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    • 1. 发明申请
    • Coating Composition, Hard Coat Film, and Optical Recording Medium
    • 涂料组合物,硬涂层和光记录介质
    • US20070298248A1
    • 2007-12-27
    • US11794358
    • 2005-11-22
    • Yuki HongoKenta TomiokaSatoru Shoshi
    • Yuki HongoKenta TomiokaSatoru Shoshi
    • C09D171/02C08J7/06C09D183/04C09D4/00G02B1/10G11B7/24G11B7/257
    • C08J7/16C08J7/047C08J2369/00C08J2483/00C08K3/22C08K9/04C09D4/00C09D5/24C09D7/65C09D183/10G11B7/2545G11B7/256Y10T428/261Y10T428/265C08L2666/54
    • A coating composition containing reactive particles (A) in which an organic compound having at least one polymerizable unsaturated group in a molecule thereof is chemically bonded to inorganic oxide particles, an organic compound monomer or oligomer (B) having a polyethylene oxide chain (content in molecule: not less than 50% and less than 100%) and at least two polymerizable unsaturated groups in a molecule thereof and not having an aromatic ring and an alkyl chain having seven or more carbon atoms, an organic compound monomer or oligomer (C) having at least two polymerizable unsaturated groups in a molecule thereof, being an organic compound monomer or oligomer other than the organic compound monomer or oligomer (B), and a siloxane compound (D) having a dialkyl siloxane backbone is applied onto one surface of a base material film 11, and cured by irradiating with ionizing radiation, so as to form a hard coat layer 12 of thickness from 0.1 to 20 μm. This hard coat layer 12 has both excellent fingerprint wipability and excellent antistatic performance.
    • 含有反应性粒子(A)的涂料组合物,其中分子中具有至少一个可聚合不饱和基团的有机化合物与无机氧化物颗粒化学键合,具有聚环氧乙烷链的有机化合物单体或低聚物(B)(含量 分子:不小于50%且小于100%)和分子中至少两个不具有芳环和具有7个或更多个碳原子的烷基链的可聚合不饱和基团,有机化合物单体或低聚物(C) 在其分子中具有至少两个可聚合的不饱和基团,作为除了有机化合物单体或低聚物(B)之外的有机化合物单体或低聚物,并且具有二烷基硅氧烷骨架的硅氧烷化合物(D)被施加到 基材膜11,通过照射电离辐射使其固化,形成厚度为0.1〜20μm的硬涂层12。 该硬涂层12具有优异的指纹擦拭性和优异的抗静电性能。
    • 4. 发明授权
    • Hard coat film
    • 硬涂膜
    • US07141298B2
    • 2006-11-28
    • US10681069
    • 2003-10-08
    • Satoru ShoshiYuki HongoYoshitaka Takesako
    • Satoru ShoshiYuki HongoYoshitaka Takesako
    • B32B27/08
    • G02B1/14C08J7/047C08J2369/00C08J2433/00G02B1/105G11B7/2534G11B7/2542G11B7/2545G11B7/256Y10T428/259Y10T428/31507Y10T428/31547Y10T428/31667Y10T428/31786Y10T428/31797
    • A hard coat film comprises a hard coat layer formed by coating at least one face of a substrate with a coating fluid and curing the obtained coating layer by irradiation with an ionizing radiation. The coating fluid comprises a component for forming a hard coat layer comprising (A) a compound which is formed by bonding an organic compound having a polymerizable unsaturated group to fine particles of silica, (B) an ester of (meth)acrylic acid having an alicyclic structure and (C) a compound having at least two polymerizable unsaturated groups and at least one aryl group in a molecule. The hard coat layer comprises 20 to 60% by weight of silica and has a refractive index of 1.53 or greater. The hard coat film exhibits excellent scratch resistance, little shrinking by curing and little shrinking and curling under high temperature and humidity and forms no optical interference fringes.
    • 硬涂膜包括通过用涂布液涂布基材的至少一个表面而形成的硬涂层,并且通过用电离辐射照射固化所获得的涂层。 涂布流体包括用于形成硬涂层的组分,其包含(A)通过将具有可聚合不饱和基团的有机化合物与二氧化硅细颗粒结合而形成的化合物,(B)具有(甲基)丙烯酸的 脂环结构和(C)分子中具有至少两个可聚合不饱和基团和至少一个芳基的化合物。 硬涂层包含20至60重量%的二氧化硅,折射率为1.53或更大。 硬涂膜具有优异的耐擦伤性,通过固化几乎不收缩,并且在高温和高湿下几乎不收缩和卷曲,并且不形成光学干涉条纹。