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    • 5. 发明专利
    • Method for producing stacked and self-aligned component on substrate
    • 在基板上生产堆叠和自对准分量的方法
    • JP2010098319A
    • 2010-04-30
    • JP2009239536
    • 2009-10-16
    • Commiss Energ Atomコミツサリア タ レネルジー アトミーク
    • WACQUEZ ROMAINCORONEL PHILIPPEDESTEFANIS VINCENTHARTMANN JEAN MICHEL
    • H01L21/20B81C1/00H01L21/76H01L21/8238H01L27/092
    • H01L21/84H01L21/76264H01L21/8221
    • PROBLEM TO BE SOLVED: To provide a method for producing stacked and self-aligned components on a substrate.
      SOLUTION: The method for producing stacked and self-aligned components on the substrate comprises steps of: forming a stack of layers on one face of the substrate, the stack comprising a first sacrificial layer, a second sacrificial layer and a superficial layer; etching a zone of the first sacrificial layer; depositing resin in the etched zone of the first sacrificial layer and on the superficial layer; performing lithography of the resin so as to leave at least one zone of resin, in the etched zone of the first sacrificial layer, in alignment with at least one resin zone on the sacrificial layer; replacing the eliminated resin in the etched zone of the first sacrificial layer and on the sacrificial layer with a material for confining the remaining resin; eliminating the remaining resin zones in the etched zone of the first sacrificial layer and on the superficial layer to provide zones dedicated to the production of components; forming elements of components in the dedicated zones; and selectively etching a zone of the second sacrificial layer.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种在基板上制造堆叠和自对准部件的方法。 解决方案:用于在衬底上生成层叠和自对准部件的方法包括以下步骤:在衬底的一个面上形成一叠层,所述堆叠包括第一牺牲层,第二牺牲层和表面层 ; 蚀刻第一牺牲层的区域; 在第一牺牲层和浅表层的蚀刻区中沉积树脂; 在所述第一牺牲层的所述蚀刻区域中与所述牺牲层上的至少一个树脂区域对准地进行所述树脂的光刻以便留下至少一个树脂区域; 用用于限制剩余树脂的材料代替第一牺牲层的蚀刻区域和牺牲层上的消除树脂; 消除在第一牺牲层和表面层的蚀刻区域中剩余的树脂区域,以提供专门用于生产部件的区域; 在专用区域中形成元件的元件; 并选择性蚀刻第二牺牲层的区域。 版权所有(C)2010,JPO&INPIT
    • 6. 发明专利
    • Method of preventing and dissipating electrostatic discharge in integrated circuit
    • 在集成电路中防止和消除静电放电的方法
    • JP2010098316A
    • 2010-04-30
    • JP2009238271
    • 2009-10-15
    • Commiss Energ Atomコミツサリア タ レネルジー アトミーク
    • NODIN JEAN-FRANCOIS
    • H01L49/00H01L21/822H01L27/04H01L45/00
    • H01L27/0248H01L45/00
    • PROBLEM TO BE SOLVED: To provide a protective element having a structure requiring only a small number of components relative to an element of a conventional technology and/or being uncomplicated, protecting an integrated circuit when it is turned on or off, having very low parasitic capacitance to the protected integrated circuit, and never increased in volume.
      SOLUTION: This element (100) for protecting at least one integrated circuit against electrostatic discharge includes at least: an ionizable metal portion (106); a solid electrolyte (104) arranged in contact with the ionizable metal portion and including metal ions of nature similar to the metal of the ionizable metal portion; and an electrode (102) electrically connected to the solid electrolyte, wherein the concentration of the metal ions in the solid electrolyte is lower than the saturation concentration of metal ions in the solid electrolyte.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了提供一种具有相对于传统技术的元件仅需少量元件的结构和/或不复杂的保护元件,当其被接通或断开时保护集成电路,具有 对受保护的集成电路具有非常低的寄生电容,并且从未增加体积。 解决方案:用于保护至少一个集成电路免受静电放电的该元件(100)至少包括:可电离的金属部分(106); 固体电解质(104),其与所述可电离金属部分接触并且包括与所述可电离金属部分的金属类似的性质的金属离子; 和与固体电解质电连接的电极(102),其中固体电解质中的金属离子的浓度低于固体电解质中的金属离子的饱和浓度。 版权所有(C)2010,JPO&INPIT
    • 7. 发明专利
    • Heterojunction photovoltaic cell with dual doping and method of manufacturing the same
    • 具有双重掺杂的异相光电池及其制造方法
    • JP2010087520A
    • 2010-04-15
    • JP2009229662
    • 2009-10-01
    • Commiss Energ Atomコミツサリア タ レネルジー アトミーク
    • RIBEYRON PIERRE-JEAN
    • H01L31/04H01L31/065H01L31/075
    • H01L31/075H01L31/065H01L31/0747H01L31/202Y02E10/547Y02E10/548Y02P70/521
    • PROBLEM TO BE SOLVED: To provide a photovoltaic cell including a heterojunction between a crystalline semiconductor substrate (210) of a first conductivity type and a first amorphous layer (220), the amorphous layer being made of the same semiconductor material, having a second conductivity type reverse of the first conductivity type, and also having a dopant concentration between 1.10 19 to 1.10 22 atoms/cm 3 . SOLUTION: The photovoltaic cell further includes a second amorphous layer (225) of the same conductivity type as that of the first layer and having a dopant concentration between 1.10 16 to 1.10 18 atoms/cm 3 . The second layer is deposited directly onto a first face of the substrate and coated with the first layer. Finally, the photovoltaic cell includes a third amorphous layer (260) on a second face of the substrate opposite to the first face, the third layer being made of the same material as the substrate, having the same conductivity type, and also having a dopant concentration between 1.10 19 to 1.10 22 atoms/cm 3 . COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了提供一种在第一导电类型的晶体半导体衬底(210)和第一非晶层(220)之间具有异质结的光伏电池,所述非晶层由相同的半导体材料制成,具有 第一导电类型的第二导电类型反向,并且掺杂剂浓度在1.10×SP>至1.10×SP> 22原子/ cm 3之间。 解决方案:光伏电池还包括与第一层相同的导电类型的第二非晶层(225),并且掺杂剂浓度在1.10×SP≤16.0之间< / SP>原子/ cm 3 。 将第二层直接沉积在基材的第一面上并涂覆第一层。 最后,光伏电池包括在与第一面相对的第二面上的第三非晶层(260),第三层由与基板相同的材料制成,具有相同的导电类型,并且还具有掺杂剂 浓度在1.10 19 至1.10 22原子/ cm 3之间。 版权所有(C)2010,JPO&INPIT