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    • 3. 发明授权
    • Self-assembled photonic crystals and methods for manufacturing same
    • 自组装光子晶体及其制造方法
    • US06858079B2
    • 2005-02-22
    • US09946343
    • 2001-09-06
    • David J. NorrisYurii VlasovXiang-Zheng BoJames C. Sturm
    • David J. NorrisYurii VlasovXiang-Zheng BoJames C. Sturm
    • C30B5/00G02B6/122G02B6/13C30B7/02
    • G02B1/005B82Y10/00B82Y20/00B82Y30/00C30B5/00C30B29/60G02B6/1225G02B6/13
    • Self-assembled photonic crystals, including large sphere planar opals, infiltrated planar opals and inverted planar opals, as well as methods for manufacturing same are provided. Large sphere planar opals are manufactured according to a method comprising the steps of: synthesizing monodisperse silica spheres, wherein each of the silica spheres has a diameter greater than or equal to about 400 nanometers; purifying the silica spheres; and self-assembling the silica spheres into a plurality of ordered, planar layers on a substrate. Infiltrated planar opals may also be manufactured by further processing the large sphere planar opal by sintering the planar opal and infiltrating the planar opal with a predetermined material. Inverted planar opals may further be manufactured by removing the silica spheres from the infiltrated planar opal. Various modifications to the substrate and planar opal are also provided to enhance the properties of these photonic crystals.
    • 提供了自组装光子晶体,包括大球平面蛋白石,渗透平面蛋白石和倒平面蛋白石,以及其制造方法。 根据包括以下步骤的方法制造大球状平面蛋白石:合成单分散二氧化硅球体,其中每个二氧化硅球体具有大于或等于约400纳米的直径; 净化二氧化硅球体; 并将二氧化硅球自组装成衬底上的多个有序的平面层。 渗透的平面蛋白石也可以通过用平面蛋白石烧结并用预定材料浸透平面蛋白石进一步加工大球面平面蛋白石来制造。 可以通过从渗透的平面蛋白石中除去二氧化硅球体来进一步制造反向平面蛋白石。 还提供了对基底和平面蛋白石的各种修改以增强这些光子晶体的性质。
    • 5. 发明授权
    • Micro-mechanical probes for charge sensing
    • 用于电荷感测的微机械探针
    • US06300756B2
    • 2001-10-09
    • US08873819
    • 1997-06-12
    • James C. SturmKiran PangalSamara L. Firebaugh
    • James C. SturmKiran PangalSamara L. Firebaugh
    • G01R2912
    • H01J37/32935
    • A method and apparatus for measuring a charge on a surface, such as on a semiconductor wafer, arising during plasma processing is provided. Such a charge may be measured on an insulating film applied to such a wafer. By the present invention, the charge on such an insulator exposed to plasma is measured in-situ using micro-cantilevers. The micro-cantilevers include an insulating base positioned on the substrate and a cantilevered beam extending therefrom to over the substrate. The beam is formed of a conductive material. A charge on the beam causes an opposite charge to form on the substrate. The opposite charges attract to move or deflect the beam towards the substrate. The amount of movement or deflection corresponds to the magnitude of the charge. This movement or deflection of the beam can be measured to determine the charge by bouncing a light source, such as a laser, off of the beam. In another embodiment, the cantilever includes a flexible bridge interconnected between the base and a rigid beam. In this embodiment, the surface of the beam does not bend. Rather, movement of the beam is accomplished by the bending of the flexible bridge. This allows for easier measurements of the movement of the beam because the surface of the beam remains planar.
    • 提供了一种用于测量在等离子体处理期间产生的诸如半导体晶片的表面上的电荷的方法和装置。 可以在施加到这种晶片的绝缘膜上测量这样的电荷。 通过本发明,使用微悬臂梁原位测量暴露于等离子体的这种绝缘体上的电荷。 微型悬臂包括位于基板上的绝缘基体和从其延伸到基板上方的悬臂梁。 光束由导电材料形成。 光束上的电荷导致在基板上形成相反的电荷。 相反的电荷吸引将光束移向或偏转朝向衬底。 移动量或偏转量对应于电荷的大小。 可以测量光束的这种移动或偏转,以通过使诸如激光器的光源从光束反射来确定电荷。 在另一个实施例中,悬臂包括在基座和刚性梁之间互连的柔性桥。 在本实施例中,光束的表面不弯曲。 而是通过柔性桥的弯曲实现梁的移动。 这允许更容易地测量光束的运动,因为光束的表面保持平面。