专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06774097B2 Resist stripper composition 有权
标题翻译：抗剥离组合物
公开(公告)号：US06774097B2
公开(公告)日：2004-08-10
申请号：US10258823
申请日：2002-10-25
申请人： Suk-Il Yoon , Young-Woong Park , Chang-Il Oh , Sang-Dai Lee , Chong-Soon Yoo
发明人： Suk-Il Yoon , Young-Woong Park , Chang-Il Oh , Sang-Dai Lee , Chong-Soon Yoo
IPC分类号： G03C1112
CPC分类号： G03F7/425
摘要： The present invention relates to a resist stripper composition that is used to remove resists during semiconductor device manufacturing processes such as for large size integrated circuits, very large size integrated circuits, etc. The resist stripper composition comprises 3 to 10 wt % of an organic amine compound, 30 to 60 wt % of a solvent selected from a group consisting of DCMAc, DMF, DMI, NMP, etc., 30 to 60 wt % of water, 1 to 10 wt % of catechol, resorcin or a mixture thereof and 1 to 10 wt % of a C4-6 straight polyhydric alcohol.
摘要翻译：本发明涉及一种抗蚀剂剥离剂组合物，其用于在诸如用于大尺寸集成电路，超大尺寸集成电路等的半导体器件制造过程中除去抗蚀剂。抗蚀剂剥离剂组合物包含3至10重量％的有机胺化合物，30〜60重量％的选自DCMAc，DMF，DMI，NMP等的溶剂，30〜60重量％的水，1〜10重量％的儿茶酚，间苯二酚或其混合物，1 至10重量％的C 4-6直链多元醇。

2. 发明授权

US06908892B2 Photoresist remover composition 有权
标题翻译：光刻胶去除剂组成
公开(公告)号：US06908892B2
公开(公告)日：2005-06-21
申请号：US10297646
申请日：2001-06-07
申请人： Suk-Il Yoon , Young-Woong Park , Chang-Il Oh , Sang-Dai Lee , Chong-Soon Yoo
发明人： Suk-Il Yoon , Young-Woong Park , Chang-Il Oh , Sang-Dai Lee , Chong-Soon Yoo
IPC分类号： G03F7/42 , H01L21/027 , C11D7/32 , C11D7/50
CPC分类号： G03F7/425
摘要： The present invention is a photoresist remover composition used in order to remove photoresist during the manufacturing process of semiconductor devices, such as large-scale integrated circuits and very large-scale integrated circuits. The present invention comprises 2˜20 weight % of water-soluble hydroxylamine, 5˜15 weight % of oxime compound containing 2 or 3 hydroxyl groups, and 30˜55 weight % of alkyl amide. The photoresist remover composition according to the present invention can easily and quickly remove a photoresist layer that is cured by the processes of hard-bake, dry-etching, and ashing and a side-wall photoresist polymer that is produced from the lower metal film by the reaction of the photoresist with etching and ashing gases during these processes. Especially, the photoresist remover composition has a good property of removing the side-wall photoresist polymer produced from the layers of aluminum, aluminum alloy, and titanium nitride. In addition, during removing process of photoresist, the photoresist remover composition can minimize the corrosion of lower metal film, in particular, the new metallic layers which is adopted to a production line of 64 MDRAM or more-VLSL
摘要翻译：本发明是为了在诸如大规模集成电路和大规模集成电路的半导体器件的制造过程中去除光致抗蚀剂而使用的光致抗蚀剂去除剂组合物。本发明包含2〜20重量％的水溶性羟胺，5〜15重量％的含2或3个羟基的肟化合物和30〜55重量％的烷基酰胺。根据本发明的光致抗蚀剂去除剂组合物可以容易且快速地除去通过硬烘烤，干蚀刻和灰化过程固化的光致抗蚀剂层和由下金属膜制备的侧壁光致抗蚀剂聚合物，通过在这些过程中光刻胶与蚀刻和灰化气体的反应。特别地，光刻胶去除剂组合物具有除去由铝，铝合金和氮化钛层生产的侧壁光致抗蚀剂聚合物的良好性能。此外，在光致抗蚀剂的除去过程中，光致抗蚀剂去除剂组合物可以最小化下金属膜的腐蚀，特别是在生产线上采用的64MDRAM或更高VLSL的新金属层

3. 发明申请

US20070194221A1 Alpha track detector with foldable semicircle ring 审中-公开
标题翻译：具有可折叠半圆环的Alpha轨道检测器
公开(公告)号：US20070194221A1
公开(公告)日：2007-08-23
申请号：US10599021
申请日：2005-03-17
申请人： Young-Woong Park
发明人： Young-Woong Park
IPC分类号： H05H3/02
CPC分类号： G01T1/178 , G01T5/10
摘要： This invention is a radon detector for measuring the time integral concentration of radon in air and the emission rate from various kind of materials. The detector is designed with a foldable semicircle ring (4) in order to install the detector at the heigh suggested from the specialist using thread or wire without any other tools at the site. The detector is designed 3 components in order to exchange the SSTD without open the filtering part (1).
摘要翻译：本发明是用于测量空气中氡气的时间积分浓度和各种材料的排放速率的氡探测器。检测器设计有一个可折叠的半圆环（4），以便将检测器安装在专家建议的高度，使用螺纹或电线，而不需要在现场使用任何其他工具。检测器设计为3个部件，以便在不打开过滤部分（1）的情况下交换SSTD。

4. 发明授权

US08282541B2 Device for sterilizing virus or bacteria by using radioisotope gas 有权
标题翻译：通过使用放射性同位素气体灭菌病毒或细菌的装置
公开(公告)号：US08282541B2
公开(公告)日：2012-10-09
申请号：US11766512
申请日：2007-06-21
申请人： Young-Woong Park
发明人： Young-Woong Park
IPC分类号： A61N5/00 , A61M36/00
CPC分类号： A61N5/10 , A61F7/00 , A61N2/00
摘要： An apparatus for sterilizing a blood vessel in a patient's inner skin includes a generator for providing gaseous radioisotope and a chamber adapted to exposure of a portion of a patient's body to the gaseous radioisotopes. When a patient is contacted with gaseous radioisotopes, alpha and beta particles are emitted from the gaseous radioisotopes into inner skin of the patient. Ultraviolet rays, subsequently emitted from the skin, sterilize viruses or bacteria present in a blood vessel. A method of treating a patient with the apparatus is also provided.
摘要翻译：用于对患者内皮肤中的血管进行灭菌的装置包括用于提供气体放射性同位素的发生器和适于将患者身体的一部分暴露于气体放射性同位素的室。当患者与气体放射性同位素接触时，α和β颗粒从气体放射性同位素发射到患者的内皮中。随后从皮肤发出的紫外线对存在于血管中的病毒或细菌灭菌。还提供了一种用该装置治疗患者的方法。

5. 发明申请

US20080108858A1 DEVICE FOR STERILIZING VIRUS OR BACTERIA BY USING RADIOISOTOPE GAS 有权
标题翻译：通过使用放射性气体来消毒病毒或细菌的装置
公开(公告)号：US20080108858A1
公开(公告)日：2008-05-08
申请号：US11766512
申请日：2007-06-21
申请人： Young-Woong Park
发明人： Young-Woong Park
IPC分类号： A61N5/00 , A61N2/00
CPC分类号： A61N5/10 , A61F7/00 , A61N2/00
摘要： An apparatus for sterilizing a blood vessel in a patient's inner skin includes a generator for providing gaseous radioisotope and a chamber adapted to exposure of a portion of a patient's body to the gaseous radioisotopes. When a patient is contacted with gaseous radioisotopes, alpha and beta particles are emitted from the gaseous radioisotopes into inner skin of the patient. Ultraviolet rays, subsequently emitted from the skin, sterilize viruses or bacteria present in a blood vessel. A method of treating a patient with the apparatus is also provided.
摘要翻译：用于对患者内皮肤中的血管进行灭菌的装置包括用于提供气体放射性同位素的发生器和适于将患者身体的一部分暴露于气体放射性同位素的室。当患者与气体放射性同位素接触时，α和β颗粒从气体放射性同位素发射到患者的内皮中。随后从皮肤发出的紫外线对存在于血管中的病毒或细菌灭菌。还提供了一种用该装置治疗患者的方法。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式