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1. 发明申请

US20120003591A1 METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD 有权
标题翻译：在方法中使用图案和开发者的方法
公开(公告)号：US20120003591A1
公开(公告)日：2012-01-05
申请号：US13172273
申请日：2011-06-29
申请人： Yuichiro ENOMOTO , Shinji TARUTANI , Sou KAMIMURA , Kaoru IWATO , Keita KATO , Kana FUJII
发明人： Yuichiro ENOMOTO , Shinji TARUTANI , Sou KAMIMURA , Kaoru IWATO , Keita KATO , Kana FUJII
IPC分类号： G03F7/20 , G03F7/32
CPC分类号： G03F7/325 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/20 , G03F7/2041 , G03F7/422
摘要： Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
摘要翻译：提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成为膜，（b）将膜曝光，和（c）用含有机溶剂的显影剂显影曝光的膜，其中显影剂含有基于显影剂总质量为0至小于500ppm的醇化合物（X）。

2. 发明申请

US20120028196A1 METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN THE METHOD 审中-公开
标题翻译：方法中形成图案和有机加工液体的方法
公开(公告)号：US20120028196A1
公开(公告)日：2012-02-02
申请号：US13192188
申请日：2011-07-27
申请人： Sou KAMIMURA , Kaoru IWATO , Yuichiro ENOMOTO , Shohei KATAOKA , Keita KATO , Shoichi SAITOH
发明人： Sou KAMIMURA , Kaoru IWATO , Yuichiro ENOMOTO , Shohei KATAOKA , Keita KATO , Shoichi SAITOH
IPC分类号： G03F7/20 , G03F7/26 , G03F7/32
CPC分类号： G03F7/2041 , G03F7/0397 , G03F7/11 , G03F7/325 , G03F7/40
摘要： An embodiment of the method of forming a pattern, comprises (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) processing the exposed film with an organic processing liquid, wherein the processing liquid contains an organic solvent whose normal boiling point is 175° C. or higher, the organic solvent being contained in the processing liquid in a content of less than 30 mass %.
摘要翻译：形成图案的方法的一个实施方案包括：（a）将化学放大的抗蚀剂组合物形成膜，（b）将膜曝光，和（c）用有机处理液处理曝光的膜，其中处理液体含有正常沸点为175℃以上的有机溶剂，处理液中含有的有机溶剂含量低于30质量％。

3. 发明申请

US20120052449A1 METHOD OF FORMING PATTERN 有权
标题翻译：形成图案的方法
公开(公告)号：US20120052449A1
公开(公告)日：2012-03-01
申请号：US13216903
申请日：2011-08-24
申请人： Keita KATO , Sou KAMIMURA , Yuichiro ENOMOTO , Kaoru IWATO , Shohei KATAOKA , Shoichi SAITOH
发明人： Keita KATO , Sou KAMIMURA , Yuichiro ENOMOTO , Kaoru IWATO , Shohei KATAOKA , Shoichi SAITOH
IPC分类号： G03F7/20 , G03F7/32
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/091 , G03F7/16 , G03F7/168 , G03F7/20 , G03F7/2006 , G03F7/2041 , G03F7/38 , G03F7/40
摘要： Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 μm or greater amount to a density of 30 particles/ml or less.
摘要翻译：提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成在膜中，（b）将膜曝光，和（c）用含有第一有机溶剂的显影剂显影曝光的膜，其中在显影剂，每个具有0.3μm或更大直径的颗粒的密度为30个/ ml或更小。

4. 发明申请

US20120077122A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM 有权
标题翻译：图案形成方法，化学放大电阻组合物和电阻膜
公开(公告)号：US20120077122A1
公开(公告)日：2012-03-29
申请号：US13245326
申请日：2011-09-26
申请人： Kaoru IWATO , Keita KATO
发明人： Kaoru IWATO , Keita KATO
IPC分类号： H01L21/02 , G03F7/30 , G03F7/039
CPC分类号： G03F7/0382 , G03F7/0048 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325 , G03F7/38 , G03F7/40
摘要： A pattern forming method includes: (i) forming a film from a chemical amplification resist composition that contains (A) a resin, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a tertiary alcohol; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.
摘要翻译：图案形成方法包括：（i）从化学放大抗蚀剂组合物形成膜，其包含（A）树脂，（B）在通过光化射线或辐射照射时能够产生酸的化合物和（C）醇; （ii）曝光胶片; 和（iii）通过使用含有有机溶剂的显影剂进行显影。

5. 发明申请

US20100152400A1 POLYMERIZABLE COMPOUND, LACTONE-CONTAINING COMPOUND, METHOD FOR MANUFACTURING LACTONE-CONTAINING COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND 审中-公开
标题翻译：可聚合化合物，含有LACTONE的化合物，制备含Lactone的化合物的方法和通过聚合可聚合化合物获得的聚合物化合物
公开(公告)号：US20100152400A1
公开(公告)日：2010-06-17
申请号：US12636076
申请日：2009-12-11
申请人： Yusuke IIZUKA , Kaoru IWATO , Hiroshi SAEGUSA , Shuji HIRANO
发明人： Yusuke IIZUKA , Kaoru IWATO , Hiroshi SAEGUSA , Shuji HIRANO
IPC分类号： C08G63/08 , C07D307/77
CPC分类号： C07D307/77 , C07D493/18 , C08F220/18 , C08F220/24 , C08F220/30 , C08F2220/1808
摘要： A polymerizable compound having a lactone structure represented by formula (1) is provided: wherein A represents a polymerizable site; R2 represents a single bond or an alkylene group; R3 represents a hydrocarbon group in which hydrogen atoms are substituted with a fluorine atom; R4 represents a halogen atom, a cyano group, a hydroxy group, an amide group, an alkyl group, a cycloalkyl group, an alkoxy group, a phenyl group, an acyl group, an alkoxycarbonyl group, or a group represented by R—C(═O)— or R—C(═O)O—, wherein R represents an alkyl group or a cycloalkyl group; X represents an alkylene group, an oxygen atom or a sulfur atom; Z represents a single bond, an ether bond, an ester bond, an amide bond, a urethane bond or a urea bond; n represents an integer of from 0 to 5; and m represents an integer of from 0 to 7.
摘要翻译：提供具有由式（1）表示的内酯结构的可聚合化合物：其中A表示可聚合位点; R2表示单键或亚烷基; R3表示氢原子被氟原子取代的烃基; R 4表示卤素原子，氰基，羟基，酰胺基，烷基，环烷基，烷氧基，苯基，酰基，烷氧基羰基或由R-C （= O） - 或R-C（= O）O-，其中R表示烷基或环烷基; X表示亚烷基，氧原子或硫原子; Z表示单键，醚键，酯键，酰胺键，氨基甲酸酯键或脲键; n表示0〜5的整数， m表示0〜7的整数。

6. 发明申请

US20120271021A1 POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME 失效
标题翻译：可聚合的化合物和使用该聚合物的聚合物化合物
公开(公告)号：US20120271021A1
公开(公告)日：2012-10-25
申请号：US13525583
申请日：2012-06-18
申请人： Shuji HIRANO , Kaoru IWATO , Hiroshi SAEGUSA , Yusuke IIZUKA
发明人： Shuji HIRANO , Kaoru IWATO , Hiroshi SAEGUSA , Yusuke IIZUKA
IPC分类号： C07D493/14 , C08F124/00 , C08F120/22
CPC分类号： C07D493/20 , C07D493/14 , C08F220/30
摘要： Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.
摘要翻译：提供由以下通式（ca-1）或（cb-1）表示的可聚合化合物：其中式中的变量在说明书中定义。

7. 发明申请

US20100152401A1 POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME 失效
标题翻译：可聚合的化合物和使用该聚合物的聚合物化合物
公开(公告)号：US20100152401A1
公开(公告)日：2010-06-17
申请号：US12635998
申请日：2009-12-11
申请人： Shuji HIRANO , Kaoru IWATO , Hiroshi SAEGUSA , Yusuke IIZUKA
发明人： Shuji HIRANO , Kaoru IWATO , Hiroshi SAEGUSA , Yusuke IIZUKA
IPC分类号： C08F24/00 , C07D493/20
CPC分类号： C07D493/20 , C07D493/14 , C08F220/30
摘要： Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.
摘要翻译：提供由以下通式（ca-1）或（cb-1）表示的可聚合化合物：其中式中的变量在说明书中定义。

8. 发明申请

US20100028804A1 RESIST COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH 有权
标题翻译：耐腐蚀组合物及其形成方法
公开(公告)号：US20100028804A1
公开(公告)日：2010-02-04
申请号：US12535240
申请日：2009-08-04
申请人： Kaoru IWATO , Kazuto Kunita
发明人： Kaoru IWATO , Kazuto Kunita
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/0757 , G03F7/0758 , G03F7/2041 , G03F7/30
摘要： A resist composition comprises two or more polymers containing a first polymer and a second polymer and a compound that when exposed to actinic rays or radiation, generates an acid, wherein when the resist composition is formed into a dry resist film, the mixing ratios of at least the first and second polymers in the resist film exhibit a gradient distribution such that the mixing ratios continuously change in entirety or partially in the direction of the depth from the surface of the resist film on the air side toward a support, and wherein the mixing ratio of the first polymer at a superior portion of the resist film is higher than that of the second polymer, while the mixing ratio of the second polymer at an inferior portion of the resist film is higher than that of the first polymer.
摘要翻译：抗蚀剂组合物包括含有第一聚合物和第二聚合物的两种或更多种聚合物和当暴露于光化射线或辐射时产生酸的化合物，其中当抗蚀剂组合物形成干燥抗蚀剂膜时，抗蚀剂膜中的第一和第二聚合物的至少表现出梯度分布，使得混合比在空气侧的抗蚀剂膜的表面朝向载体的深度方向全部或部分地连续变化，并且其中混合抗蚀剂膜的上部的第一聚合物的比例高于第二聚合物，而抗蚀剂膜的下部的第二聚合物的混合比高于第一聚合物的比例。

9. 发明申请

US20070122738A1 IMAGE FORMING MATERIAL 审中-公开
标题翻译：图像形成材料
公开(公告)号：US20070122738A1
公开(公告)日：2007-05-31
申请号：US11566061
申请日：2006-12-01
申请人： Kaoru IWATO
发明人： Kaoru IWATO
IPC分类号： G03C1/00
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/04 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/262 , Y10S430/106 , Y10S430/122 , Y10S430/123 , Y10S430/165
摘要： The present invention relates to an image forming material having, on a substrate, an image forming layer that includes at least (A) a novolac type phenolic resin containing phenol as a structural unit, (B) a photo-thermal converting agent, and (C) a specific ammonium compound or a specific onium salt.
摘要翻译：本发明涉及一种图像形成材料，其在基材上具有至少包含（A）包含酚作为结构单元的酚醛清漆型酚醛树脂的图像形成层，（B）光热转换剂和（ C）特定的铵化合物或特定的鎓盐。

10. 发明申请

US20130020684A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：丙烯酸敏感或辐射敏感性树脂组合物，以及丙烯酸类敏感性或辐射敏感性膜和使用其的图案形成方法
公开(公告)号：US20130020684A1
公开(公告)日：2013-01-24
申请号：US13539882
申请日：2012-07-02
申请人： Kaoru IWATO
发明人： Kaoru IWATO
IPC分类号： G03F7/027 , H01L29/02 , H01L21/312 , G03F7/075 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/11 , G03F7/2041
摘要： The actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes a resin (A) which contains at least one type of repeating unit which is represented by the general formula (PG1), at least one type of repeating unit which is selected from the repeating units which are represented by the general formula (PG2) and the general formula (PG3), and at least one type of repeating unit which includes a lactone structure, a compound (B) which is a compound which is represented by the general formula (B1) and where the molecular weight of an anion moiety is 200 or less, and a solvent (C).
摘要翻译：根据本发明的光化射线敏感性或辐射敏感性树脂组合物包括含有至少一种由通式（PG1）表示的重复单元的树脂（A），至少一种类型的重复单元，选自由通式（PG2）和通式（PG3）表示的重复单元，以及至少一种包含内酯结构的重复单元，作为代表的化合物的化合物（B）通式（B1），阴离子部分的分子量为200以下，溶剂（C）等。

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