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    • 1. 发明授权
    • Method and apparatus for producing color filter with a line-scan exposure technology by high-speed shutter control
    • 通过高速快门控制用线扫描曝光技术生产滤色镜的方法和装置
    • US07695873B2
    • 2010-04-13
    • US11187825
    • 2005-07-25
    • Yu-Cheng LoHuai-An LiFeng-Lin Hsu
    • Yu-Cheng LoHuai-An LiFeng-Lin Hsu
    • G02B5/20
    • G03F7/0043G02B5/201G03F7/70391
    • A method and apparatus for producing a color filter is disclosed. It mainly uses an exposure apparatus which can produce a plurality of exposure light sources to do an exposure process. Through fast controlling the on/off time of the plurality of exposure light sources as well as making a relative moving between the plurality of exposure light sources and a substrate plane, a color photoresist layer on the substrate plane can be exposed to form a pattern thereon, wherein the on/off time of the exposure light sources are respectively controlled by a plurality of shutters of the exposure apparatus. Then, with a developing process to the exposed color photoresist layer, a color layer is formed on the substrate plane. The main advantage of the invention is that photo-mask is not needed in the exposure process and any size substrate plane can be handled by the present exposure apparatus.
    • 公开了一种生产滤色器的方法和装置。 它主要使用可产生多个曝光光源进行曝光处理的曝光装置。 通过快速控制多个曝光光源的开/关时间以及在多个曝光光源和基板平面之间进行相对移动,可以暴露基板平面上的着色光致抗蚀剂层以形成图案上的图案 其中曝光光源的开/关时间分别由曝光装置的多个快门控制。 然后,通过对曝光的彩色光致抗蚀剂层的显影处理,在基板平面上形成着色层。 本发明的主要优点是在曝光过程中不需要光掩模,并且可以通过本曝光装置处理任何尺寸的基板平面。
    • 2. 发明申请
    • Method and apparatus for producing color filter with a line-scan exposure technology by high-speed shutter control
    • 通过高速快门控制用线扫描曝光技术生产滤色镜的方法和装置
    • US20060194127A1
    • 2006-08-31
    • US11187825
    • 2005-07-25
    • Yu-Cheng LoHuai-An LiFeng-Lin Hsu
    • Yu-Cheng LoHuai-An LiFeng-Lin Hsu
    • G02B5/20G03F7/20
    • G03F7/0043G02B5/201G03F7/70391
    • A method and apparatus for producing a color filter is disclosed. It mainly uses an exposure apparatus which can produce a plurality of exposure light sources to do an exposure process. Through fast controlling the on/off time of the plurality of exposure light sources as well as making a relative moving between the plurality of exposure light sources and a substrate plane, a color photoresist layer on the substrate plane can be exposed to form a pattern thereon, wherein the on/off time of the exposure light sources are respectively controlled by a plurality of shutters of the exposure apparatus. Then, with a developing process to the exposed color photoresist layer, a color layer is formed on the substrate plane. The main advantage of the invention is that photo-mask is not needed in the exposure process and any size substrate plane can be handled by the present exposure apparatus.
    • 公开了一种生产滤色器的方法和装置。 它主要使用可产生多个曝光光源进行曝光处理的曝光装置。 通过快速控制多个曝光光源的开/关时间以及在多个曝光光源和基板平面之间进行相对移动,可以暴露基板平面上的着色光致抗蚀剂层以形成图案上的图案 其中曝光光源的开/关时间分别由曝光装置的多个快门控制。 然后,通过对曝光的彩色光致抗蚀剂层的显影处理,在基板平面上形成着色层。 本发明的主要优点是在曝光过程中不需要光掩模,并且可以通过本曝光装置处理任何尺寸的基板平面。