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1. 发明申请

WO2018121313A1 SYSTEMS AND METHODS FOR EXPOSURE CONTROL 审中-公开
公开(公告)号：WO2018121313A1
公开(公告)日：2018-07-05
申请号：PCT/CN2017/116728
申请日：2017-12-17
申请人： ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
发明人： ZHOU, Yanfen , PAN, Runfa , LI, Liangcheng , HUANG, Qianfeng , LU, Erli , CHEN, Mingzhu
IPC分类号： H04N5/235
摘要： The present disclosure relates to systems and methods for exposure control. The systems and methods may obtain a target frame brightness value of the image. The systems and methods may also obtain an exposure mode of the electronic device. The systems and methods may also obtain an exposure table corresponding to the exposure mode. The systems and methods may also determine a target value, corresponding to the target frame brightness value, for each of the one or more exposure parameters based on the exposure table. The systems and methods may also adjust one or more of the at least one lens, the at least one exposure-time controller, and the at least one sensor according to the target values of the one or more exposure parameters.

2. 发明申请

WO2018077156A1 SYSTEMS AND METHODS FOR EXPOSURE CONTROL 审中-公开
标题翻译：用于曝光控制的系统和方法
公开(公告)号：WO2018077156A1
公开(公告)日：2018-05-03
申请号：PCT/CN2017/107431
申请日：2017-10-24
申请人： ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
发明人： QU, Erping , HUANG, Qianfeng , PAN, Runfa , LI, Liangcheng
IPC分类号： H04N5/235
摘要： The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.
摘要翻译：本公开涉及用于确定具有一组曝光参数的成像装置的曝光设置的系统和方法。可以确定成像装置的目标亮度。可以获得对应表。对应表可涉及多组参考亮度值和该组曝光参数的多组操作值，一组操作值对应于参考亮度值。可以基于目标亮度和对应表来识别参考亮度值和该组曝光参数的一组操作值。可以基于所识别的一组操作值来确定成像设备的至少一个曝光参数的调整。成像设备的至少一个曝光参数可以基于所确定的调整进行调整。

3. 发明公开

EP3545671A1 SYSTEMS AND METHODS FOR EXPOSURE CONTROL 审中-公开
公开(公告)号：EP3545671A1
公开(公告)日：2019-10-02
申请号：EP17887589.4
申请日：2017-12-17
申请人： Zhejiang Dahua Technology Co., Ltd
发明人： ZHOU, Yanfen , PAN, Runfa , LI, Liangcheng , HUANG, Qianfeng , LU, Erli , CHEN, Mingzhu
IPC分类号： H04N5/235

4. 发明公开

EP3516862A1 SYSTEMS AND METHODS FOR EXPOSURE CONTROL 审中-公开
公开(公告)号：EP3516862A1
公开(公告)日：2019-07-31
申请号：EP17865891.0
申请日：2017-10-24
申请人： Zhejiang Dahua Technology Co., Ltd
发明人： QU, Erping , HUANG, Qianfeng , PAN, Runfa , LI, Liangcheng
IPC分类号： H04N5/235

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