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1. 发明申请

WO2012003006A1 THIN SUBSTRATE, MASS-TRANSFER BERNOULLI END-EFFECTOR 审中-公开
标题翻译：薄基板，传输BERNOULLI终端效应器
公开(公告)号：WO2012003006A1
公开(公告)日：2012-01-05
申请号：PCT/US2011/001177
申请日：2011-07-05
申请人： FORTREND ENGINEERING CORPORATION , WU, Kung, Chris , WEN, Jing , YANG, Ruiqiu , ZHENG, Junqiang
发明人： WU, Kung, Chris , WEN, Jing , YANG, Ruiqiu , ZHENG, Junqiang
IPC分类号： B25J15/00 , B25J15/06
CPC分类号： B25J15/0616 , H01L21/67742 , H01L21/67766 , H01L21/6838
摘要： An end effector (20, 20') for transferring substrates (202). The end effector (20, 20') includes a set of substrate grippers (22, 22') having a pitch between grippers (22, 22') that does not exceed 6.00 mm. Each gripper (22,22') has a contact surface (54, 54') against which a substrate (202) becomes clamped upon injecting a gaseous jet into a groove (56A, 56B, 56') formed into the contact surface (54, 541). Due to the close spacing between adjacent pairs of substrate grippers (22, 22'), the open groove (56A, 56B, 56') must be very shallow. The open groove (56A, 56B, 56') has a groove depth into the contact surface (54, 54') that is between 2.00 mm and 2.40 mm. Alternatively, the groove (56A, 56B, 56') has a groove width at the contact surface (54, 54') that is at least three (3) times larger than a groove depth into the gripper contact surface.
摘要翻译：用于传送基底（202）的末端执行器（20,20'）。末端执行器（20,20'）包括一组在不超过6.00mm的夹持器（22,22'）之间具有间距的基底夹持器（22,22'）。每个夹持器（22,22'）具有接触表面（54,54'），当将气体射流注入到形成到接触表面（54A）的凹槽（56A，56B，56'）中时，衬底（202）被夹紧，541）。由于相邻的基板夹持器（22,22'）之间的紧密间隔，开口槽（56A，56B，56'）必须非常浅。开槽（56A，56B，56'）具有在2.00mm和2.40mm之间的接触表面（54,54'）中的槽深度。或者，槽（56A，56B，56'）在接触表面（54,54'）处具有比进入夹持器接触表面的槽深度的至少三（3）倍的槽宽。

2. 发明申请

WO2011136856A1 OPENER FOR EXTREME ULTRA VIOLET LITHOGRAPHY RETICLE PODS 审中-公开
标题翻译：超级紫外线光刻机的开孔器
公开(公告)号：WO2011136856A1
公开(公告)日：2011-11-03
申请号：PCT/US2011/000777
申请日：2011-05-02
申请人： FORTREND ENGINEERING CORPORATION , WU, Kung, Chris
发明人： WU, Kung, Chris
IPC分类号： B65D85/00
CPC分类号： G03F1/66
摘要： A two stage opener (50) for an EUV RSP (32, 34) includes an outer RSP pod opener (42, 44) having: 1. a RSP latch mechanism (42rlm) for latching a sealed outer RSP pod (32, 34) in place on the RSP pod opener (42, 44); and 2. a RSP lock/unlock mechanism (42lulm) for unlocking the RSP pod (32, 34) so the RSP pod opener (42, 44) can separate a RSP pod cover (32c, 343c) from a RSP pod door (32d, 34d). After the RSP lock/unlock mechanism (42lulm) unlocks the RSP pod (32,34), the RSP pod opener (42, 44) separates the RSP pod door (32d, 34d) from the RSP pod cover (32c, 34c) thereby exposing a metal case (20). The pod opener (50) also includes a metal case opener (52) having at least two (2) arms (56) for receiving and supporting the metal case cover (22) while the two stage pod opener (50) separates the metal case base (24) from the metal case cover (22) thereby exposing the bare reticle (26) carried om the metal case base (24).
摘要翻译：用于EUV RSP（32,34）的两级开启器（50）包括外部RSP开启器（42,44），其具有：1.用于锁定密封的外部RSP盒（32,34）的RSP闩锁机构（42rlm）在RSP开箱器（42，44）上的位置; 以及2.用于解锁RSP盒（32,34）的RSP锁定/解锁机构（42lm），使得RSP盒开启器（42,44）可以将RSP盒盖（32c，343c）与RSP盒门（32d）分开，34d）。在RSP锁定/解锁机构（42lulm）解锁RSP舱（32,34）之后，RSP舱盖开启器（42,44）将RSP舱门（32d，34d）与RSP舱盖（32c，34c）分开，从而露出金属外壳（20）。开箱器（50）还包括具有至少两个（2）臂（56）的金属开启器（52），用于接收和支撑金属外壳盖（22），同时两台开箱器（50）将金属外壳（24），从而露出金属外壳基座（24）上承载的裸露的掩模版（26）。

3. 发明申请

WO2009114193A2 BARE RETICLE STORAGE CHAMBER AND STOCKER 审中-公开
标题翻译： BARE RETICLE存储室和储物柜
公开(公告)号：WO2009114193A2
公开(公告)日：2009-09-17
申请号：PCT/US2009/001630
申请日：2009-03-13
申请人： FORTREND ENGINEERING CORPORATION , WU, Kung, Chris , MORGAN, Richard , HUANG, Yuan-Yu , LIU, Shih-Chi , CHANG, Wei-Shiang , KO, Hung-Kun
发明人： WU, Kung, Chris , MORGAN, Richard , HUANG, Yuan-Yu , LIU, Shih-Chi , CHANG, Wei-Shiang , KO, Hung-Kun
IPC分类号： B65B55/20
CPC分类号： H01L21/6732 , H01L21/67173 , H01L21/67742 , H01L21/67769 , H01L21/67775 , H01L21/68707
摘要： A bare reticle storage chamber and stocker (30) includes a reticle input /output -port pod opener (36) for: 1. accessing a reticle (68) carried within a pod; while 2. maintaining a clean environment around the reticle (68). A reticle transfer area (42) that abuts the pod opener (30) and houses a reticle handling robot (44) that includes an end-effector (162) adapted for receiving and retaining at least one reticle (68). A bare reticle storage chamber (52) also abuts the reticle transfer area (42). The reticle storage chamber (52) houses: 1. a reticle cabinet (62) having reticle storage slots (64) that receive reticles (68); and 2. a plenum (102) that provides a flow of gas about and through the reticle cabinet (62). Abutting the reticle transfer area (42), the reticle storage chamber (52) has an openable and closeable robot access door (74) through which the end-effector (162) of the reticle handling robot (44) accesses the reticle storage slot that is then juxtaposed with the robot access door (74).
摘要翻译：裸露的掩模版存储室和储料器（30）包括掩模版输入/输出端口开启器（36），用于：1.访问在荚内承载的掩模版（68）; 同时2.保持围绕光罩（68）的清洁环境。一个贴片开孔器（30）的掩模版传送区域（42）并且容纳一个掩模版处理机器人（44），该掩模版处理机器人（44）包括适于容纳和保持至少一个掩模版（68）的端部执行器（162）。裸露的掩模版存储室（52）也邻接标线转印区域（42）。所述掩模版存储室（52）容纳：1.具有接收标线（68）的光罩存储槽（64）的光罩柜（62）; 以及2.一个气室（102），其提供围绕并通过所述标线箱（62）的气体流。所述掩模版存放室（52）与所述掩模版传送区域（42）相对，具有可开闭的机器人检修门（74），所述掩模版处理机器人（44）的末端执行器（162）通过所述机械手入口门进入所述掩模版存储槽，然后与机器人检修门（74）并置。

4. 发明申请

WO2003106310A1 UNIVERSAL RETICLE TRANSFER SYSTEM 审中-公开
标题翻译：通用传输系统
公开(公告)号：WO2003106310A1
公开(公告)日：2003-12-24
申请号：PCT/US2003/018705
申请日：2003-06-12
申请人： FORTREND ENGINEERING CORPORATION , WU, Kung, Chris , SIFUENTES, Robert, Frank , HARDY, Kenneth, Alan , CALIBOSO, Edgardo, A. , MALOBRODSKY, Anatoly
发明人： WU, Kung, Chris , SIFUENTES, Robert, Frank , HARDY, Kenneth, Alan , CALIBOSO, Edgardo, A. , MALOBRODSKY, Anatoly
IPC分类号： B65G49/07
CPC分类号： H01L21/6734 , H01L21/67359 , H01L21/67373 , H01L21/67379 , H01L21/67383 , H01L21/67386 , H01L21/67775 , H01L21/67778 , H01L21/6831 , H01L21/68707
摘要： A specially adapted SMIF pod (20) receives and holds one particular type of reticle cassette (36) or reticle holder (132) selected from among dozens of different configurations thereof. The SMIF pod (20) may be interrogated to determine the particular type of reticle cassette (36) or reticle holder (132) carried therein. A reticle transfer system (50) receives a pair of such SMIF pods (20), interrogates each of the SMIF pods (20) to ascertain which type of reticle cassette (36) or reticle holder (132) the SMIF pod (20) carries, and automatically moves reticles (42) through a controlled environment from one reticle cassette (36) or reticle holder (32) to another reticle cassette (36) or reticle holder (132). A reticle reorienter (56) includable in the system (50) also permits automatically exchanging reticles (42) between a reticle carrier (144) and a reticle cassette (36) or reticle holder (132).
摘要翻译：专门适应的SMIF盒（20）接收并保持从其数十种不同配置中选择的一种特定类型的标线盒（36）或标线架支架（132）。可以询问SMIF盒（20）以确定其中承载的标线盒（36）或标线架（132）的特定类型。标线片传送系统（50）接收一对这样的SMIF盒（20），询问每个SMIF盒（20）以确定SMIF盒（20）携带的哪种类型的标线片盒（36）或标线架（132）并且自动将标线片（42）通过受控的环境从一个标线盒（36）或标线保持器（32）移动到另一个标线盒（36）或标线架支架（132）。可在系统（50）中包括的标线重新定向器（56）还允许自动交换标线片载体（144）和标线片盒（36）或标线架支架（132）之间的标线（42）。

5. 发明公开

EP2588280A1 THIN SUBSTRATE, MASS-TRANSFER BERNOULLI END-EFFECTOR 审中-公开
标题翻译：超薄基板与传质伯努利末端执行器
公开(公告)号：EP2588280A1
公开(公告)日：2013-05-08
申请号：EP11801272.3
申请日：2011-07-05
申请人： Fortrend Engineering Corporation
发明人： WU, Kung, Chris , WEN, Jing , YANG, Ruiqiu , ZHENG, Junqiang
IPC分类号： B25J15/00 , B25J15/06
CPC分类号： B25J15/0616 , H01L21/67742 , H01L21/67766 , H01L21/6838
摘要： An end effector (20, 20') for transferring substrates (202). The end effector (20, 20') includes a set of substrate grippers (22, 22') having a pitch between grippers (22, 22') that does not exceed 6.00 mm. Each gripper (22,22') has a contact surface (54, 54') against which a substrate (202) becomes clamped upon injecting a gaseous jet into a groove (56A, 56B, 56') formed into the contact surface (54, 541). Due to the close spacing between adjacent pairs of substrate grippers (22, 22'), the open groove (56A, 56B, 56') must be very shallow. The open groove (56A, 56B, 56') has a groove depth into the contact surface (54, 54') that is between 2.00 mm and 2.40 mm. Alternatively, the groove (56A, 56B, 56') has a groove width at the contact surface (54, 54') that is at least three (3) times larger than a groove depth into the gripper contact surface.

6. 发明公开

EP2563689A1 OPENER FOR EXTREME ULTRA VIOLET LITHOGRAPHY RETICLE PODS 审中-公开
标题翻译：首战极紫外线光刻掩膜，PODS
公开(公告)号：EP2563689A1
公开(公告)日：2013-03-06
申请号：EP11775403.6
申请日：2011-05-02
申请人： Fortrend Engineering Corporation
发明人： WU, Kung, Chris
IPC分类号： B65D85/00
CPC分类号： G03F1/66
摘要： A two stage opener (50) for an EUV RSP (32, 34) includes an outer RSP pod opener (42, 44) having: 1. a RSP latch mechanism (42rlm) for latching a sealed outer RSP pod (32, 34) in place on the RSP pod opener (42, 44); and 2. a RSP lock/unlock mechanism (42lulm) for unlocking the RSP pod (32, 34) so the RSP pod opener (42, 44) can separate a RSP pod cover (32c, 343c) from a RSP pod door (32d, 34d). After the RSP lock/unlock mechanism (42lulm) unlocks the RSP pod (32,34), the RSP pod opener (42, 44) separates the RSP pod door (32d, 34d) from the RSP pod cover (32c, 34c) thereby exposing a metal case (20). The pod opener (50) also includes a metal case opener (52) having at least two (2) arms (56) for receiving and supporting the metal case cover (22) while the two stage pod opener (50) separates the metal case base (24) from the metal case cover (22) thereby exposing the bare reticle (26) carried om the metal case base (24).

7. 发明公开

EP1534616A1 UNIVERSAL RETICLE TRANSFER SYSTEM 审中-公开
标题翻译： UNIVERSALMASKENTRANSFERSYSTEM
公开(公告)号：EP1534616A1
公开(公告)日：2005-06-01
申请号：EP03739118.2
申请日：2003-06-12
申请人： Fortrend Engineering Corporation
发明人： WU, Kung, Chris , SIFUENTES, Robert, Frank , HARDY, Kenneth, Alan , CALIBOSO, Edgardo, A. , MALOBRODSKY, Anatoly , HUANG, Chien-Rong
IPC分类号： B65G49/07
CPC分类号： H01L21/6734 , H01L21/67359 , H01L21/67373 , H01L21/67379 , H01L21/67383 , H01L21/67386 , H01L21/67775 , H01L21/67778 , H01L21/6831 , H01L21/68707
摘要： A specially adapted SMIF pod (20) receives and holds one particular type of reticle cassette (36) or reticle holder (132) selected from among dozens of different configurations thereof. The SMIF pod (20) may be interrogated to determine the particular type of reticle cassette (36) or reticle holder (132) carried therein. A reticle transfer system (50) receives a pair of such SMIF pods (20), interrogates each of the SMIF pods (20) to ascertain which type of reticle cassette (36) or reticle holder (132) the SMIF pod (20) carries, and automatically moves reticles (42) through a controlled environment from one reticle cassette (36) or reticle holder (32) to another reticle cassette (36) or reticle holder (132). A reticle reorienter (56) includable in the system (50) also permits automatically exchanging reticles (42) between a reticle carrier (144) and a reticle cassette (36) or reticle holder (132).

8. 发明授权

US5193969A Wafer transfer machine 失效
标题翻译：晶圆转印机
公开(公告)号：US5193969A
公开(公告)日：1993-03-16
申请号：US703011
申请日：1991-05-20
申请人： John M. Rush , Torben Ulander , Michael T. Verdon
发明人： John M. Rush , Torben Ulander , Michael T. Verdon
IPC分类号： B65G49/07 , H01L21/677
CPC分类号： H01L21/67775 , H01L21/67781 , Y10S414/138
摘要： The present invention is a rotary, 3-stage wafer transfer machine. The transfer machine utilizes a pneumatically powered lift mechanism to raise wafers from a boat to a retaining area. If the next operation for the wafer is a single density operation (twenty-five wafers per boat), the wafers are the simply transferred to another boat for further processing. If the next operation for the wafers requires double density (fifty wafers per boat), a second set of wafers is lifted to the retaining area, where they are interspersed with the first set to create a double density set of fifth wafers. This set is then transferred to the appropriate boat (generally a quartz boat) for further processing. All components that could generate particulate contamination are sealed off from the transfer area. Extra duty materials are used for the components of the machine to provide unique reproducibility and eliminate much of the required maintenance as compared to the prior art. Lack of contamination and superior reproducibility allow increased yield in the manufacturing process.
摘要翻译：本发明是旋转式3级晶片转印机。转移机器利用气动提升机构将晶片从船上提升到保持区域。如果晶片的下一个操作是单一密度操作（每个船只二十五个晶片），则晶片被简单地转移到另一个船上用于进一步处理。如果晶片的下一次操作需要双重密度（每个船只五十个晶片），则第二组晶片被提升到保持区域，在那里它们与第一组散布，以产生双倍密度的第五晶片组。然后将该组转移到适当的船（通常是石英舟）以进一步处理。所有可能产生颗粒污染物的组分都与传输区域密封。与现有技术相比，额外的功能材料用于机器的部件以提供独特的再现性并且消除了大量所需的维护。缺乏污染和卓越的再现性，可以提高生产过程中的产量。

9. 发明授权

US07695239B2 End effector gripper arms having corner grippers which reorient reticle during transfer 失效
标题翻译：末端执行器夹持臂具有在传送期间重新调整掩模版的角夹头
公开(公告)号：US07695239B2
公开(公告)日：2010-04-13
申请号：US10891406
申请日：2004-07-14
申请人： Kung Chris Wu
发明人： Kung Chris Wu
IPC分类号： H01L21/68
CPC分类号： H01L21/67766 , B25J15/0028 , Y10S414/136 , Y10S414/138 , Y10S414/141
摘要： The present invention is a pod opener having an end effector which: a. grips and releases a reticle supported above the base of a pod; and b. while transferring the reticle between the base of the pod and an adjacent IC photolithography tool, reorients the reticle. In one embodiment, the pod opener reorients the reticle by rotating it about a single axis disposed substantially perpendicular to its patterned surface. In another embodiment, the present invention is a pod opener which while transferring the reticle between the base of the pod and an adjacent IC photolithography tool, in addition to effecting rotation substantially perpendicular to a reticle's patterned surface, also turns the reticle over so a patterned surface of the reticle is oriented for proper focus within the IC photolithography tool.
摘要翻译：本发明是一种具有端部执行器的开启器，其具有：a。抓住并释放在荚的基部上方支撑的掩模版; 和b。同时将掩模版传送到荚的基部和相邻的IC光刻工具之间，重新定向光罩。在一个实施例中，通过围绕基本上垂直于其图案化表面设置的单个轴线旋转掩模开启器来重新定向光罩。在另一个实施例中，本发明是一种荚果开启器，其在将光罩传送到荚的基部和相邻的IC光刻工具之间，除了实现基本上垂直于掩模版图案的表面的旋转之外，还将掩模版转过图案掩模版的表面被定向成在IC光刻工具内进行适当的聚焦。

10. 发明授权

US5984610A Pod loader interface 失效
标题翻译： Pod加载接口
公开(公告)号：US5984610A
公开(公告)日：1999-11-16
申请号：US400039
申请日：1995-03-07
申请人： John M. Rush , Torben Ulander , Michael T. Verdon
发明人： John M. Rush , Torben Ulander , Michael T. Verdon
IPC分类号： B65G49/07 , H01L21/677 , H01L21/687
CPC分类号： H01L21/67775 , H01L21/68707 , Y10S414/14
摘要： The pod loader interface is a machine that is able to automatically open a SMIF pod and unload the contents thereof. An elevator raises the SMIF cover away from its base to reveal the wafer boat contained in the SMIF pod. An articulated arm thereafter reaches through an opening in a bulkhead of the machine, securing the wafer cassette and withdrawing it through the hole in the bulkhead. The wafer cassette is then placed in position to be operated upon by the next step in the manufacturing process. The machine includes an integrated clean air system to provide a clean environment for the wafers.
摘要翻译： pod加载器接口是能够自动打开SMIF pod并卸载其内容的机器。电梯将SMIF盖板从基座上抬起，以露出包含在SMIF吊舱中的晶片舟皿。然后，铰接臂通过机器的隔板中的开口到达，固定晶片盒并将其取出通过隔板中的孔。然后将晶片盒放置在制造过程中通过下一步操作的位置。该机器包括集成的清洁空气系统，为晶片提供清洁的环境。

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