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    • 2. 发明授权
    • Filmy coil and a manufacturing method for such coil
    • 薄膜线圈和这种线圈的制造方法
    • US4728390A
    • 1988-03-01
    • US832719
    • 1986-02-13
    • Kunitoshi YamamotoYasuji MoriTorayoshi Iwata
    • Kunitoshi YamamotoYasuji MoriTorayoshi Iwata
    • B32B3/14B32B15/08H01F5/00H01F41/04C23F1/02B44C1/22C03C15/00C03C25/06
    • H01F41/042H01F5/003Y10T29/4902Y10T29/49155
    • A filmy coil comprising a metal conductive layer of the thin-line type having a spiral pattern on one side or both sides of an optional insulating substrate film or sheet, characterized in that the interval between each adjacent metal conductive line is smaller than the thickness of the metal conductive layer, and a manufacturing method for such a filmy coil characterized in that a photoresist layer, the patterns of both sides thereof being mirror images, is made up on both sides of the metal conductive foil or sheet, then both sides of the photoresist layer are etched to the depth of 30 to 40% of the thickness of the metal conductive foil or sheet by means of chemical etching, one side of the metal conductive foil or sheet is coated by an isolated resin coat or laminated with an isolated substrate film or sheet layer, the other side of said photoresist layer is etched also by means of chemical etching until the etching grooves on both sides pass through to be connected with each other, to produce a filmy coil in the form of a metal conductive layer on a thin-line type, and if desired, two filmy coils can be attached with each other at their undersides.
    • PCT No.PCT / JP85 / 00334 Sec。 371日期1986年2月13日 102(e)日期1986年2月13日PCT归档1985年6月13日PCT公布。 出版物WO86 / 日期:1986年1月3日。一种薄膜线圈,其包括细线型金属导电层,其具有在任选的绝缘衬底膜或片的一侧或两侧上的螺旋图案,其特征在于,每个相邻金属导电 线小于金属导电层的厚度,以及这种膜状线圈的制造方法,其特征在于,在金属导电箔的两面上形成其两侧的图案为镜像的光致抗蚀剂层,或者 通过化学蚀刻将光致抗蚀剂层的两侧蚀刻到金属导电箔或片的厚度的30至40%的深度,金属导电箔或片的一面被分离的树脂涂覆 涂覆或层压有隔离的基材膜或片层,所述光致抗蚀剂层的另一侧也通过化学蚀刻蚀刻直到两侧的蚀刻槽通过以连接 以薄线形式制造呈金属导电层形式的薄膜线圈,并且如果需要,两片薄膜线圈可以在其下侧彼此连接。