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    • 1. 发明授权
    • Nano-lithography with rotating target and servo-positioned tip
    • 具有旋转目标和伺服定位尖端的纳米光刻
    • US08358481B2
    • 2013-01-22
    • US12080278
    • 2008-04-02
    • Yuchen ZhouErhard SchreckDavid Hu
    • Yuchen ZhouErhard SchreckDavid Hu
    • G11B11/08
    • G11B5/59633B82Y10/00G11B5/314G11B5/59638G11B5/743G11B5/82G11B5/855G11B9/1409
    • The preferred embodiments of the present invention are devices and processes for producing high resolution lithography or pattern formation on the nanometer scale, using a voltage-biased probe that is slider-mounted along with, or separate from but linked to, a magnetic read head within a HDD mechanism. The probe is guided and positioned over a target layer by the motion of the read head which is, itself, guided by signals from servo tracks on a magnetic layer that activate an electromechanical servomechanism within the HDD. An electric field produced by the probe is capable of modifying the surface of the target layer over which the probe flies either directly, or by current induced or thermally induced effects. Targets such as amorphous or crystalline silicon can be hydrogen passivated and the electric field will produce oxidized or anodized lines with nanometer resolution.
    • 本发明的优选实施例是设备和方法用于在纳米尺度上产生高分辨率平版印刷或图案形成,使用电压偏置探针,滑块安装有沿,或从分开的,但连接到,一个磁性读出头内 HDD机制。 探头通过读取头的运动被引导和定位在目标层上,该读取头本身由在激活HDD内的机电伺服机构的磁性层上的来自伺服磁道的信号引导。 由探针产生的电场能够直接改变探针在其上飞行的目标层的表面,或者通过电流感应或热诱导效应。 诸如非晶体或晶体硅的靶可以被氢钝化,并且电场将产生具有纳米分辨率的氧化或阳极化线。
    • 2. 发明申请
    • Nano-lithography with rotating target and servo-positioned tip
    • 具有旋转目标和伺服定位尖端的纳米光刻
    • US20100321820A1
    • 2010-12-23
    • US12080278
    • 2008-04-02
    • Yuchen ZhouErhard SchreckDavid Hu
    • Yuchen ZhouErhard SchreckDavid Hu
    • G11B5/52
    • G11B5/59633B82Y10/00G11B5/314G11B5/59638G11B5/743G11B5/82G11B5/855G11B9/1409
    • The preferred embodiments of the present invention are devices and processes for producing high resolution lithography or pattern formation on the nanometer scale, using a voltage-biased probe that is slider-mounted along with, or separate from but linked to, a magnetic read head within a HDD mechanism. The probe is guided and positioned over a target layer by the motion of the read head which is, itself, guided by signals from servo tracks on a magnetic layer that activate an electromechanical servomechanism within the HDD. An electric field produced by the probe is capable of modifying the surface of the target layer over which the probe flies either directly, or by current induced or thermally induced effects. Targets such as amorphous or crystalline silicon can be hydrogen passivated and the electric field will produce oxidized or anodized lines with nanometer resolution.
    • 本发明的优选实施例是使用电压偏置探针来生产高分辨率光刻或图形形成的装置和工艺,所述电压偏置探针与所述磁读取头一起滑动安装,或与之相连, HDD机制。 探头通过读取头的运动被引导和定位在目标层上,该读取头本身由在激活HDD内的机电伺服机构的磁性层上的来自伺服磁道的信号引导。 由探针产生的电场能够直接改变探针在其上飞行的目标层的表面,或者通过电流感应或热诱导效应。 诸如非晶体或晶体硅的靶可以被氢钝化,并且电场将产生具有纳米分辨率的氧化或阳极化线。
    • 3. 发明授权
    • Plasmon shield to shape and reduce optical spot
    • 等离子体屏蔽形状并减少光斑
    • US08295132B2
    • 2012-10-23
    • US13200478
    • 2011-09-23
    • Xuhui JinYuchen ZhouJoe SmythTobias MaletzkyKenichi TakanoErhard Schreck
    • Xuhui JinYuchen ZhouJoe SmythTobias MaletzkyKenichi TakanoErhard Schreck
    • G11B11/00
    • G11B5/3146G11B5/1278G11B5/1871G11B5/23G11B5/3116G11B5/315G11B5/3163
    • A TAMR head is disclosed with a triangular shaped plasmon antenna covered on two sides with a plasmon layer that generates an edge plasmon mode along a vertex of the two plasmon sides formed opposite a main pole layer. A plasmon shield (PS) is formed along the ABS and opposite the vertex to confine an electric field from the edge plasmon mode within a small radius of the edge plasmon tip thereby reducing the optical spot size on the magnetic medium and enhancing writability. An end of a waveguide used to direct input electromagnetic radiation to the plasmon antenna adjoins a PS side opposite the ABS. In one embodiment, a magnetic shield may be formed along the ABS and adjoins the PS so that a first PS section terminates at the ABS and faces the vertex while a second PS section is formed between the magnetic shield and waveguide end.
    • 公开了具有三面形等离子体激元的三角形等离子体激元天线,该三角形等离子体激元天线用等离子体膜覆盖,该等离子体膜沿着与主极层相对的两个等离子体激元侧的顶点产生边缘等离子体模式。 等离子体屏蔽(PS)沿着ABS形成并与顶点相对,以将边缘等离子体激元模式的电场限制在边缘等离子体激元尖端的小半径内,从而减小磁介质上的光点尺寸并提高可写性。 用于将输入电磁辐射引导到等离子体激元天线的波导的一端与ABS相对的PS侧相邻。 在一个实施例中,可以沿着ABS形成磁屏蔽并与PS邻接,使得第一PS部分在ABS处终止并面向顶点,而在磁屏蔽和波导端之间形成第二PS部分。