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1. 发明授权

US06800414B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06800414B2
公开(公告)日：2004-10-05
申请号：US09879894
申请日：2001-06-14
申请人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
发明人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
IPC分类号： G03F7004
CPC分类号： G03F7/0046 , G03F7/0233 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.
摘要翻译：公开了一种包含含酸不稳定基团的树脂和光致酸发生剂的辐射敏感性树脂组合物。该树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，不具有酸不稳定基团的具有1-6个碳原子的烷基，或不具有酸不稳定基团的具有2-7个碳原子的烷基羰基，X 1表示具有1-4个碳原子的直链或支链氟代烷基，R 2表示氢原子，直链或具有1-10个碳原子的支链烷基或具有1-10个碳原子的直链或支链氟代烷基。树脂组合物表现出高的透射率，高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体的化学放大抗蚀剂。

2. 发明授权

US06964840B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06964840B2
公开(公告)日：2005-11-15
申请号：US10867892
申请日：2004-06-16
申请人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
发明人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
IPC分类号： C08K5/00 , C08L33/06 , C08L35/00 , C08L45/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0233 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.
摘要翻译：公开了一种包含含酸不稳定基团的树脂和光致酸发生剂的辐射敏感性树脂组合物。树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，具有1-6个碳原子的烷基，其不具有酸 - 不稳定基团或不具有酸不稳定基团的具有2-7个碳原子的烷基羰基，X 1表示具有1-4个碳原子的直链或支链氟代烷基， SUP> 2表示氢原子，具有1-10个碳原子的直链或支链烷基或具有1-10个碳原子的直链或支链氟代烷基。树脂组合物表现出高的透射率，高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体的化学放大抗蚀剂。

3. 发明授权

US07202016B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US07202016B2
公开(公告)日：2007-04-10
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：一种包含特定共聚物和光致酸发生剂的化学放大的辐射敏感性树脂组合物，其中共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），

4. 发明授权

US06933094B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06933094B2
公开(公告)日：2005-08-23
申请号：US09953941
申请日：2001-09-18
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基，，或R 3和R 4可以与R 3和R 4的氮原子组合形成，基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子同时。该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

5. 发明申请

US20050214680A1 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US20050214680A1
公开(公告)日：2005-09-29
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03C1/76
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基，，或R 3和R 4可以与R 3和R 4的氮原子组合形成，基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子同时。该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

6. 发明授权

US06623907B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06623907B2
公开(公告)日：2003-09-23
申请号：US09774714
申请日：2001-02-01
申请人： Jun Numata , Aki Suzuki , Hiromichi Hara , Norihiro Natsume , Kiyoshi Murata , Masafumi Yamamoto , Akimasa Soyano , Toru Kajita , Tsutomu Shimokawa
发明人： Jun Numata , Aki Suzuki , Hiromichi Hara , Norihiro Natsume , Kiyoshi Murata , Masafumi Yamamoto , Akimasa Soyano , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/111 , Y10S430/128
摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.
摘要翻译：一种正色辐射敏感性树脂组合物，其包含：（A）具有至少一个氨基的低分子量化合物，其中所述氮原子具有与其键合的至少一个氢原子，并且至少一个氢原子被叔丁氧基羰基，（B）光酸产生剂和（C-1）不溶于或几乎不溶于碱的树脂，其被酸解离基团保护并且当酸解离基解离时变得可溶于碱，或（C -2）碱溶性树脂和碱溶性控制剂。还公开了包含低分子量化合物（A），光酸产生剂（B），碱溶性树脂（D）和能够与碱溶性树脂交联的化合物的负色辐射敏感性树脂组合物在酸（E）的存在下。该组合物可用作化学放大抗蚀剂，其有效地响应各种辐射，表现出优异的灵敏度和分辨率，即使图案是隔离线图案，也以高精度和稳定的方式形成精细图案。

7. 发明授权

US06838225B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06838225B2
公开(公告)日：2005-01-04
申请号：US10046080
申请日：2002-01-16
申请人： Yukio Nishimura , Masafumi Yamamoto , Atsuko Kataoka , Toru Kajita
发明人： Yukio Nishimura , Masafumi Yamamoto , Atsuko Kataoka , Toru Kajita
IPC分类号： G03F7/038 , G03F7/004 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/111 , Y10S430/123
摘要： A radiation-sensitive resin composition comprising: (A) an acid-dissociable group-containing resin, insoluble or scarcely soluble in alkali but becoming soluble in alkali when the acid-dissociable group dissociates, and containing recurring units with specific structures and (B) a photoacid generator of the formula (3), wherein R5 represents a monovalent aromatic hydrocarbon group, m is 1-8, and n is 0-5. The resin composition is suitable as a chemically-amplified resist responsive to deep ultraviolet rays such as a KrF excimer laser and ArF excimer laser, exhibits high transparency, excellent resolution, dry etching resistance, and sensitivity, produces good pattern shapes, and well adheres to substrates.
摘要翻译：一种辐射敏感性树脂组合物，其包含：（A）不溶解或几乎不溶于碱的酸解离基团的树脂，当酸解离基解离时变得可溶于碱，并且含有具有特定结构的重复单元，（B）式（3）的光酸产生剂，其中R 5表示一价芳族烃基，m为1-8，n为0-5。该树脂组合物适合作为对KrF准分子激光器和ArF准分子激光器等深紫外线的化学增幅抗蚀剂，具有高透明度，优异的分辨率，耐干蚀刻性和灵敏度，产生良好的图案形状，并且良好地粘附于底物。

8. 发明授权

US07005230B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US07005230B2
公开(公告)日：2006-02-28
申请号：US10345157
申请日：2003-01-16
申请人： Masafumi Yamamoto , Hidemitsu Ishida , Hiroyuki Ishii , Toru Kajita
发明人： Masafumi Yamamoto , Hidemitsu Ishida , Hiroyuki Ishii , Toru Kajita
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound. The resin composition is used as a chemically-amplified resist for microfabrication utilizing deep UV rays
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）包含至少一个重复单元（I-1），（I-2）或（I-3）和重复单元（II）的树脂，几乎不溶于碱，但通过酸的作用变得碱溶，（B）光酸产生剂，和（C）多环化合物。树脂组合物用作利用深紫外线的微细加工的化学增幅抗蚀剂<化学id =“CHEM-US-00001”num =“000

9. 发明申请

US20070254247A1 Radiation-sensitive resin composition 审中-公开
标题翻译：辐射敏感树脂组合物
公开(公告)号：US20070254247A1
公开(公告)日：2007-11-01
申请号：US11269761
申请日：2005-11-09
申请人： Masafumi Yamamoto , Hidemitsu Ishida , Hiroyuki Ishii , Toru Kajita
发明人： Masafumi Yamamoto , Hidemitsu Ishida , Hiroyuki Ishii , Toru Kajita
IPC分类号： G03C1/043
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound. The resin composition is used as a chemically-amplified resist for microfabrication utilizing deep UV rays.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）包含至少一个重复单元（I-1），（I-2）或（I-3）和重复单元（II）的树脂，几乎不溶于碱，但通过酸的作用变得碱溶，（B）光酸产生剂，和（C）多环化合物。该树脂组合物用作利用深紫外线的微细加工的化学增幅抗蚀剂。

10. 发明授权

US07108955B2 Polysiloxane, process for production thereof and radiation-sensitive resin composition 有权
标题翻译：聚硅氧烷，其制造方法和辐射敏感性树脂组合物
公开(公告)号：US07108955B2
公开(公告)日：2006-09-19
申请号：US10476453
申请日：2002-04-30
申请人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Masafumi Yamamoto
发明人： Haruo Iwasawa , Akihiro Hayashi , Tsutomu Shimokawa , Masafumi Yamamoto
IPC分类号： G03C1/73
CPC分类号： G03F7/0397 , C08G77/08 , C08G77/24 , G03F7/0045 , G03F7/0046 , G03F7/0757
摘要： A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, wherein R1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B)
摘要翻译：提供了具有193nm以下，特别是157nm以下的波长的高透明度，表现出优异的耐干蚀刻性的新颖的聚硅氧烷和包含显示出优异的灵敏度，分辨率等的聚硅氧烷的辐射敏感性树脂组合物。聚硅氧烷是具有下式（1）的结构单元（I）和/或结构单元（II），具有酸解离基团的树脂，其中R 1表示单价芳族被氟原子或氟代烷基取代的基团或被氟原子或氟代烷基取代的一价脂肪族基团，R 2表示上述一价芳族基团，上述一价脂肪族基团，氢原子，一价烃基，卤代烷基或氨基。辐射敏感性树脂组合物（A）含有聚硅氧烷（A）和光致酸产生剂（B）

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