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1. 发明申请

US20110159784A1 ABRASIVE ARTICLE WITH ARRAY OF GIMBALLED ABRASIVE MEMBERS AND METHOD OF USE 审中-公开
标题翻译：具有GIMBLEED磨粒成员阵列的磨砂制品及其使用方法
公开(公告)号：US20110159784A1
公开(公告)日：2011-06-30
申请号：US12766473
申请日：2010-04-23
申请人： Zine-Eddine Boutaghou , Karl G. Schwappach
发明人： Zine-Eddine Boutaghou , Karl G. Schwappach
IPC分类号： B24B1/00
CPC分类号： B24B37/14 , B24B53/017 , B24B53/12 , B24D18/00
摘要： An abrasive article with an array of independently gimballed abrasive members that are capable of selectively engaging with nanometer-scale and/or micrometer-scale height variations and micrometer-scale and/or millimeter-scale wavelengths of waviness, on the surfaces of substrates. Each abrasive member maintains a fluid bearing (air is the typical fluid) with the substrate. The spacing and pitch of the abrasive members can be adjusted to follow the topography of the substrate to remove a generally uniform layer of material; to engage with the peaks on the substrate to remove target wavelengths of waviness; and/or to remove debris and contamination from the surface of the substrate.
摘要翻译：一种磨料制品，具有独立的微球磨料构件的阵列，其能够在衬底的表面上选择性地与纳米尺度和/或微米级的高度变化和波纹度的微米级和/或毫米级波长接合。每个磨料构件与衬底保持流体轴承（空气是典型的流体）。可以调整磨料构件的间距和间距以跟随衬底的形貌以去除大致均匀的材料层; 与基板上的峰接合以去除波纹的目标波长; 和/或从衬底的表面去除碎屑和污染物。

2. 发明授权

US08808064B2 Abrasive article with array of composite polishing pads 有权
标题翻译：具有复合抛光垫阵列的磨料制品
公开(公告)号：US08808064B2
公开(公告)日：2014-08-19
申请号：US13275948
申请日：2011-10-18
申请人： Karl G. Schwappach , Zine-Eddine Boutaghou
发明人： Karl G. Schwappach , Zine-Eddine Boutaghou
IPC分类号： B24D11/00
CPC分类号： B24D11/00 , Y10T29/5397
摘要： A polishing article with a plurality of polishing pads adapted to polish a substrate. Gimbal structures are attached to the polishing pads that permit the polishing pads to move independently along at least a pitch axis and a roll axis. Stems supported by preload flexures apply preloads through dimple structures to the polishing pads. A plurality of stand-offs provide fixed boundary conditions between the preload and the gimbal structures. Recesses allow for the preload flexures to move vertically.
摘要翻译：一种抛光制品，其具有适于抛光基底的多个抛光垫。万向结构附着在抛光垫上，允许抛光垫沿至少一个俯仰轴和一个滚动轴线独立移动。通过预加载弯曲支撑的杆体通过凹坑结构将预载荷施加到抛光垫。多个支座在预载荷和万向节结构之间提供固定的边界条件。凹槽允许预载挠曲件垂直移动。

3. 发明申请

US20110104989A1 DRESSING BAR FOR EMBEDDING ABRASIVE PARTICLES INTO SUBSTRATES 审中-公开
标题翻译：用于将磨料颗粒嵌入基材中的条带
公开(公告)号：US20110104989A1
公开(公告)日：2011-05-05
申请号：US12766515
申请日：2010-04-23
申请人： Zine-Eddine Boutaghou , Karl G. Schwappach
发明人： Zine-Eddine Boutaghou , Karl G. Schwappach
IPC分类号： B24B1/00 , B24B53/12 , B24B37/00 , B24D3/00
CPC分类号： B24B37/14 , B24B53/017 , B24B53/12 , B24D18/00
摘要： One or more individually gimballed dressing bars for embedding abrasive particles into a substrate at a substantially uniform height. A hydrostatic and/or hydrodynamic fluid bearing (air is the typical fluid) is maintained between the dressing bar and the substrate. The fluid bearing permits the dressing bar to follow micrometer-scale and/or millimeter-scale wavelengths of waviness on the substrate, while maintaining a constant clearance, to uniformly embed the abrasive particle into the substrate.
摘要翻译：一个或多个单独的极限化的敷料棒，用于以基本上均匀的高度将磨料颗粒嵌入到基底中。在修整条和基材之间保持静压和/或流体动力流体轴承（空气是典型的流体）。流体轴承允许敷料棒在保持恒定间隙的同时保持衬底上的微米级和/或毫米波长的波纹波纹，以将磨料颗粒均匀地嵌入衬底中。

4. 发明授权

US08944886B2 Abrasive slurry and dressing bar for embedding abrasive particles into substrates 有权
标题翻译：磨料浆料和修整棒，用于将磨料颗粒嵌入基材
公开(公告)号：US08944886B2
公开(公告)日：2015-02-03
申请号：US13289797
申请日：2011-11-04
申请人： Karl G. Schwappach , Zine-Eddine Boutaghou
发明人： Karl G. Schwappach , Zine-Eddine Boutaghou
IPC分类号： B24B1/00 , B24D11/00
CPC分类号： B24D11/00 , Y10T29/5397
摘要： An abrasive polishing slurry including abrasive particles in a carrier fluid and micro-nano members. A system and method for making an abrasive article using the polishing slurry is also disclosed. The system includes a gimballed dressing bar adapted to provide a compressive force sufficient to embed the abrasive particles into the substrate, wherein the members set a height the embedded abrasive particles protrude above the substrate.
摘要翻译：包括载体流体中的磨料颗粒和微纳米构件的研磨抛光浆料。还公开了使用抛光浆料制造磨料制品的系统和方法。该系统包括适于提供足以将磨料颗粒嵌入衬底中的压缩力的捣实的敷料棒，其中所述构件将嵌入的磨料颗粒设置在衬底上方的高度。

5. 发明授权

US08801497B2 Array of abrasive members with resilient support 有权
标题翻译：具有弹性支撑的研磨件阵列
公开(公告)号：US08801497B2
公开(公告)日：2014-08-12
申请号：US12784908
申请日：2010-05-21
申请人： Karl G. Schwappach , Zine-Eddine Boutaghou
发明人： Karl G. Schwappach , Zine-Eddine Boutaghou
IPC分类号： B24B1/00 , B24B41/02
CPC分类号： B24D11/00 , Y10T29/5397
摘要： An abrasive article having an array of abrasive members with an elastomeric support that permits each abrasive member to move independently in at least pitch and roll. Each abrasive member maintains a fluid bearing (air is the typical fluid) with the substrate. The abrasive members are capable of selectively engaging with nanometer-scale and/or micrometer-scale height variations and micrometer-scale and/or millimeter-scale wavelengths of waviness, on the surfaces of substrates. The spacing and pitch of the abrasive members can be adjusted to follow the topography of the substrate to remove a generally uniform layer of material; to engage with the peaks on the substrate to remove target wavelengths of waviness; and/or to remove debris and contamination from the surface of the substrate.
摘要翻译：具有磨料构件阵列的磨料制品，其具有弹性体支撑件，其允许每个磨料构件以至少间距和滚动方式独立地移动。每个磨料构件与衬底保持流体轴承（空气是典型的流体）。磨料构件能够在衬底的表面上选择性地与纳米尺度和/或微米级的高度变化和微米级和/或毫米级的波纹波长接合。可以调整磨料构件的间距和间距以跟随衬底的形貌以去除大致均匀的材料层; 与基板上的峰接合以去除波纹的目标波长; 和/或从衬底的表面去除碎屑和污染物。

6. 发明申请

US20120149279A1 ABRASIVE ARTICLE WITH ARRAY OF COMPOSITE POLISHING PADS 有权
标题翻译：具有复合抛光垫阵列的磨砂文章
公开(公告)号：US20120149279A1
公开(公告)日：2012-06-14
申请号：US13284631
申请日：2011-10-28
申请人： Karl G. Schwappach , Zine-Eddine Boutaghou
发明人： Karl G. Schwappach , Zine-Eddine Boutaghou
IPC分类号： B24B29/00 , B24B49/00 , B24B1/00
CPC分类号： B24D11/00 , Y10T29/5397
摘要： An abrasive article for polishing a substrate surface. The abrasive article includes a holder pad assembly and an abrasive member held in place with respect to a holder pad. The abrasive member further includes a first surface engaged with the holder pad assembly, and a second surface including an abrasive. A preload mechanism is positioned to bias the second surfaces of the abrasive member toward the substrate surface. One or more fluid bearing features on the second surface of the abrasive member is configured to generate lift forces during relative motion between the abrasive article and the substrate surface.
摘要翻译：用于抛光衬底表面的磨料制品。研磨制品包括保持器垫组件和相对于保持器垫保持就位的研磨构件。研磨构件还包括与保持器垫组件接合的第一表面和包括磨料的第二表面。定位预载机构以将研磨构件的第二表面朝向衬底表面偏置。研磨构件的第二表面上的一个或多个流体支承构件构造成在磨料制品和基底表面之间的相对运动期间产生升力。

7. 发明申请

US20120122380A1 ABRASIVE ARTICLE WITH ARRAY OF COMPOSITE POLISHING PADS 有权
标题翻译：具有复合抛光垫阵列的磨砂文章
公开(公告)号：US20120122380A1
公开(公告)日：2012-05-17
申请号：US13275948
申请日：2011-10-18
申请人： Karl G. Schwappach , Zine-Eddine Boutaghou
发明人： Karl G. Schwappach , Zine-Eddine Boutaghou
IPC分类号： B24D11/00
CPC分类号： B24D11/00 , Y10T29/5397
摘要： A polishing article with a plurality of polishing pads adapted to polish a substrate. Gimbal structures are attached to the polishing pads that permit the polishing pads to move independently along at least a pitch axis and a roll axis. Stems supported by preload flexures apply preloads through dimple structures to the polishing pads. A plurality of stand-offs provide fixed boundary conditions between the preload and the gimbal structures. Recesses allow for the preload flexures to move vertically.
摘要翻译：一种抛光制品，其具有适于抛光基底的多个抛光垫。万向结构附着在抛光垫上，允许抛光垫沿至少一个俯仰轴和一个滚动轴线独立移动。通过预加载弯曲支撑的杆体通过凹坑结构将预载荷施加到抛光垫。多个支座在预载荷和万向节结构之间提供固定的边界条件。凹槽允许预载挠曲件垂直移动。

8. 发明授权

US08926411B2 Abrasive article with array of composite polishing pads 有权
标题翻译：具有复合抛光垫阵列的磨料制品
公开(公告)号：US08926411B2
公开(公告)日：2015-01-06
申请号：US13284631
申请日：2011-10-28
申请人： Karl G. Schwappach , Zine-Eddine Boutaghou
发明人： Karl G. Schwappach , Zine-Eddine Boutaghou
IPC分类号： B24D11/02 , B24D11/00
CPC分类号： B24D11/00 , Y10T29/5397
摘要： An abrasive article for polishing a substrate surface. The abrasive article includes a holder pad assembly and an abrasive member held in place with respect to a holder pad. The abrasive member further includes a first surface engaged with the holder pad assembly, and a second surface including an abrasive. A preload mechanism is positioned to bias the second surfaces of the abrasive member toward the substrate surface. One or more fluid bearing features on the second surface of the abrasive member is configured to generate lift forces during relative motion between the abrasive article and the substrate surface.
摘要翻译：用于抛光衬底表面的磨料制品。研磨制品包括保持器垫组件和相对于保持器垫保持就位的研磨构件。研磨构件还包括与保持器垫组件接合的第一表面和包括磨料的第二表面。定位预载机构以将研磨构件的第二表面朝向衬底表面偏置。研磨构件的第二表面上的一个或多个流体支承构件构造成在磨料制品和基底表面之间的相对运动期间产生升力。

9. 发明申请

US20120149283A1 ABRASIVE SLURRY AND DRESSING BAR FOR EMBEDDING ABRASIVE PARTICLES INTO SUBSTRATES 有权
标题翻译：用于将磨料颗粒嵌入基材的磨料浆料和条带
公开(公告)号：US20120149283A1
公开(公告)日：2012-06-14
申请号：US13289797
申请日：2011-11-04
申请人： Karl G. Schwappach , Zine-Eddine Boutaghou
发明人： Karl G. Schwappach , Zine-Eddine Boutaghou
IPC分类号： B24B1/00 , B24D3/28 , B23P19/04 , C09K3/14 , B82Y30/00
CPC分类号： B24D11/00 , Y10T29/5397
摘要： An abrasive polishing slurry including abrasive particles in a carrier fluid and micro-nano members. A system and method for making an abrasive article using the polishing slurry is also disclosed. The system includes a gimballed dressing bar adapted to provide a compressive force sufficient to embed the abrasive particles into the substrate, wherein the members set a height the embedded abrasive particles protrude above the substrate.
摘要翻译：包括载体流体中的磨料颗粒和微纳米构件的研磨抛光浆料。还公开了使用抛光浆料制造磨料制品的系统和方法。该系统包括适于提供足以将磨料颗粒嵌入衬底中的压缩力的捣实的敷料棒，其中所述构件将嵌入的磨料颗粒设置在衬底上方的高度。

10. 发明申请

US20110080675A1 LOW HYSTERESIS BEARING 审中-公开
标题翻译：低滞后轴承
公开(公告)号：US20110080675A1
公开(公告)日：2011-04-07
申请号：US12766429
申请日：2010-04-23
申请人： Zine-Eddine Boutaghou , Karl G. Schwappach
发明人： Zine-Eddine Boutaghou , Karl G. Schwappach
IPC分类号： G11B5/56 , F16C19/00
CPC分类号： G11B5/4813 , F16C19/55 , F16C2370/12 , G11B5/5569
摘要： A low hysteresis pivot bearing suitable for a variety of applications. The relationship between torque and angular displacement is substantially linear, with negligible residual hysteresis. The pivot bearing includes a stationary shaft and at least one intermediate member pivotally connected to the stationary shaft by an intermediate member bearing. At least one outer sleeve is pivotally connected to the intermediate member by an outer sleeve bearing. At least one rotary actuator angularly displaces the intermediate member relative to the stationary shaft.
摘要翻译：适用于各种应用的低滞回枢轴轴承。扭矩和角位移之间的关系基本上是线性的，剩余滞后可忽略不计。枢转轴承包括固定轴和通过中间构件轴承枢转地连接到固定轴的至少一个中间构件。至少一个外套筒通过外套筒轴承枢转地连接到中间构件。至少一个旋转致动器相对于固定轴成角度地移动中间构件。

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