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    • 2. 发明申请
    • PHOTOSENSITIVE COMPOSITIONS BASED ON POLYCYCLIC POLYMERS
    • 基于聚合物聚合物的光敏组合物
    • WO2004006020A1
    • 2004-01-15
    • PCT/JP2003/008407
    • 2003-07-02
    • SUMITOMO BAKELITE COMPANY, LTD.
    • ELCE, EdmundHIRANO, TakashiKROTINE, Jeffrey, C. Jr.RHODES, Larry, F.GOODALL, Brian, L.JAYARAMAN, SaikumarMCDOUGAL, ChrisSUN, Shenliang
    • G03F7/038
    • G03F7/0382C08G59/3218C08G61/02C08G61/06
    • A copolymer composition inlcuding a copolymer having repeat units of structural formula I: where X is selected from O, -CH 2- and CH 2- CH 2 , m is an integer from 0 to 5; and each occurrence of R 1 -R 4 are independently selected from H; C 1 to C 25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionally; -(CH 2 ) n C(O)OR 5 ;-(CH 2 ) n C(O)OR 6 ,- (CH 2 ) n OR 6 ;- (CH 2 ) n OC(O)R 6 ;-(CH 2 ) n C(O)OR 6 ;(CH 2 ) n OC(O)OR 6 ; and any combination of two of R 1 , R 2 , R 3 , and R 4 linked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate.
    • 一种共聚物组合物,其包含具有结构式I重复单元的共聚物:其中X选自O,-CH 2 - 和CH 2 -CH 2,m为0至5的整数; 并且每次出现的R 1 -R 4独立地选自H; 可以包括一个或多个选自O,N和Si的杂原子的C 1至C 25直链,支链和环烷基,芳基,芳烷基,烷芳基,烯基和炔基; 一个含有环氧官能团的基团; - (CH 2)n C(O)OR 5; - (CH 2)n C(O)OR 6, - (CH 2)n OR 6; - (CH 2)n OC(O)R 6; - (CH 2)NC(O)OR <6>;(CH 2)NOC(O)OR <6>; 并且R 1,R 2,R 3和R 4中的两个的任何组合通过连接基团连接在一起。 具有结构式I的重复单元的一部分含有至少一个环氧官能侧基。 共聚物组合物可以包含在可光致定影的电介质组合物中光子形成催化剂的材料,其可用于在基底上形成光可定义层。