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    • 4. 发明授权
    • Optical head, optical information storage apparatus, and their fabrication method
    • 光头,光信息存储装置及其制造方法
    • US07457206B2
    • 2008-11-25
    • US11211438
    • 2005-08-26
    • Takeshi ShimanoMasatoshi KanamaruMasaya Horino
    • Takeshi ShimanoMasatoshi KanamaruMasaya Horino
    • G11B7/00
    • G11B7/08576G11B7/123G11B7/1374
    • In an optical head, if a lens is reduced in size so that it can be integrated with a light source and a photodetector, other optical components as well as the lens must be reduced in size, which would result in greater difficulties in handling for assembly and adjustment purposes. The invention allows large quantities of ultra-small optical heads to be produced accurately and at low cost, the optical heads being easy to adjust and not requiring the handling of minute components for adjustment purposes. A first substrate includes lenses for focusing light on an information storage medium, a second substrate includes detectors and disposed on the surface thereof, and a layer, which is disposed between the first and second substrates, includes prisms and mirrors. The layer also includes cavities in which light sources are disposed. The individual substrates are formed in the form of wafers with the lenses, mirrors, prisms, light sources, and photodetectors disposed thereon.
    • 在光学头中,如果透镜的尺寸减小以使其能够与光源和光电检测器集成,则其它光学部件以及透镜的尺寸必须减小,这将导致更大的装配难度 和调整目的。 本发明允许以低成本准确地,低成本地制造大量的超小型光学头,光学头易于调节,并且不需要处理用于调整目的的微小部件。 第一基板包括用于将光聚焦在信息存储介质上的透镜,第二基板包括检测器并设置在其表面上,并且布置在第一和第二基板之间的层包括棱镜和反射镜。 该层还包括其中设置有光源的空腔。 各个基板以晶片的形式形成,其上设置有透镜,反射镜,棱镜,光源和光电探测器。
    • 5. 发明申请
    • Optical head, optical information storage apparatus, and their fabrication method
    • 光头,光信息存储装置及其制造方法
    • US20060193214A1
    • 2006-08-31
    • US11211438
    • 2005-08-26
    • Takeshi ShimanoMasatoshi KanamaruMasaya Horino
    • Takeshi ShimanoMasatoshi KanamaruMasaya Horino
    • G11B7/00
    • G11B7/08576G11B7/123G11B7/1374
    • In an optical head, if a lens is reduced in size so that it can be integrated with a light source and a photodetector, other optical components as well as the lens must be reduced in size, which would result in greater difficulties in handling for assembly and adjustment purposes. The invention allows large quantities of ultra-small optical heads to be produced accurately and at low cost, the optical heads being easy to adjust and not requiring the handling of minute components for adjustment purposes. A first substrate includes lenses for focusing light on an information storage medium, a second substrate includes detectors and disposed on the surface thereof, and a layer, which is disposed between the first and second substrates, includes prisms and mirrors. The layer also includes cavities in which light sources are disposed. The individual substrates are formed in the form of wafers with the lenses, mirrors, prisms, light sources, and photodetectors disposed thereon.
    • 在光学头中,如果透镜的尺寸减小以使其能够与光源和光电检测器集成,则其它光学部件以及透镜的尺寸必须减小,这将导致更大的装配难度 和调整目的。 本发明允许以低成本准确地,低成本地制造大量的超小型光学头,光学头易于调节,并且不需要处理用于调整目的的微小部件。 第一基板包括用于将光聚焦在信息存储介质上的透镜,第二基板包括检测器并设置在其表面上,并且布置在第一和第二基板之间的层包括棱镜和反射镜。 该层还包括其中设置有光源的空腔。 各个基板以晶片的形式形成,其上设置有透镜,反射镜,棱镜,光源和光电探测器。
    • 7. 发明申请
    • Process of microlens mold
    • 微透镜模具的工艺
    • US20070102842A1
    • 2007-05-10
    • US11528517
    • 2006-09-28
    • Irizo NaniwaMasatoshi KanamaruTakeshi ShimanoShigeo NakamuraMasaya HorinoYumiko Anzai
    • Irizo NaniwaMasatoshi KanamaruTakeshi ShimanoShigeo NakamuraMasaya HorinoYumiko Anzai
    • B29C33/40
    • B29C33/3842B29D11/00365B29L2011/0016
    • The present invention provides a method of making a mold for manufacturing a microlens having a smooth surface and an arbitrary aspherical surface, or more specifically, an aspheric microlens of dimensions such that an aperture is equal to or less than 1 mm and a thickness is equal to or more than 0.5 mm. A mask layer having plural circular apertures with different sizes formed therein for a mold for one lens is formed on a silicon substrate. Plural holes are formed for the lens in the silicon substrate by applying anisotropic dry etching to a surface to be processed, which is the surface having the mask layer formed thereon. The depths of the respective holes vary depending on the sizes of the circular apertures. Isotropic etching is performed to remove sidewalls of the plural holes with different depths formed in the silicon substrate, thereby merging the holes into one hole corresponding to the lens.
    • 本发明提供一种制造用于制造具有平滑表面和任意非球面的微透镜的模具的方法,或者更具体地说,是使得孔径等于或小于1mm并且厚度相等的尺寸的非球面微透镜 至或大于0.5mm。 在硅基板上形成具有用于一个透镜的模具形成有多个具有不同尺寸的圆形孔的掩模层。 通过对作为其上形成有掩模层的表面的待加工表面施加各向异性干蚀刻,在硅衬底中形成多个孔。 各个孔的深度根据圆形孔的尺寸而变化。 进行各向同性蚀刻以去除在硅衬底中形成的不同深度的多个孔的侧壁,从而将孔合并成与透镜相对应的一个孔。
    • 8. 发明授权
    • Deflector array, exposure apparatus, and device manufacturing method
    • 偏转器阵列,曝光装置和装置制造方法
    • US08143588B2
    • 2012-03-27
    • US12815507
    • 2010-06-15
    • Kenichi NagaeMasatoshi Kanamaru
    • Kenichi NagaeMasatoshi Kanamaru
    • G21K1/087
    • H01J37/1477B82Y10/00B82Y40/00H01J37/30H01J37/3174H01J2237/0437H01J2237/1518
    • A deflector array includes a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate. Each of the plurality of deflectors includes a single opening formed in the substrate, and each of the plurality of deflectors includes a pair of electrodes that oppose each other through the opening and are configured to deflect a single charged particle beam. The plurality of deflectors are arrayed such that a length of the pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of the plurality of deflectors that are located nearest to each other. The plurality of deflectors is arrayed to form a checkerboard lattice, and two openings of the two of the plurality of deflectors overlap in the longitudinal direction.
    • 偏转器阵列包括多个偏转器,其偏转排列在基板上的带电粒子束。 多个偏转器中的每一个包括形成在基板中的单个开口,并且多个偏转器中的每一个包括通过开口彼此相对的一对电极,并且被配置为偏转单个带电粒子束。 多个偏转器被排列成使得一对电极在其纵向方向上的长度不小于彼此最靠近的多个偏转器中的两个偏转器的中心之间的距离。 排列多个偏转器以形成棋盘格格,并且多个偏转器中的两个的两个开口在纵向方向上重叠。