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    • 4. 发明申请
    • POLISHING LIQUID FOR METAL FILM AND POLISHING METHOD
    • 抛光液用于金属膜和抛光方法
    • US20100323584A1
    • 2010-12-23
    • US12668096
    • 2008-07-08
    • Kouji HagaMasato FukasawaJin AmanokuraHiroshi Nakagawa
    • Kouji HagaMasato FukasawaJin AmanokuraHiroshi Nakagawa
    • B24B1/00C09K13/00
    • H01L21/30625C09G1/02H01L21/3212
    • The invention relates to a polishing liquid for metal film comprising 7.0% by weight or more of an oxidizer for metal, a water-soluble polymer, an oxidized metal dissolving agent, a metal anticorrosive agent and water, provided that the total amount of the polishing liquid for metal film is 100% by weight, wherein the water-soluble polymer has a weight average molecular weight of 150,000 or more and is at least one member selected from among a polycarboxylic acid, a salt of a polycarboxylic acid, and a polycarboxylic acid ester. According to the invention, provided is a polishing liquid for metal film, by which polishing can be performed at a high rate even under a polishing pressure as low as 1 psi or lower, and such that a polished film after polishing is excellent in planarity, furthermore, with which a high polishing rate can be obtained even in an initial stage of polishing, and provided is a polishing method using the polishing liquid.
    • 本发明涉及一种用于金属膜的抛光液,其包含7.0重量%或更多的金属氧化剂,水溶性聚合物,氧化金属溶解剂,金属防腐剂和水,条件是抛光总量 金属膜用液体为100重量%,其中,所述水溶性聚合物的重均分子量为15万以上,为选自多元羧酸,多元羧酸和多元羧酸中的至少1种 酯。 根据本发明,提供了一种用于金属膜的抛光液,即使在低至1psi或更低的抛光压力下也可以以高速率进行抛光,并且抛光后的抛光膜的平面度优异, 此外,即使在研磨的初始阶段也可以获得高抛光速率,并且提供了使用抛光液的抛光方法。
    • 5. 发明授权
    • Polishing liquid for metal film and polishing method
    • 抛光液用于金属膜和抛光方法
    • US08501625B2
    • 2013-08-06
    • US12668096
    • 2008-07-08
    • Kouji HagaMasato FukasawaJin AmanokuraHiroshi Nakagawa
    • Kouji HagaMasato FukasawaJin AmanokuraHiroshi Nakagawa
    • C09G1/02C09G1/04
    • H01L21/30625C09G1/02H01L21/3212
    • The invention relates to a polishing liquid for metal film comprising 7.0% by weight or more of an oxidizer for metal, a water-soluble polymer, an oxidized metal dissolving agent, a metal anticorrosive agent and water, provided that the total amount of the polishing liquid for metal film is 100% by weight, wherein the water-soluble polymer has a weight average molecular weight of 150,000 or more and is at least one member selected from among a polycarboxylic acid, a salt of a polycarboxylic acid, and a polycarboxylic acid ester. According to the invention, provided is a polishing liquid for metal film, by which polishing can be performed at a high rate even under a polishing pressure as low as 1 psi or lower, and such that a polished film after polishing is excellent in planarity, furthermore, with which a high polishing rate can be obtained even in an initial stage of polishing, and provided is a polishing method using the polishing liquid.
    • 本发明涉及一种用于金属膜的抛光液,其包含7.0重量%或更多的金属氧化剂,水溶性聚合物,氧化金属溶解剂,金属防腐剂和水,条件是抛光总量 金属膜用液体为100重量%,其中,所述水溶性聚合物的重均分子量为15万以上,为选自多元羧酸,多元羧酸和多元羧酸中的至少1种 酯。 根据本发明,提供了一种用于金属膜的抛光液,即使在低至1psi或更低的抛光压力下也可以以高速率进行抛光,并且抛光后的抛光膜的平面度优异, 此外,即使在研磨的初始阶段也可以获得高抛光速率,并且提供了使用抛光液的抛光方法。