氧基丙基，3-甲基丙烯酰氧基丙基，3-氨基丙基，N-苯基-3-氨基丙基和N-2-（氨基乙基）-3-氨基丙基。

9. 发明申请

WO2006091802A3 NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS 审中-公开
标题翻译：诺贝恩型聚合物，其组合物和使用这些组合物的平版印刷方法
公开(公告)号：WO2006091802A3
公开(公告)日：2007-10-25
申请号：PCT/US2006006575
申请日：2006-02-23
申请人： PROMERUS LLC , TOKYO OHKA KOGYO CO LTD , RHODES LARRY F , CHANG CHUN , KANDANARACHCHI PRAMOD , SEGER LAWRENCE D , ISHIDUKA KEITA , ENDO KOTARO , ANDO TOMOYUKI
发明人： RHODES LARRY F , CHANG CHUN , KANDANARACHCHI PRAMOD , SEGER LAWRENCE D , ISHIDUKA KEITA , ENDO KOTARO , ANDO TOMOYUKI
IPC分类号： H01L23/48 , H01L23/52 , H01L29/40
CPC分类号： G03F7/0395 , C08F232/08 , G03F7/0046 , G03F7/11 , G03F7/2041 , H01L2924/0002 , H01L2924/00
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译：本发明的实施方案一般涉及可用于浸渍光刻工艺的非自成像和可成像的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及利用这种组合物的浸渍光刻工艺。更具体地，本发明的实施方案涉及用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。

10. 发明申请

WO2006059747A1 PROCESS FOR PRODUCING RESIST PATTERN AND CONDUCTOR PATTERN 审中-公开
标题翻译：生产电阻图案和导体图案的方法
公开(公告)号：WO2006059747A1
公开(公告)日：2006-06-08
申请号：PCT/JP2005/022242
申请日：2005-11-28
申请人： TOKYO OHKA KOGYO CO., LTD. , MISUMI, Koichi , SAITO, Koji , ISHIKAWA, Kaoru
发明人： MISUMI, Koichi , SAITO, Koji , ISHIKAWA, Kaoru
IPC分类号： G03F7/11 , G03F7/039
CPC分类号： H05K3/108 , G03F7/0397 , G03F7/11 , H05K3/384 , H05K2201/0317
摘要： This process for producing a resist pattern includes: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type positive photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to said photoresist laminate, and the step of developing said (c) photoresist layer together with said (b) inorganic substance layer to form a resist pattern.
摘要翻译：制造抗蚀剂图案的方法包括：（a）具有铜的上表面的载体的层叠步骤，（b）由无机物质源供给的无机物质构成的无机物质层，（c）由化学放大型正性光致抗蚀剂组合物构成的光致抗蚀剂层，以获得光致抗蚀剂层压体，选择性地向所述光致抗蚀剂层压体照射活性光或放射线的步骤，以及将所述（c）光致抗蚀剂层与所述（b ）无机物层形成抗蚀剂图案。

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