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1. 发明授权

US5985511A Photoresist composition 失效
标题翻译：光刻胶组成
公开(公告)号：US5985511A
公开(公告)日：1999-11-16
申请号：US764126
申请日：1996-12-12
申请人： Yuko Yako , Naoki Takeyama , Kenji Takahashi
发明人： Yuko Yako , Naoki Takeyama , Kenji Takahashi
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/121 , Y10S430/125
摘要： A positive photoresist composition having excellent various performances (e.g. resolution, resistance to time delay effect, profile), small PEB dependence as well as excellent sensitivity, film retention and coatability, which comprises a polyvinylphenol resin whose phenolic hydroxyl group is partially protected; a sulfonate of a N-hydroxyimide compound as an acid generator; an amine compound; and an electron donor having a redox potential of not more than 1.7 eV is provided.
摘要翻译：具有优异的各种性能（例如分辨率，耐时间延迟效应，轮廓），PEB依赖性小以及优异的灵敏度，膜保留性和涂布性的正性光致抗蚀剂组合物，其包含酚羟基被部分保护的聚乙烯基苯酚树脂; 作为酸发生剂的N-羟基酰亚胺化合物的磺酸盐; 胺化合物; 并且提供氧化还原电位不超过1.7eV的电子给体。

2. 发明授权

US06280902B1 Positive working photoresist compositions comprising a nitrogen-containing cyclic compound 有权
标题翻译：包含含氮环状化合物的正性工作光致抗蚀剂组合物
公开(公告)号：US06280902B1
公开(公告)日：2001-08-28
申请号：US09584353
申请日：2000-06-01
申请人： Yuko Yako , Naoki Takeyama
发明人： Yuko Yako , Naoki Takeyama
IPC分类号： G03F7039
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106
摘要： A positive working photoresist composition is provided which comprises a resin which is converted to alkali-soluble from alkali-insoluble or alkali slightly soluble by the action of an acid; an acid generator; and a nitrogen-containing cyclic compound represented by the following formula (I): wherein X represents CH2 or C(═O), two of R1, R2, R3 and R4 represent a lower alkyl and the rest two represent hydrogen; gives a good profile with a smooth pattern side even on a substrate having a high reflection; and has a wide focus margin and a good sensitivity and resolution.
摘要翻译：提供了一种正性光致抗蚀剂组合物，其包含通过酸的作用从碱不溶性或碱性溶解而转变为碱溶性的树脂; 酸发生器; 和由下式（I）表示的含氮环状化合物：其中X表示CH 2或C（= O），R 1，R 2，R 3和R 4中的两个表示低级烷基，其余两个表示氢;给出良好的即使在具有高反射性的基板上也具有光滑图案侧的轮廓; 并具有广泛的关注点和良好的敏感度和分辨率。

3. 发明授权

US5846688A Photoresist composition 失效
标题翻译：光刻胶组成
公开(公告)号：US5846688A
公开(公告)日：1998-12-08
申请号：US644203
申请日：1996-05-10
申请人： Nobuhito Fukui , Yuji Ueda , Naoki Takeyama , Takehiro Kusumoto , Yuko Yako , Shigeki Yamamoto
发明人： Nobuhito Fukui , Yuji Ueda , Naoki Takeyama , Takehiro Kusumoto , Yuko Yako , Shigeki Yamamoto
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/121
摘要： A positive-working photoresist composition which exhibits a high sensitivity and a high resolution in addition to excellent characteristics such as heat resistance, film retention ratio, coatability and profile; which comprises an alkali-soluble resin comprising a polyvinylphenol resin which is polyvinylphenol and/or its partially hydrogenated product in which the phenolic hydroxyl groups are partially alkyletherified and partially protected; and a sulfonate of a N-hydroxyimide compound as an acid generator.
摘要翻译：除了耐热性，保持率，涂布性和轮廓等优异特性外，还具有高灵敏度和高分辨率的正性光致抗蚀剂组合物。其包含碱溶性树脂，其包含聚乙烯基苯酚树脂，其是聚乙烯基苯酚和/或其部分氢化的产物，其中酚羟基部分被烷基醚化并部分保护; 和作为酸发生剂的N-羟基酰亚胺化合物的磺酸盐。

4. 发明申请

US20070254221A1 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel 审中-公开
标题翻译：感光树脂组合物，用感光性树脂组合物制成的薄膜面板以及薄膜面板的制造方法
公开(公告)号：US20070254221A1
公开(公告)日：2007-11-01
申请号：US11788503
申请日：2007-04-20
申请人： Hi-Kuk Lee , Yuko Yako , Kyu-Young Kim
发明人： Hi-Kuk Lee , Yuko Yako , Kyu-Young Kim
IPC分类号： C09K19/40
CPC分类号： H01L21/0212 , G03F7/0046 , G03F7/0048 , G03F7/0226 , G03F7/0757 , H01L21/02126 , H01L21/02282 , H01L21/2855 , H01L21/3121 , H01L27/124 , H01L27/1248 , H01L27/14632
摘要： A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The surfactant includes an organic fluorine compound having the structure a first silicone compound having the structure a second silicone compound having the structure The resin composition may be used in display panels.
摘要翻译：光敏树脂组合物包括碱溶性树脂，醌二叠氮化物，表面活性剂和溶剂。表面活性剂包括具有结构的具有结构的第一硅氧烷化合物的有机氟化合物，其结构为具有结构的第二硅氧烷化合物。该树脂组合物可用于显示面板。

5. 发明授权

US5891601A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5891601A
公开(公告)日：1999-04-06
申请号：US950586
申请日：1997-10-15
申请人： Nobuhito Fukui , Yuko Yako , Hiroshi Takagaki , Kenji Takahashi
发明人： Nobuhito Fukui , Yuko Yako , Hiroshi Takagaki , Kenji Takahashi
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/106
摘要： A positive photo resist composition of chemical amplifying type, which is excellent in various properties such as sensitivity, resolution, heat resistance, film retention ratio, applicability and profile and also excellent in time delay effect resistance, and which comprises(A) a resin which is converted to alkali-soluble from alkali-insoluble or alkali-slightly soluble by the action of an acid,(B) an acid generator and(C) a dipyridyl compound represented by the following formula (I): ##STR1## wherein, Z represents an organic bonding group having least one hetero atom, and R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 each independently represent hydrogen or an alkyl group having 1 to 4 carbon atoms.
摘要翻译：化学放大型的正光致抗蚀剂组合物，其灵敏度，分辨率，耐热性，保膜率，适用性和轮廓等各种性能都优异，并且延时效应电阻也优异，并且包括（A）通过酸的作用，（B）酸产生剂和（C）由下式（I）表示的二吡啶基化合物的作用，由碱不溶性或碱性 - 微溶性转化成碱溶性：其中，Z表示具有至少一个杂原子的有机键合基团，R 1，R 2，R 3，R 4，R 5和R 6各自独立地表示氢或碳原子数1〜4的烷基。

6. 发明授权

US6165677A Photoresist composition 失效
标题翻译：光刻胶组成
公开(公告)号：US6165677A
公开(公告)日：2000-12-26
申请号：US83435
申请日：1998-05-22
申请人： Yuko Yako
发明人： Yuko Yako
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045
摘要： A chemical amplifying type positive photoresist composition, excellent in various properties, and not form necking at the potion where the bottom antireflective coating and the resist film contact, which comprises (A) a resin which is converted to alkali-soluble from alkali-insoluble or alkali slightly soluble by the action of an acid, (B) an acid generator, (C) a tertiary amine compound and (D) a diphenyl sulfone compound, and a fine photoresist pattern can be formed in high precision using the photoresist composition.
摘要翻译：一种化学放大型正性光致抗蚀剂组合物，其各种性能优异，并且在底部抗反射涂层和抗蚀剂膜接触的部分不形成颈缩，其包含（A）由碱不溶性转化为碱溶性的树脂碱可以通过酸的作用轻微溶解，（B）酸产生剂，（C）叔胺化合物和（D）二苯砜化合物，并且可以使用光致抗蚀剂组合物以高精度形成精细的光致抗蚀剂图案。

7. 发明授权

US07338737B2 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel 有权
标题翻译：感光树脂组合物，用感光性树脂组合物制成的薄膜面板以及薄膜面板的制造方法
公开(公告)号：US07338737B2
公开(公告)日：2008-03-04
申请号：US11302727
申请日：2005-12-13
申请人： Hi-Kuk Lee , Yuko Yako , Dong-Ki Lee , Kyu-Young Kim
发明人： Hi-Kuk Lee , Yuko Yako , Dong-Ki Lee , Kyu-Young Kim
IPC分类号： G03F7/023 , G03F7/30
CPC分类号： G03F7/0226 , C03C17/28 , C03C17/30 , C03C17/32 , G03F7/0048 , G03F7/2024
摘要： A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl group including one to five carbon atoms, an ethyl 3-ethoxy propionate, an alkyl acetate that includes an alkyl group including three to eight carbon atoms, and an alkyl lactate that includes an alkyl group including one to six carbon atoms. The composition may be used to make high-quality display panels with uniformly-coated insulating layers.
摘要翻译：光敏树脂组合物包括碱溶性树脂，醌二叠氮化物，表面活性剂和溶剂。溶剂包括包含1至5个碳原子的烷基的二甘醇二烷基醚，3-乙氧基丙酸乙酯，包括3至8个碳原子的烷基的烷基乙酸酯和包括烷基的烷基酯包括1至6个碳原子的基团。该组合物可用于制备具有均匀涂覆的绝缘层的高质量显示面板。

8. 发明授权

US5916728A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5916728A
公开(公告)日：1999-06-29
申请号：US950754
申请日：1997-10-15
申请人： Nobuhito Fukui , Yuko Yako , Hiroshi Takagaki , Kenji Takahashi
发明人： Nobuhito Fukui , Yuko Yako , Hiroshi Takagaki , Kenji Takahashi
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/106
摘要： A positive photo resist composition of chemical amplifying type, which is excellent in various properties such as sensitivity resolution, heat resistance, film retention ratio, applicability and profile and also excellent in time delay effect resistance, and which comprises(A) a resin which is converted to alkali-soluble from alkali-insoluble or alkali-slightly soluble by the action of an acid,(B) an acid generator and(C) a tertiary amine compound having an aliphatic hydroxyl group.
摘要翻译：化学放大型的正光致抗蚀剂组合物，其灵敏度分辨率，耐热性，保膜率，适用性和轮廓等各种性能都极好，延时效应电阻也优异，并且包括（A）通过酸的作用，（B）酸产生剂和（C）具有脂肪族羟基的叔胺化合物，由碱不溶性或碱溶性的碱溶性转化为碱溶性。

9. 发明授权

US6040112A Photoresist composition 失效
标题翻译：光刻胶组成
公开(公告)号：US6040112A
公开(公告)日：2000-03-21
申请号：US083436
申请日：1998-05-22
申请人： Yuko Yako , Kenji Takahashi , Hiroshi Takagaki , Nobuhito Fukui
发明人： Yuko Yako , Kenji Takahashi , Hiroshi Takagaki , Nobuhito Fukui
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/106
摘要： A chemical amplifying type positive photoresist composition, excellent in various properties such as film retention ratio, applicability, heat resistance, sensitivity, resolution, profile and time delay resistance, and not easily affected by environment, which comprises (A) a resin which is converted to alkali-soluble by the action of an acid, (B) an acid generator and (C) a tertiary amine compound having an ether bond; and a fine photoresist pattern can be formed in high precision using the photoresist composition.
摘要翻译：一种化学放大型正性光致抗蚀剂组合物，其具有优异的各种性能如膜保持率，适用性，耐热性，灵敏度，分辨率，轮廓和时间延迟性，并且不易受环境影响，其包括（A）转化的树脂通过酸的作用可溶于碱溶性，（B）酸产生剂和（C）具有醚键的叔胺化合物; 并且可以使用光致抗蚀剂组合物以高精度形成精细的光致抗蚀剂图案。

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