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1. 发明申请

US20130258452A1 LIGHT DEFLECTING ELEMENT 审中-公开
标题翻译：光偏转元件
公开(公告)号：US20130258452A1
公开(公告)日：2013-10-03
申请号：US13730321
申请日：2012-12-28
申请人： Yuuzo KAMIGUCHI , Masahiro Kanamaru , Katsuya Sugawara , Keiichiro Yusu , Masatoshi Sakurai
发明人： Yuuzo KAMIGUCHI , Masahiro Kanamaru , Katsuya Sugawara , Keiichiro Yusu , Masatoshi Sakurai
IPC分类号： G02F1/29
CPC分类号： G02F1/29 , G02F1/2955
摘要： According to an embodiment, a light deflecting element includes a dielectric body, a first electrode, a second electrode, and a third electrode. Each of the second electrode and third electrode is configured to sandwich the dielectric body with the first electrode. The second electrode includes an electrode having a side that lies substantially orthogonal to an incident direction of a light beam, a side that is substantially parallel to the incident direction, and a side that intersects with the incident direction. The third electrode includes an electrode having a side that is aligned with the second electrode, a side that is substantially parallel to an incident direction of the light beam, and a side that intersects with the light beam, and that slopes in an opposite to that of the side of the second electrode that intersects with the light beam.
摘要翻译：根据实施例，光偏转元件包括电介质体，第一电极，第二电极和第三电极。第二电极和第三电极中的每一个被配置为将电介质体与第一电极夹在中间。第二电极包括具有基本上垂直于光束的入射方向的一侧的电极，基本上平行于入射方向的一侧以及与入射方向相交的一侧。第三电极包括具有与第二电极对准的一侧的电极，基本上平行于光束的入射方向的一侧和与光束相交的一侧，并且与该光束相反的一侧倾斜。与第二电极的与光束相交的一侧。

2. 发明申请

US20130259417A1 LIGHT DEFLECTING ELEMENT 有权
标题翻译：光偏转元件
公开(公告)号：US20130259417A1
公开(公告)日：2013-10-03
申请号：US13726953
申请日：2012-12-26
申请人： Yuuzo Kamiguchi , Katsuya Sugawara , Masahiro Kanamaru , Keiichiro Yusu , Masatoshi Sakurai
发明人： Yuuzo Kamiguchi , Katsuya Sugawara , Masahiro Kanamaru , Keiichiro Yusu , Masatoshi Sakurai
IPC分类号： G02F1/29
CPC分类号： G02F1/29 , G02F1/2955
摘要： According to an embodiment, a light deflecting element includes a dielectric body, a first electrode, and a second electrode. The second electrode is configured to sandwich the dielectric body with the first electrode so as to apply a voltage to the dielectric body. The second electrode includes orthogonal portions that are substantially orthogonal to an incident direction of a light beam passing through the dielectric body, parallel portions that are substantially parallel to the incident direction of the light beam. The orthogonal portions and the parallel portions are formed in an alternate manner on the light beam incident side of the dielectric body. The second electrode includes a linear sloping portion that slopes in a direction toward intersection with the incident direction of the light beam. The orthogonal portions, the parallel portions, and the linear sloping portion are formed integrally.
摘要翻译：根据实施例，光偏转元件包括电介质体，第一电极和第二电极。第二电极被配置为将电介质体与第一电极夹住，以向电介质体施加电压。第二电极包括基本上垂直于通过电介质体的光束的入射方向的正交部分，该平行部分基本上平行于光束的入射方向。正交部分和平行部分以交替的方式形成在介电体的光束入射侧。第二电极包括在与光束的入射方向交叉的方向上倾斜的线性倾斜部分。正交部分，平行部分和直线倾斜部分一体地形成。

3. 发明授权

US08989525B2 Light deflecting element 有权
标题翻译：光偏转元件
公开(公告)号：US08989525B2
公开(公告)日：2015-03-24
申请号：US13726953
申请日：2012-12-26
申请人： Yuuzo Kamiguchi , Katsuya Sugawara , Masahiro Kanamaru , Keiichiro Yusu , Masatoshi Sakurai
发明人： Yuuzo Kamiguchi , Katsuya Sugawara , Masahiro Kanamaru , Keiichiro Yusu , Masatoshi Sakurai
IPC分类号： G02F1/295 , G02F1/29
CPC分类号： G02F1/29 , G02F1/2955
摘要： According to an embodiment, a light deflecting element includes a dielectric body, a first electrode, and a second electrode. The second electrode is configured to sandwich the dielectric body with the first electrode so as to apply a voltage to the dielectric body. The second electrode includes orthogonal portions that are substantially orthogonal to an incident direction of a light beam passing through the dielectric body, parallel portions that are substantially parallel to the incident direction of the light beam. The orthogonal portions and the parallel portions are formed in an alternate manner on the light beam incident side of the dielectric body. The second electrode includes a linear sloping portion that slopes in a direction toward intersection with the incident direction of the light beam. The orthogonal portions, the parallel portions, and the linear sloping portion are formed integrally.
摘要翻译：根据实施例，光偏转元件包括电介质体，第一电极和第二电极。第二电极被配置为将电介质体与第一电极夹住，以向电介质体施加电压。第二电极包括基本上垂直于通过电介质体的光束的入射方向的正交部分，该平行部分基本上平行于光束的入射方向。正交部分和平行部分以交替的方式形成在介电体的光束入射侧。第二电极包括在与光束的入射方向交叉的方向上倾斜的线性倾斜部分。正交部分，平行部分和直线倾斜部分一体地形成。

4. 发明授权

US09409238B2 Hard coating for cutting tool, and cutting tool coated with hard coating 有权
标题翻译：硬质涂层用于切削刀具，切削刀具涂有硬质涂层
公开(公告)号：US09409238B2
公开(公告)日：2016-08-09
申请号：US14389879
申请日：2012-04-09
申请人： Masatoshi Sakurai , Takaomi Toihara
发明人： Masatoshi Sakurai , Takaomi Toihara
IPC分类号： B23B27/14 , B23B51/00 , C23C30/00 , C23C14/34 , C23C28/00
CPC分类号： B23B51/00 , B23B2222/04 , B23B2222/76 , C22C2204/00 , C23C14/345 , C23C28/321 , C23C28/34 , C23C28/341 , C23C28/3455 , C23C28/42 , C23C30/005 , Y10T428/24975
摘要： A hard coating for a cutting tool being highly resistant to both wear and seizure; and a cutting tool coated with the hard coating. This hard coating is a multilayer film including two or more of the following layered in alternation: first coating layers including AgaCu1-a; and second coating layers including a nitride, oxide, carbide, carbonitride, or boride containing at least one element selected from among group IVA, VA, and VIA elements, aluminum, and silicon. Since the atomic proportion for the first coating layers is between 0.2 and 0.4, inclusive, the layering pitch of the first and second coating layers is between 0.2 and 100 nm, inclusive, and the total thickness is between 0.2 and 10.0 μm, inclusive, the coefficient of friction and cutting resistance can be reduced by the inclusion of silver in the coating, and provide a hard coating that exhibits superb lubricity and resistance to seizure.
摘要翻译：用于切削工具的硬涂层对于磨损和咬合具有高度抗性; 以及用硬涂层涂覆的切削工具。这种硬涂层是包括交替层叠的两个或更多个以下的多层膜：包括AgaCu1-a的第一涂层; 以及包含含有选自IVA，VA和VIA族元素中的至少一种元素的氮化物，氧化物，碳化物，碳氮化物或硼化物的第二涂层，铝和硅。由于第一涂层的原子比例在0.2和0.4之间，因此第一和第二涂层的层叠间距在0.2-100nm之间，总厚度在0.2和10.0μm之间，可以通过在涂层中包含银来降低摩擦系数和切割阻力，并提供显示出极好的润滑性和抗咬合性的硬涂层。

5. 发明授权

US08778162B2 Stamper and method of manufacturing the same 失效
标题翻译：压模及其制造方法
公开(公告)号：US08778162B2
公开(公告)日：2014-07-15
申请号：US13077537
申请日：2011-03-31
申请人： Masatoshi Sakurai , Takuya Shimada , Shinobu Sugimura , Satoshi Shirotori
发明人： Masatoshi Sakurai , Takuya Shimada , Shinobu Sugimura , Satoshi Shirotori
IPC分类号： C25D1/00 , C25D1/20
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855 , G11B5/858
摘要： According to one embodiment, a stamper manufacturing method comprises electroless plating by using a master includes a substrate, a conductive underlayer formed on the substrate and having catalytic activity, projecting patterns having no catalytic activity and partially formed on a surface of the conductive underlayer having catalytic activity, and regions in which the conductive underlayer having catalytic activity is exposed between the projecting patterns to deposit selectively an amorphous conductive layer between the projecting patterns and in the regions in which the conductive underlayer is exposed, and forming stamper projections, electroplating on the stamper projections includes the projecting patterns and the amorphous conductive layer by using the amorphous conductive layer and the conductive underlayer as electrodes to form a stamper main body made of a crystalline metal, and releasing a stamper includes the stamper projections and the stamper main body from the master.
摘要翻译：根据一个实施例，压模制造方法包括使用主体的无电镀，其包括基板，形成在基板上的具有催化活性的导电底层，具有催化活性的突出图案，并部分地形成在具有催化作用的导电底层的表面上活性以及其中具有催化活性的导电底层在突出图案之间暴露的区域，以选择性地沉积在突出图案之间的非晶导体层和导电底层暴露的区域中，并且形成压模突起，在压模上电镀突起包括通过使用非晶导体层和导电底层作为电极形成由结晶金属制成的压模主体的突出图案和非晶导体层，并且释放压模包括压模主体和压模主体。

6. 发明申请

US20130309469A1 HARD LAMINAR COATING 有权
标题翻译：硬木地板涂料
公开(公告)号：US20130309469A1
公开(公告)日：2013-11-21
申请号：US13982860
申请日：2011-02-01
申请人： Masatoshi Sakurai , Toshihiro Ohchi
发明人： Masatoshi Sakurai , Toshihiro Ohchi
IPC分类号： C23C14/14
CPC分类号： C23C14/14 , C23C14/06 , C23C14/067 , C23C28/044 , C23C28/42 , Y10T428/24975
摘要： A hard laminar coating having a first film and a second film having respective different compositions and alternately laminated on a surface of a base structure, wherein the first film is a carbide, a nitride, a carboxide, a nitroxide, a carbonitride or a carbo-oxynitride of (AlaCrbBc), while the second film is TiB2, the hard laminar coating configured to include atomic ratios a, b and c in the first film satisfying a=1−b−c, 0.2≦b≦0.7, and 0
摘要翻译：一种硬层状涂层，其具有第一膜和第二膜，其具有各自不同的组成并且交替地层压在基底结构的表面上，其中所述第一膜为碳化物，氮化物，羧化物，氮氧化物，碳氮化物或碳 - （AlaCrbBc）的氮氧化物，而第二膜为TiB2时，硬质层状涂层被配置为包含第一膜中的原子比a，b和c，满足a = 1-bc，0.2 @ b @ 0.7和0

7. 发明授权

US08507116B2 Magnetic recording medium and manufacturing method thereof 有权
标题翻译：磁记录介质及其制造方法
公开(公告)号：US08507116B2
公开(公告)日：2013-08-13
申请号：US13175485
申请日：2011-07-01
申请人： Takeshi Iwasaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
发明人： Takeshi Iwasaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
IPC分类号： G11B5/127
CPC分类号： G11B5/8404 , G11B5/746 , G11B5/82 , G11B5/855 , Y10T428/11
摘要： According to one embodiment, a magnetic recording medium includes a substrate, a soft magnetic layer, an underlayer, a magnetic recording layer, and a protective layer, wherein the magnetic recording layer is provided with a pattern including recording portions and non-recording portions, the non-recording portions have a composition that is equal to a composition obtained by demagnetizing the recording portions, the non-recording portions contain at least one metal element selected from the group consisting of vanadium and zirconium and at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen, and the at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen is contained in the non-recording portions at a higher content than the content of the at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen in the recording portions.
摘要翻译：根据一个实施例，磁记录介质包括衬底，软磁层，底层，磁记录层和保护层，其中磁记录层设置有包括记录部分和非记录部分的图案，非记录部分的组成等于通过使记录部分退磁获得的组合物，非记录部分含有至少一种选自钒和锆的金属元素和至少一种选自组中的元素由氮，碳，硼和氧组成，并且所述至少一种选自氮，碳，硼和氧的元素以比所述至少一种元素的含量更高的含量包含在非记录部分中在记录部分中选自氮，碳，硼和氧。

8. 发明授权

US08440091B2 Magnetic recording medium and method of manufacturing the same 失效
标题翻译：磁记录介质及其制造方法
公开(公告)号：US08440091B2
公开(公告)日：2013-05-14
申请号：US12638841
申请日：2009-12-15
申请人： Kaori Kimura , Yoshiyuki Kamata , Satoshi Shirotori , Masatoshi Sakurai
发明人： Kaori Kimura , Yoshiyuki Kamata , Satoshi Shirotori , Masatoshi Sakurai
IPC分类号： B44C1/22 , G11B5/82
CPC分类号： G11B5/855
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium comprises forming a protective film on a ferromagnetic recording layer containing Cobalt (Co) on a substrate and forming a recess in both the protective film and the ferromagnetic recording layer at a part where a nonmagnetic layer is to be formed. The method further comprises removing Co from a part of the recess of the ferromagnetic recording layer to form the nonmagnetic layer that separates magnetic patterns made of the ferromagnetic recording layer containing Co. The nonmagnetic layer has an identical chemical composition as the ferromagnetic recording layer, except for the nonmagnetic layer having a lower Co concentration than the magnetic patterns.
摘要翻译：根据一个实施例，制造磁记录介质的方法包括在包含钴（Co）的铁磁记录层上形成保护膜，并在保护膜和铁磁记录层中形成凹部，将形成非磁性层。该方法还包括从铁磁记录层的凹部的一部分去除Co以形成分离由含有Co的铁磁记录层制成的磁图案的非磁性层。非磁性层具有与铁磁记录层相同的化学成分，对于具有比磁图案低的Co浓度的非磁性层。

9. 发明授权

US08419952B2 Method of manufacturing magnetic recording medium and magnetic recording apparatus 有权
标题翻译：制造磁记录介质和磁记录装置的方法
公开(公告)号：US08419952B2
公开(公告)日：2013-04-16
申请号：US13166718
申请日：2011-06-22
申请人： Masatoshi Sakurai , Kaori Kimura , Hiroyuki Hyodo , Takeshi Iwasaki
发明人： Masatoshi Sakurai , Kaori Kimura , Hiroyuki Hyodo , Takeshi Iwasaki
IPC分类号： B44C1/22
CPC分类号： B44C1/22 , G11B5/746 , G11B5/855 , Y10T428/11
摘要： According to one embodiment, a method of manufacturing a patterned medium includes forming an implantation depth-adjusting layer above a magnetic recording layer, the magnetic recording layer being made of a material that is deactivated when implanted with a chemical species, and the implantation depth-adjusting layer being made of a material that is etched when irradiated with an ion beam of the chemical species and irradiating the implantation depth-adjusting layer with the ion beam to implant the chemical species into a part of the magnetic recording layer through the implantation depth-adjusting layer while etching the implantation depth-adjusting layer by an action of the ion beam to decrease a thickness of the implantation depth-adjusting layer.
摘要翻译：根据一个实施例，制造图案化介质的方法包括在磁记录层上形成注入深度调节层，所述磁记录层由在注入化学物质时失活的材料制成，所述调整层由当被所述化学物质的离子束照射时被蚀刻的材料制成，并且用所述离子束照射所述注入深度调节层，以通过所述植入深度调制层将所述化学物质注入到所述磁记录层的一部分中，同时通过离子束的作用蚀刻植入深度调节层，以减小注入深度调节层的厚度。

10. 发明授权

US08318331B2 Magnetic recording medium, method for manufacturing the same, and magnetic recording apparatus 有权
标题翻译：磁记录介质，其制造方法和磁记录装置
公开(公告)号：US08318331B2
公开(公告)日：2012-11-27
申请号：US11942904
申请日：2007-11-20
申请人： Masatoshi Sakurai , Yoshiyuki Kamata , Satoshi Shirotori
发明人： Masatoshi Sakurai , Yoshiyuki Kamata , Satoshi Shirotori
IPC分类号： G11B5/127 , G11B5/82 , G09B5/228 , G09B5/293 , G09B5/306
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/59688 , G11B5/743 , G11B5/855
摘要： According to one embodiment, a magnetic recording medium includes a substrate, and a magnetic recording layer formed on the substrate and having patterns of protrusions and recesses corresponding to a servo area and a recording area, in which the magnetic recording layer located in each of the recesses in the recording area has a thickness smaller than two thirds of a thickness of the magnetic recording layer corresponding to each of the protrusions, the magnetic recording layer remaining in each of the recesses in the recording area has a thickness of 1 nm or more, and a difference in height on a surface of the magnetic recording medium is 7 nm or less.
摘要翻译：根据一个实施例，磁记录介质包括基板和形成在基板上并具有对应于伺服区域和记录区域的突起和凹槽的图案的磁记录层，其中磁记录层位于每个记录区域中的凹部的厚度小于与每个突起相对应的磁记录层的厚度的三分之二，记录区域中每个凹槽中残留的磁记录层的厚度为1nm以上，并且磁记录介质的表面上的高度差为7nm以下。

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