会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明申请
    • Surface treated electrodeposited copper foil, the production method and circuit board
    • 表面处理电沉积铜箔,生产方法和电路板
    • US20070287020A1
    • 2007-12-13
    • US11808049
    • 2007-06-06
    • Takahiro SaitoSadao MatsumotoYuuji Suzuki
    • Takahiro SaitoSadao MatsumotoYuuji Suzuki
    • C22C9/00
    • H05K3/384H05K2201/0355H05K2203/0723Y10T428/12431Y10T428/12569Y10T428/12903
    • To provide a surface treated electrodeposited copper foil having a smooth M surface with less asperity on the surface instead of an S surface affected by stripes transferred from a surface drum; a surface treatment is performed on the M surface being an opposite surface of a surface which contacted with a drum in an electrodeposited copper foil, wherein Rz is 1.0 μm or smaller and Ra is 0.2 μm or smaller on the M surface, electrodeposited copper plating is performed to produce a copper foil under a condition of using a copper sulfate bath, wherein a copper concentration is 50 to 80 g/l, a sulfuric acid concentration is 30 to 70 g/l, a solution temperature is 35 to 45° C., a chloride concentration is 0.01 to 30 ppm, an adding concentration of a total of an organic sulfur based compound, low molecular weight glue and polymeric polysaccharide is 0.1 to 100 ppm and TOC (total organic carbon) is 400 ppm or smaller, and a current density is 20 to 50 A/dm2, and a surface treatment is performed on an M surface of the copper foil to attain Rz of 1.0 μm or smaller and Ra of 0.2 μm or smaller on the M surface.
    • 提供具有光滑M表面的表面处理电沉积铜箔,而不是表面受到从表面转鼓传送的条纹影响的S表面; 在M表面上进行表面处理,M表面是与电沉积铜箔中的滚筒接触的表面的相对表面,其中Rz为1.0μm或更小,并且Ra为0.2μm或更小,电沉积铜镀层为 在使用硫酸铜浴的条件下进行铜箔的制造,铜浓度为50〜80g / l,硫酸浓度为30〜70g / l,溶液温度为35〜45℃。 氯化物浓度为0.01〜30ppm,有机硫系化合物,低分子量胶和聚合多糖的总添加浓度为0.1〜100ppm,TOC(总有机碳)为400ppm以下, 电流密度为20〜50A / dm 2,对铜箔的M面进行表面处理,使M表面的Rz为1.0μm以下,Ra为0.2μm以下。