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1. 发明授权

US4352167A Method of locating sound generation within enclosure 失效
标题翻译：定位外壳内声音产生的方法
公开(公告)号：US4352167A
公开(公告)日：1982-09-28
申请号：US129559
申请日：1980-03-12
申请人： Yuuji Hashimoto , Izumi Kobayashi , Mitsuo Suzuki , Kimio Yamada , Shigeru Izumi , Yoshihiro Michiguchi
发明人： Yuuji Hashimoto , Izumi Kobayashi , Mitsuo Suzuki , Kimio Yamada , Shigeru Izumi , Yoshihiro Michiguchi
IPC分类号： G01H17/00 , G01N29/14 , G01S5/22 , G01S5/30 , G21C17/00 , G21C17/04 , G01S5/18
CPC分类号： G01S5/22 , G01S5/30
摘要： A number of sound detectors are provided on an external enclosure of a pressure vessel of a nuclear reactor. Output signals produced from the individual detectors are combined into a pattern in terms of time difference of the detector output signals relative to the time point at which the detected signal is first produced in response to the sound signal and relative peak values of the detector output signals relative to the magnitude of the output signal produced by the detector which detects the sound signal with the highest sensitivity. The pattern thus obtained is then compared with patterns which have been previously prepared by intentionally producing the sound signals at locations in interest within the pressure vessel, to thereby estimate the location within the pressure vessel at which the sound is produced.
摘要翻译：在核反应堆的压力容器的外壳上设置有多个声音检测器。根据检测器输出信号相对于首先产生检测信号的时间点的响应于声音信号和检测器输出信号的相对峰值的时间差，从各个检测器产生的输出信号被组合成模式相对于由检测器产生的输出信号的大小来检测具有最高灵敏度的声音信号。然后将如此获得的图案与先前通过在压力容器内有意产生声音信号的位置产生的图案进行比较，从而估计产生声音的压力容器内的位置。

2. 发明授权

US5991360A Laser plasma x-ray source, semiconductor lithography apparatus using the same and a method thereof 失效
标题翻译：激光等离子体X射线源，使用其的半导体光刻设备及其方法
公开(公告)号：US5991360A
公开(公告)日：1999-11-23
申请号：US18316
申请日：1998-02-03
申请人： Tetsuya Matsui , Kimio Yamada , Masatsugu Nishi , Manabu Ueno , Masahiro Tooma
发明人： Tetsuya Matsui , Kimio Yamada , Masatsugu Nishi , Manabu Ueno , Masahiro Tooma
IPC分类号： G21K5/02 , G03F7/20 , H01J35/00 , H01L21/027 , H05G2/00 , H05H1/24 , H01J35/08
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H05G2/008
摘要： A laser plasma X-ray source has an improved X-ray conversion efficiency and a minimized occurrence of debris, and a semiconductor lithography apparatus using the same and a method therefor are provided. An X-ray generation unit has a vacuum chamber 5 which encases the target; target supply unit 110 which supplies a fine particle mixture gas target into the vacuum chamber 5; a laser irradiation unit 120 which irradiates a laser beam 2 on the particle mixture gas target 10; and a target recovery unit 130 which recovers unused particle mixture gas target from the vacuum chamber 5.
摘要翻译：激光等离子体X射线源具有改善的X射线转换效率和最小化碎屑的出现，并且提供了使用其的半导体光刻设备及其方法。 X射线产生单元具有包围靶的真空室5; 目标供给单元110，其将微粒混合气体目标供给到真空室5中; 将激光束2照射在粒子混合气体靶10上的激光照射部120; 以及从真空室5回收未使用的混合气体目标的目标恢复单元130。

3. 发明授权

US4153832A Overhead submerged arc welding process 失效
标题翻译：架空埋弧焊工艺
公开(公告)号：US4153832A
公开(公告)日：1979-05-08
申请号：US723046
申请日：1976-09-13
申请人： Katsuro Iio , Naoki Takenouchi , Kimio Yamada
发明人： Katsuro Iio , Naoki Takenouchi , Kimio Yamada
IPC分类号： B23K9/32 , B23K9/18
CPC分类号： B23K9/324
摘要： The present disclosure relates to an overhead submerged arc welding process wherein a flux for the submerged arc welding is supplied from the underside of the welding line while at the same time a consumable electrode is supplied from the underside of the welding line, the process being characterized by maintaining the interrelationship between a flux supply cylinder and the plates to be welded such that the length from the under surfaces of the plates to be welded to the upper end of the open flux supply cylinder and the diameter D of the opening at the end of the flux supply cylinder is represented by the formula 2.ltoreq.D/I.ltoreq.15.
摘要翻译：本公开涉及一种架空埋弧焊接工艺，其中用于浸没电弧焊接的焊剂从焊接线的下侧供应，同时从焊接线的下侧供应可消耗电极，该工艺被表征通过保持焊剂供应圆筒和待焊接的板之间的相互关系，使得从待焊接的板的下表面到开放式焊剂供应圆筒的上端的长度以及在开放焊剂供应圆筒的端部的开口的直径D 磁通供应气缸由公式2表示：D / I

4. 发明授权

US07719463B2 Reflectarray and a millimetre wave radar 有权
标题翻译：反射镜和毫米波雷达
公开(公告)号：US07719463B2
公开(公告)日：2010-05-18
申请号：US12092274
申请日：2006-10-27
申请人： Claire Blandine Migliaccio , Binh Duong Nguyen , Christian Yves Dominique Pichot Du Mezeray , Kazuo Yamamoto , Naruto Yonemoto , Kimio Yamada
发明人： Claire Blandine Migliaccio , Binh Duong Nguyen , Christian Yves Dominique Pichot Du Mezeray , Kazuo Yamamoto , Naruto Yonemoto , Kimio Yamada
IPC分类号： G01S13/00 , H01Q13/00
CPC分类号： H01Q9/0464 , G01S13/9303 , H01Q3/46 , H01Q15/0006 , H01Q15/242
摘要： The reflectarray comprises an array of patch elements (10-13). Each patch element has a cut ring shape formed of a conductive ring with at least one crossing gap. The outer diameter and inner diameter and crossing gap are adjusted so that a phase shift β defined by the following relations is different from zero: φ(Eox)=φ(Eix)+α (1) φ(Eoy)=φ(Eiy)+α+β (2) where: −φ(Eox) and φ(Eoy) are the phases of the orthogonal components and of the reflected wave, respectively, −φ(Eix) and φ(Eiy) are the phases of orthogonal components and of the incident wave, respectively, −α is a phase angle.
摘要翻译：反射阵列包括一组补片元件（10-13）。每个贴片元件具有由具有至少一个交叉间隙的导电环形成的切割环形状。调整外径和内径及交叉间隙，使相位偏移由以下关系定义的不同于：＆phgr;（Eox）=＆phgr;（Eix）+α（1）＆phgr;（Eoy）=＆phgr;（Eiy）+α+＆bgr; （2）其中： - ＆phgr（Eox）和＆phgr（Eoy）分别是正交分量和反射波的相位， - ＆phgr（Eix）和＆phgr（Eiy）是正交分量的相位和入射波分别为-α为相位角。

5. 发明申请

US20090153391A1 REFLECTARRAY AND A MILLIMETRE WAVE RADAR 有权
标题翻译：反思和一个毫米波雷达
公开(公告)号：US20090153391A1
公开(公告)日：2009-06-18
申请号：US12092274
申请日：2006-10-27
申请人： Claire Blandine Migliaccio , Binh Duong Nguyen , Christian Yves Dominique Pichot Du Mezeray , Kazuo Yamamoto , Naruto Yonemoto , Kimio Yamada
发明人： Claire Blandine Migliaccio , Binh Duong Nguyen , Christian Yves Dominique Pichot Du Mezeray , Kazuo Yamamoto , Naruto Yonemoto , Kimio Yamada
IPC分类号： H01Q15/14 , H01Q3/46
CPC分类号： H01Q9/0464 , G01S13/9303 , H01Q3/46 , H01Q15/0006 , H01Q15/242
摘要： The reflectarray comprises an array of patch elements (10-13). Each patch element has a cut ring shape formed of a conductive ring with at least one crossing gap. The outer diameter and inner diameter and crossing gap are adjusted so that a phase shift β defined by the following relations is different from zero: φ(Eox)=φ(Eix)+α (1) φ(Eoy)=φ(Eiy)+α+β (2) where: −φ(Eox) and φ(Eoy) are the phases of the orthogonal components and of the reflected wave, respectively, −φ(Eix) and φ(Eiy) are the phases of orthogonal components and of the incident wave, respectively, −α is a phase angle.
摘要翻译：反射阵列包括一组补片元件（10-13）。每个贴片元件具有由具有至少一个交叉间隙的导电环形成的切割环形状。调整外径和内径和交叉间隙，使得由以下关系定义的相移β不同于零：phi（Eox）= phi（Eix）+ alpha（1）phi（Eoy）= phi（Eiy） +α+β（2）其中：-phi（Eox）和phi（Eoy）分别是正交分量和反射波的相位，-phi（Eix）和phi（Eiy）是正交分量的相位和入射波分别为α为相位角。

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