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    • 3. 发明授权
    • Image forming apparatus and head drive control method
    • 图像形成装置和头驱动控制方法
    • US08955932B2
    • 2015-02-17
    • US14207437
    • 2014-03-12
    • Atsushi YanakaTakahiro YoshidaYuu Kimura
    • Atsushi YanakaTakahiro YoshidaYuu Kimura
    • B41J2/15B41J2/045
    • B41J2/04588B41J2/04581B41J2/14274B41J2002/14403
    • A head drive control unit generates and outputs a pulse formed of a first expansion waveform element to expand individual liquid chambers, a first contraction waveform element to contract the individual liquid chambers, a second expansion waveform element to expand the individual liquid chambers, and a second contraction waveform element to return the individual liquid chambers that have repeatedly expanded and contracted to an initial state. The first contraction waveform element serves as a waveform element that contracts the individual liquid chambers at a timing of resonance with a change in a pressure in the individual liquid chambers due to the first expansion waveform element. The second contraction waveform element serves as a waveform element that suppresses the change in the pressure in the individual liquid chambers.
    • 头驱动控制单元产生并输出由第一膨胀波形元件形成的脉冲以扩展各个液室,第一收缩波形元件以收缩各个液室,第二膨胀波形元件以使各个液室膨胀,并且第二 收缩波形元件使已经反复膨胀和收缩的各个液室返回初始状态。 第一收缩波形元件用作在由于第一膨胀波形元素而在各个液体室中的压力变化的共振时刻收缩各个液体室的波形元件。 第二收缩波形元件用作抑制各个液室中的压力变化的波形元件。
    • 4. 发明申请
    • IMAGE FORMING APPARATUS AND HEAD DRIVE CONTROL METHOD
    • 图像形成装置和头驱动控制方法
    • US20140285554A1
    • 2014-09-25
    • US14207437
    • 2014-03-12
    • Atsushi YanakaTakahiro YoshidaYuu Kimura
    • Atsushi YanakaTakahiro YoshidaYuu Kimura
    • B41J2/045
    • B41J2/04588B41J2/04581B41J2/14274B41J2002/14403
    • A head drive control unit generates and outputs a pulse formed of a first expansion waveform element to expand individual liquid chambers, a first contraction waveform element to contract the individual liquid chambers, a second expansion waveform element to expand the individual liquid chambers, and a second contraction waveform element to return the individual liquid chambers that have repeatedly expanded and contracted to an initial state. The first contraction waveform element serves as a waveform element that contracts the individual liquid chambers at a timing of resonance with a change in a pressure in the individual liquid chambers due to the first expansion waveform element. The second contraction waveform element serves as a waveform element that suppresses the change in the pressure in the individual liquid chambers.
    • 头驱动控制单元产生并输出由第一膨胀波形元件形成的脉冲以扩展各个液室,第一收缩波形元件以收缩各个液室,第二膨胀波形元件以使各个液室膨胀,并且第二 收缩波形元件使已经反复膨胀和收缩的各个液室返回初始状态。 第一收缩波形元件用作在由于第一膨胀波形元素而在各个液体室中的压力变化的共振时刻收缩各个液体室的波形元件。 第二收缩波形元件用作抑制各个液室中的压力变化的波形元件。
    • 9. 发明授权
    • Plating pretreatment solution and method for producing aluminum substrate for hard disk devices using same
    • 电镀预处理液及其制造方法
    • US09127170B2
    • 2015-09-08
    • US13981355
    • 2012-01-19
    • Nobuaki MukaiTakahiro Yoshida
    • Nobuaki MukaiTakahiro Yoshida
    • G11B5/84C09D1/00C23C18/18C23C18/32B05D3/10
    • C09D1/00B05D3/102C23C18/1831C23C18/32
    • An object of the invention is to provide a plating pretreatment solution that can convert the surface of an aluminum substrate for hard disk devices into a surface suitable for electroless nickel plating, and a method for producing an aluminum substrate for hard disk devices using the same. The plating pretreatment solution of the present invention used for a plating pretreatment in production of an aluminum substrate for hard disk devices has an iron ion concentration of 0.1 g/l to 1.0 g/l and a nitric acid concentration of 2.0 wt % to 12.0 wt %. This plating pretreatment solution is used for a pretreatment of a plating step in which electroless nickel plating is applied to an aluminum substrate for hard disk devices. Accordingly, the surface of the aluminum substrate for hard disk devices is converted into a surface suitable for electroless Ni plating, and a smooth surface of a plated film is obtained by suppressing generation of waviness, nodules, and pits on the plated surface when electroless nickel plating is performed in the plating step.
    • 本发明的目的是提供一种电镀预处理溶液,其可以将用于硬盘装置的铝基板的表面转换成适用于无电解镀镍的表面,以及用于制造使用其的硬盘装置的铝基板的方法。 用于硬盘装置的铝基板的电镀预处理的本发明的电镀预处理液的铁离子浓度为0.1g / l〜1.0g / l,硝酸浓度为2.0〜12.0wt %。 该电镀预处理溶液用于将硬化镍电镀用于硬盘装置的铝基板的电镀步骤的预处理。 因此,用于硬盘装置的铝基板的表面被转换成适合于化学镀镍的表面,并且当化学镀镍时,通过抑制电镀表面上的波纹,结块和凹坑的产生,获得镀膜的光滑表面 在电镀步骤中进行电镀。