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1. 发明申请

US20070137570A1 Semiconductor manufacturing apparatus and semiconductor manufacturing method using the same 有权
标题翻译：半导体制造装置及使用其的半导体制造方法
公开(公告)号：US20070137570A1
公开(公告)日：2007-06-21
申请号：US10585858
申请日：2005-01-28
申请人： Yusuke Fukuoka , Katsushi Kishimo
发明人： Yusuke Fukuoka , Katsushi Kishimo
IPC分类号： C23C16/00 , B65H1/00
CPC分类号： H01L21/67748 , B65G49/061 , B65G49/065 , B65G2249/02 , B65G2249/04 , H01L21/67784 , Y10S414/135
摘要： A semiconductor manufacturing apparatus comprising: a plurality of vacuum chambers corresponding to a plurality of processing sections necessary for manufacturing a semiconductor device; an exhaust device connected to each vacuum chamber; a plate shaped guide plate arranged at the bottom of each vacuum chamber and having a plurality of gas emission holes; and a gas supply source for supplying gas to the gas emission holes, wherein the plurality of vacuum chambers are adjacent to each other by way of a shutter, one of the two adjacent vacuum chambers includes a tray mounted on the guide plate for mounting a substrate to be performed with a predetermined process, a conveying function section having a conveying arm for moving the tray from one vacuum chamber to the other vacuum chamber along the guide plate, and a controlling function section, the controlling function section performing the control so as to open the shutter to communicate the two adjacent vacuum chambers, emit gas from the gas emission holes of the guide plate of the vacuum chambers, and move the tray in one vacuum chamber, which is floated by the emitted gas, from the guide plate of one vacuum chamber to the guide plate of the other vacuum chamber along the guide plate by means of the conveying arm.
摘要翻译：一种半导体制造装置，包括：对应于制造半导体器件所需的多个处理部的多个真空室; 连接到每个真空室的排气装置; 布置在每个真空室的底部并具有多个排气孔的板状引导板; 以及用于向气体排出孔提供气体的气体供应源，其中所述多个真空室通过快门彼此相邻，所述两个相邻的真空室中的一个包括安装在所述导板上用于安装基板的托盘要执行预定的处理，具有用于将托盘从一个真空室移动到另一个真空室的输送臂的输送功能部分和控制功能部分，该控制功能部分执行控制以便打开快门以连通两个相邻的真空室，从真空室的引导板的气体排放孔中排放气体，并将托盘从一个由所发射的气体浮起的一个真空室中从一个真空室通过输送臂沿着引导板连接到另一个真空室的引导板。

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