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    • 9. 发明授权
    • Method of manufacturing a thin-film magnetic device
    • 制造薄膜磁性装置的方法
    • US6042899A
    • 2000-03-28
    • US172851
    • 1998-10-15
    • Akira Ishiguro
    • Akira Ishiguro
    • H01F41/22H01F10/26H01F41/14H01F41/34H01L23/522H01F1/00
    • H01F10/26H01F41/14H01F41/34H01L23/5227H01L2924/0002
    • In a method of manufacturing a thin-film magnetic device having a magnetic film provided with uniaxial magnetic anisotropy, the magnetic film, which is formed on a Si wafer, is patterned, before it is heat-treated in a magnetic field, in such a manner that the length of the magnetic film in a direction parallel to that of the magnetic field is greater than the length of the magnetic film in a direction perpendicular thereto. The magnetic film is divided into band-like magnetic films, and the band-like magnetic films are heat-treated in the magnetic field and each provided with uniaxial magnetic anisotropy. The band-like magnetic films are patterned and each divided again into magnetic films of a chip size. Thus, a crack or a blister can be prevented from occurring on the magnetic film, and the magnetic characteristics of the magnetic film can be prevented from deteriorating.
    • 在制造具有单轴磁各向异性的磁性膜的薄膜磁性装置的制造方法中,将形成在Si晶片上的磁性膜在磁场中进行热处理之前被图案化, 磁性膜在与磁场平行的方向上的长度大于磁性膜在与其垂直的方向上的长度的方式。 将磁性膜分为带状磁性膜,带状磁性膜在磁场中进行热处理,各自具有单轴磁各向异性。 带状磁性膜被图案化,并且再次分成芯片尺寸的磁性膜。 因此,可以防止在磁性膜上发生裂纹或起泡,并且可以防止磁性膜的磁特性劣化。