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    • 3. 发明授权
    • Perpendicular magnetic recording write head with milling defined track width
    • 垂直磁记录写头具有铣削定义的轨道宽度
    • US08477453B2
    • 2013-07-02
    • US12799927
    • 2010-05-05
    • Kenichi TakanoYuchen ZhouMin LiJoe Smyth
    • Kenichi TakanoYuchen ZhouMin LiJoe Smyth
    • G11B5/31
    • G11B5/1278G11B5/3116G11B5/314G11B5/315G11B5/3163G11B2005/0024
    • A main pole layer having at least a leading taper and trimmed pole tip portion is described. The leading taper increases head field up to ≧15000 Oe even for narrow track widths approaching 50 nm. For MAMR applications, a STO and trailing shield are sequentially formed on a trailing pole tip side. Furthermore, full side shields may be added to reduce fringing field. Another embodiment involves including both of a leading taper and trailing taper at the pole tip where leading taper angle is between 20° and 60° and trailing taper angle is from 10° to 45°. A method is provided for forming various embodiments of the present invention. A key feature is that milling depth at an effective neck height distance is greater than or equal to the pole tip thickness. A self aligned STO may be formed by the same ion milling step that defines track width.
    • 描述了至少具有前导锥形和微调极尖部分的主极层。 即使对于接近50nm的窄轨道宽度,领先的锥形也增加了头部场>达15000 Oe。 对于MAMR应用,STO和后屏蔽依次形成在尾极端侧。 此外,可以添加全侧屏蔽以减少边缘场。 另一实施例涉及在极尖处包括前导锥形和后锥形两者,其中前锥度角在20°至60°之间,后锥角度为10°至45°。 提供了一种用于形成本发明的各种实施例的方法。 一个关键特征是在有效颈部高度距离处的铣削深度大于或等于极尖厚度。 可以通过定义轨道宽度的相同离子铣削步骤形成自对准STO。
    • 4. 发明申请
    • Perpendicular magnetic recording write head with milling defined track width
    • 垂直磁记录写头具有铣削定义的轨道宽度
    • US20110273800A1
    • 2011-11-10
    • US12799927
    • 2010-05-05
    • Kenichi TakanoYuchen ZhouMin LiJoe Smyth
    • Kenichi TakanoYuchen ZhouMin LiJoe Smyth
    • G11B5/127C23C14/46
    • G11B5/1278G11B5/3116G11B5/314G11B5/315G11B5/3163G11B2005/0024
    • A main pole layer having at least a leading taper and trimmed pole tip portion is described. The leading taper increases head field up to ≧15000 Oe even for narrow track widths approaching 50 nm. For MAMR applications, a STO and trailing shield are sequentially formed on a trailing pole tip side. Furthermore, full side shields may be added to reduce fringing field. Another embodiment involves including both of a leading taper and trailing taper at the pole tip where leading taper angle is between 20° and 60° and trailing taper angle is from 10° to 45°. A method is provided for forming various embodiments of the present invention. A key feature is that milling depth at an effective neck height distance is greater than or equal to the pole tip thickness. A self aligned STO may be formed by the same ion milling step that defines track width.
    • 描述了至少具有前导锥形和微调极尖部分的主极层。 即使对于接近50nm的窄轨道宽度,前导锥形也增加了顶场至≧15000 Oe。 对于MAMR应用,STO和后屏蔽依次形成在尾极端侧。 此外,可以添加全侧屏蔽以减少边缘场。 另一实施例涉及在极尖处包括前导锥形和后锥形两者,其中前锥度角在20°至60°之间,后锥角度为10°至45°。 提供了一种用于形成本发明的各种实施例的方法。 一个关键特征是在有效颈部高度距离处的铣削深度大于或等于极尖厚度。 可以通过定义轨道宽度的相同离子铣削步骤形成自对准STO。
    • 5. 发明授权
    • CPP device with an enhanced dR/R ratio
    • 具有增强的dR / R比的CPP装置
    • US08031441B2
    • 2011-10-04
    • US11803057
    • 2007-05-11
    • Kunliang ZhangMin LiMoris DovekYue Liu
    • Kunliang ZhangMin LiMoris DovekYue Liu
    • G11B5/39
    • G11B5/3909B82Y10/00B82Y25/00G11B5/3906G11B2005/3996Y10T29/49039Y10T29/49043Y10T29/49044
    • A CPP-GMR spin valve having a composite spacer layer comprised of at least one metal (M) layer and at least one semiconductor or semi-metal (S) layer is disclosed. The composite spacer may have a M/S, S/M, M/S/M, S/M/S, M/S/M/S/M, or a multilayer (M/S/M)n configuration where n is an integer ≧1. The pinned layer preferably has an AP2/coupling/AP1 configuration wherein the AP2 portion is a FCC trilayer represented by CoZFe(100-Z)/FeYCo(100-Y)/CoZFe(100-Z) where y is 0 to 60 atomic %, and z is 75 to 100 atomic %. In one embodiment, M is Cu with a thickness from 0.5 to 50 Angstroms and S is ZnO with a thickness of 1 to 50 Angstroms. The S layer may be doped with one or more elements. The dR/R ratio of the spin valve is increased to 10% or greater while maintaining acceptable EM and RA performance.
    • 公开了具有由至少一个金属(M)层和至少一个半导体或半金属(S)层组成的复合间隔层的CPP-GMR自旋阀。 复合间隔物可以具有M / S,S / M,M / S / M,S / M / S,M / S / M / S / M或多层(M / S / M) 是整数≧1。 钉扎层优选具有AP2 /耦合/ AP1配置,其中AP2部分是由CoZFe(100-Z)/ FeYCo(100-Y)/ CoZFe(100-Z)表示的FCC三层,其中y为0至60原子% ,z为75〜100原子%。 在一个实施方案中,M是厚度为0.5至50埃的Cu,S是厚度为1至50埃的ZnO。 S层可以掺杂有一个或多个元素。 自旋阀的dR / R比提高到10%以上,同时保持可接受的EM和RA性能。
    • 6. 发明申请
    • Novel CPP device with an enhanced dR/R ratio
    • 具有增强的dR / R比的新型CPP装置
    • US20120009337A1
    • 2012-01-12
    • US13200013
    • 2011-09-15
    • Kunliang ZhangMin LiMoris DovekYue Liu
    • Kunliang ZhangMin LiMoris DovekYue Liu
    • G11B5/31C23C14/34
    • G11B5/3909B82Y10/00B82Y25/00G11B5/3906G11B2005/3996Y10T29/49039Y10T29/49043Y10T29/49044
    • A CPP-GMR spin valve having a composite spacer layer comprised of at least one metal (M) layer and at least one semiconductor or semi-metal (S) layer is disclosed. The composite spacer may have a M/S, S/M, M/S/M, S/M/S, M/S/M/S/M, or a multilayer (M/S/M)n configuration where n is an integer≧1. The pinned layer preferably has an AP2/coupling/AP1 configuration wherein the AP2 portion is a FCC trilayer represented by CoZFe(100-Z)/FeYCo(100-Y)/CoZFe(100-Z) where y is 0 to 60 atomic %, and z is 75 to 100 atomic %. In one embodiment, M is Cu with a thickness from 0.5 to 50 Angstroms and S is ZnO with a thickness of 1 to 50 Angstroms. The S layer may be doped with one or more elements. The dR/R ratio of the spin valve is increased to 10% or greater while maintaining acceptable EM and RA performance.
    • 公开了具有由至少一个金属(M)层和至少一个半导体或半金属(S)层组成的复合间隔层的CPP-GMR自旋阀。 复合间隔物可以具有M / S,S / M,M / S / M,S / M / S,M / S / M / S / M或多层(M / S / M) 是整数≧1。 钉扎层优选具有AP2 /耦合/ AP1配置,其中AP2部分是由CoZFe(100-Z)/ FeYCo(100-Y)/ CoZFe(100-Z)表示的FCC三层,其中y为0至60原子% ,z为75〜100原子%。 在一个实施方案中,M是厚度为0.5至50埃的Cu,S是厚度为1至50埃的ZnO。 S层可以掺杂有一个或多个元素。 自旋阀的dR / R比提高到10%以上,同时保持可接受的EM和RA性能。
    • 8. 发明申请
    • Novel CPP device with an enhanced dR/R ratio
    • 具有增强的dR / R比的新型CPP装置
    • US20080278864A1
    • 2008-11-13
    • US11803057
    • 2007-05-11
    • Kunliang ZhangMin LiMoris DovekYue Liu
    • Kunliang ZhangMin LiMoris DovekYue Liu
    • G11B5/127
    • G11B5/3909B82Y10/00B82Y25/00G11B5/3906G11B2005/3996Y10T29/49039Y10T29/49043Y10T29/49044
    • A CPP-GMR spin valve having a composite spacer layer comprised of at least one metal (M) layer and at least one semiconductor or semi-metal (S) layer is disclosed. The composite spacer may have a M/S, S/M, M/S/M, S/M/S, M/S/M/S/M, or a multilayer (M/S/M)n configuration where n is an integer ≧1. The pinned layer preferably has an AP2/coupling/AP1 configuration wherein the AP2 portion is a FCC trilayer represented by CoZFe(100-Z)/FeYCo(100-Y)/CoZFe(100-Z) where y is 0 to 60 atomic %, and z is 75 to 100 atomic %. In one embodiment, M is Cu with a thickness from 0.5 to 50 Angstroms and S is ZnO with a thickness of 1 to 50 Angstroms. The S layer may be doped with one or more elements. The dR/R ratio of the spin valve is increased to 10% or greater while maintaining acceptable EM and RA performance.
    • 公开了具有由至少一个金属(M)层和至少一个半导体或半金属(S)层组成的复合间隔层的CPP-GMR自旋阀。 复合间隔物可以具有M / S,S / M,M / S / M,S / M / S,M / S / M / S / M或多层(M / S / M) 配置,其中n是整数> = 1。 被钉扎层优选具有AP2 /偶联/ AP1构型,其中AP2部分是由CoZi Fe(100-Z)/ Fe Y 其中y为0至60原子%,以及(C 1 -C 6) z为75〜100原子%。 在一个实施方案中,M是厚度为0.5至50埃的Cu,S是厚度为1至50埃的ZnO。 S层可以掺杂有一个或多个元素。 自旋阀的dR / R比提高到10%以上,同时保持可接受的EM和RA性能。