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1. 发明申请

US20050211748A1 Laser processing method and laser processing apparatus using ultra-short pulse laser 审中-公开
标题翻译：激光加工方法和使用超短脉冲激光的激光加工设备
公开(公告)号：US20050211748A1
公开(公告)日：2005-09-29
申请号：US11120091
申请日：2005-05-02
申请人： Yosuke Mizuyama , Yosuke Toyofuku , Xinbing Liu , Chen-Hsiung Cheng
发明人： Yosuke Mizuyama , Yosuke Toyofuku , Xinbing Liu , Chen-Hsiung Cheng
IPC分类号： B23K26/00 , B23K26/06 , B23K26/38 , B41J2/16 , H01S3/107 , H01S3/098
CPC分类号： B41J2/1634 , B23K26/064 , B23K26/0643 , B23K26/0648 , B41J2/162
摘要： A laser processing apparatus includes a laser generation apparatus for outputting an ultra-short pulse laser beam, a laser control apparatus for controlling the laser generation apparatus, an optical system, an optical system control apparatus for measuring the optical system, and a measurement apparatus for measuring the ultra-short pulse laser beam. The intensity of the largest noise component pulse in the ultra-short pulse laser beam is controlled to be 2.5% or less of the intensity of the primary pulse in the ultra-short pulse laser beam.
摘要翻译：一种激光加工装置，包括用于输出超短脉冲激光束的激光产生装置，用于控制激光产生装置的激光控制装置，光学系统，用于测量光学系统的光学系统控制装置，以及用于测量超短脉冲激光束。超短脉冲激光束中的最大噪声分量脉冲的强度被控制在超短脉冲激光束的初级脉冲强度的2.5％以下。

2. 发明申请

US20060263698A1 Apparatus and method of making a grayscale photo mask and an optical grayscale element 失效
标题翻译：制造灰度光掩模和光学灰度元件的装置和方法
公开(公告)号：US20060263698A1
公开(公告)日：2006-11-23
申请号：US11134310
申请日：2005-05-23
申请人： Yosuke Mizuyama , Xinbing Liu
发明人： Yosuke Mizuyama , Xinbing Liu
IPC分类号： G02B6/00 , H01S5/00 , G03F1/00
CPC分类号： G03F7/70383 , G03F1/50 , G03F7/0015
摘要： An apparatus and method for making a grayscale photo mask and a three-dimensional grayscale diffractive optical element operate as follows. A grayscale photo mask is obtained by exposing a laser direct write (LDW) glass material to laser beam radiation from a first laser beam of modulated power moved over a grid of discrete locations on the LDW material, the modulated power being in accordance with grayscale pattern data, and, while the first laser beam is moved over the discrete locations of the grid, exposing the grid to a second laser beam, the power of the second laser beam being less than the bleach threshold of the glass material, to provide each of the discrete locations with a gray scale level to provide a predetermined gray scale pattern of varying optical transmissivity on the LDW material to produce a grayscale mask. An optical element is obtained by exposing a photoresist layer on a wafer to radiation transmitted through the grayscale mask; and removing material from the photoresist layer to provide a predetermined varying thickness of the photoresist layer as determined by the gray scale patterns on the grayscale mask to produce the three-dimensional grayscale diffractive optical element. The optical element may be a diffraction grating. The power of the second laser exposed on said discrete locations may be between about 50 mW and about 5 W, and the power of the first laser exposed on the discrete locations may be between about 20 mW and about 500 mW.
摘要翻译：用于制造灰度光掩模和三维灰度级衍射光学元件的装置和方法如下操作。通过将激光直接写入（LDW）玻璃材料暴露于来自在LDW材料上离散位置网格上移动的调制电力的第一激光束的激光束辐射，获得灰度光掩模，调制后的功率与灰度图数据，并且当第一激光束在网格的离散位置移动时，将栅格暴露于第二激光束，第二激光束的功率小于玻璃材料的漂白阈值，以提供每个具有灰度级的离散位置，以在LDW材料上提供改变光学透射率的预定灰度图案，以产生灰度掩模。通过将晶片上的光致抗蚀剂层暴露于通过灰度掩模的辐射而获得光学元件; 以及从光致抗蚀剂层去除材料以提供通过灰度掩模上的灰度图案确定的光致抗蚀剂层的预定变化厚度，以产生三维灰度级衍射光学元件。光学元件可以是衍射光栅。暴露在所述分立位置上的第二激光器的功率可以在约50mW至约5W之间，并且在离散位置上暴露的第一激光器的功率可以在约20mW至约500mW之间。

3. 发明申请

US20060210886A1 Method for making grayscale photo masks and optical grayscale elements 审中-公开
标题翻译：制作灰度光罩和光学灰阶元件的方法
公开(公告)号：US20060210886A1
公开(公告)日：2006-09-21
申请号：US11083324
申请日：2005-03-18
申请人： Yosuke Mizuyama , Xinbing Liu
发明人： Yosuke Mizuyama , Xinbing Liu
IPC分类号： G09B7/00 , G03C5/00 , G03F1/00
CPC分类号： G03F1/50
摘要： A positive photo resist is provided on a surface of a photo mask blank. Light is then exposed onto the photo resist to form a predetermined pattern of unexposed and exposed portions in the photo-resist. After development, the exposed portions are removed and ions are implanted to obtain a modulated ion density in the photo mask blank. The implanted ions become color centers which absorb a specific wavelength of light and the modulated distribution of the color substrates create the grayscale photo mask. The photo resist structure is finally removed to produce a grayscale photo mask.
摘要翻译：在光掩模板的表面上设置正型光致抗蚀剂。然后将光暴露在光致抗蚀剂上，以在光致抗蚀剂中形成未曝光和曝光部分的预定图案。显影后，去除曝光部分，并注入离子以获得光掩模板坯中调制的离子密度。注入的离子成为吸收特定波长的光的色心，并且彩色底物的调制分布产生灰度光掩模。最后去除光致抗蚀剂结构以产生灰度光掩模。

4. 发明授权

US07436423B2 Apparatus and method of making a grayscale photo mask and an optical grayscale element 失效
标题翻译：制造灰度光掩模和光学灰度元件的装置和方法
公开(公告)号：US07436423B2
公开(公告)日：2008-10-14
申请号：US11134310
申请日：2005-05-23
申请人： Yosuke Mizuyama , Xinbing Liu
发明人： Yosuke Mizuyama , Xinbing Liu
IPC分类号： G02B6/00 , G03F1/00
CPC分类号： G03F7/70383 , G03F1/50 , G03F7/0015
摘要： An apparatus and method for making a grayscale photo mask and a three-dimensional grayscale diffractive optical element operate as follows. A grayscale photo mask is obtained by exposing a laser direct write (LDW) glass material to laser beam radiation from a first laser beam of modulated power moved over a grid of discrete locations on the LDW material, the modulated power being in accordance with grayscale pattern data, and, while the first laser beam is moved over the discrete locations of the grid, exposing the grid to a second laser beam, the power of the second laser beam being less than the bleach threshold of the glass material, to provide each of the discrete locations with a gray scale level to provide a predetermined gray scale pattern of varying optical transmissivity on the LDW material to produce a grayscale mask. An optical element is obtained by exposing a photoresist layer on a wafer to radiation transmitted through the grayscale mask; and removing material from the photoresist layer to provide a predetermined varying thickness of the photoresist layer as determined by the gray scale patterns on the grayscale mask to produce the three-dimensional grayscale diffractive optical element. The optical element may be a diffraction grating. The power of the second laser exposed on said discrete locations may be between about 50 mW and about 5 W, and the power of the first laser exposed on the discrete locations may be between about 20 mW and about 500 mW.
摘要翻译：用于制造灰度光掩模和三维灰度级衍射光学元件的装置和方法如下操作。通过将激光直接写入（LDW）玻璃材料暴露于来自在LDW材料上离散位置网格上移动的调制电力的第一激光束的激光束辐射，获得灰度光掩模，调制后的功率与灰度图数据，并且当第一激光束在网格的离散位置移动时，将栅格暴露于第二激光束，第二激光束的功率小于玻璃材料的漂白阈值，以提供每个具有灰度级的离散位置，以在LDW材料上提供改变光学透射率的预定灰度图案，以产生灰度掩模。通过将晶片上的光致抗蚀剂层暴露于通过灰度掩模的辐射而获得光学元件; 以及从光致抗蚀剂层去除材料以提供通过灰度掩模上的灰度图案确定的光致抗蚀剂层的预定变化厚度，以产生三维灰度级衍射光学元件。光学元件可以是衍射光栅。暴露在所述分立位置上的第二激光器的功率可以在约50mW至约5W之间，并且在离散位置上暴露的第一激光器的功率可以在约20mW至约500mW之间。

5. 发明申请

US20050230368A1 System for and method of manufacturing gravure printing plates 审中-公开
公开(公告)号：US20050230368A1
公开(公告)日：2005-10-20
申请号：US11062342
申请日：2005-02-18
申请人： Chen-Hsiung Cheng , Xinbing Liu
发明人： Chen-Hsiung Cheng , Xinbing Liu
IPC分类号： B23K26/00 , B23K26/38 , B41C1/05 , B41N1/06 , B41N6/00 , G03F7/00
CPC分类号： B41C1/05
摘要： A method of operating a laser drilling system to manufacture gravure printing plates without etching or the use of hazardous chemicals includes activating a laser drilling system, including a picosecond laser, light valves, and a mechanism adapted to rotate a gravure cylinder blank. Operation of the light valves, includes setting the light valves to block and/or allow pulses of laser energy propagating from the laser drilling system that can ablate a linear pattern of cells along a substantially entire length of the gravure cylinder blank. Drilling of cells includes targeting the laser drilling system on the gravure cylinder blank, such that ablation of materials occurs as sub-beams propagate along an optical path to the target area and impinge upon the gravure cylinder blank, wherein specific cells within the target area of the gravure cylinder blank are drilled or not drilled according to settings of the light valves.

6. 发明授权

US06803539B2 System and method of aligning a microfilter in a laser drilling system using a CCD camera 失效
标题翻译：使用CCD照相机在激光钻孔系统中对准微型过滤器的系统和方法
公开(公告)号：US06803539B2
公开(公告)日：2004-10-12
申请号：US10267021
申请日：2002-10-08
申请人： Xinbing Liu , Chen-Hsiung Cheng
发明人： Xinbing Liu , Chen-Hsiung Cheng
IPC分类号： B23K2600
CPC分类号： B23K26/0608 , B23K26/0624 , B23K26/066 , B23K26/0676 , B23K26/382 , B23K26/389 , B23K26/40 , B23K2103/02 , B23K2103/42 , B23K2103/50 , B23K2103/52 , B41J2/162 , B41J2/1634
摘要： A system and method for aligning a microfilter in an optical circuit and thereby providing sub-beam impingement intensity control from a set of highly proximate sub-beams generated from a parallel process laser system removing a portion from a workpiece (exit holes in inkjet nozzle plates). The energy of laser-generated sub-beams to the target (cutting) point is attenuated to a level sufficient for maintaining operation of a charge-coupled-device camera below saturation when the sub-beams are incident on the camera, the CCD camera monitors the sub-beams and directs output to either a monitor or control computer. The microfilter is then adjusted to provide an optimal sub-beam pattern.
摘要翻译：一种用于对准光电路中的微过滤器的系统和方法，从而从平行过程激光系统产生的一组高度近似的子光束提供子束冲击强度控制，从工件中移除部分（喷墨喷嘴板中的出口孔）。激光产生的子光束到目标（切割）点的能量被衰减到足以在电子束入射到相机上时将电荷耦合器件照相机的操作保持在饱和状态的水平，CCD照相机监视器子光束并将其输出到监视器或控制计算机。然后调整微过滤器以提供最佳的子束图案。

7. 发明授权

US06931991B1 System for and method of manufacturing gravure printing plates 失效
公开(公告)号：US06931991B1
公开(公告)日：2005-08-23
申请号：US10814934
申请日：2004-03-31
申请人： Chen-Hsiung Cheng , Xinbing Liu
发明人： Chen-Hsiung Cheng , Xinbing Liu
IPC分类号： B23K26/00 , B23K26/38 , B41C1/05 , B41N1/06 , B41N6/00 , G03F7/00 , B41N6/06
CPC分类号： B41C1/05
摘要： A method of operating a laser drilling system to manufacture gravure printing plates without etching or the use of hazardous chemicals includes activating a laser drilling system, including a picosecond laser, light valves, and a mechanism adapted to rotate a gravure cylinder blank. Operation of the light valves, includes setting the light valves to block and/or allow pulses of laser energy propagating from the laser drilling system that can ablate a linear pattern of cells along a substantially entire length of the gravure cylinder blank. Drilling of cells includes targeting the laser drilling system on the gravure cylinder blank, such that ablation of materials occurs as sub-beams propagate along an optical path to the target area and impinge upon the gravure cylinder blank, wherein specific cells within the target area of the gravure cylinder blank are drilled or not drilled according to settings of the light valves.

8. 发明授权

US06627844B2 Method of laser milling 失效
标题翻译：激光铣削方法
公开(公告)号：US06627844B2
公开(公告)日：2003-09-30
申请号：US10267023
申请日：2002-10-08
申请人： Xinbing Liu , Chen-Hsiung Cheng
发明人： Xinbing Liu , Chen-Hsiung Cheng
IPC分类号： B23K2600
CPC分类号： B23K26/08 , B23K26/0624 , B23K26/082 , B23K26/384 , B23K26/389 , B41J2/162 , B41J2/1634 , H05K3/0026
摘要： A method of laser milling varied shape, geometrically repeatable holes is disclosed where a laser drilling system is provided to ablate material, desired hole geometry is determined based on customer specifications, ablation rate is determined using laser drilling system parameters, and a tool path algorithm is determined based on the geometry, ablation rate, and laser drilling system parameters. The laser milling method may be used in combination with single or parallel processing.
摘要翻译：公开了一种激光铣削的方法，其中提供了几何可重复的孔，其中提供激光钻孔系统以消融材料，根据客户规格确定所需的孔几何形状，使用激光钻孔系统参数确定烧蚀速率，并且刀具路径算法为基于几何，消融率和激光钻孔系统参数确定。激光研磨方法可以与单次或并行处理组合使用。

9. 发明授权

US07122489B2 Manufacturing method of composite sheet material using ultrafast laser pulses 有权
公开(公告)号：US07122489B2
公开(公告)日：2006-10-17
申请号：US10844608
申请日：2004-05-12
申请人： Chen-Hsiung Cheng , Xinbing Liu , Atsushi Sogami , Kazuo Nishimura
发明人： Chen-Hsiung Cheng , Xinbing Liu , Atsushi Sogami , Kazuo Nishimura
IPC分类号： H01L21/00
CPC分类号： H01L51/0017 , H01L51/0009 , H01L51/56 , Y10S438/94
摘要： A patterned, multi-layered thin film structure is patterned using ultra-fast lasers and absorption spectroscopy without damaging underlying layers of the layered structure. The structure is made by selecting ablatable layers based on their thermal, strength and absorption spectra and by using an ultra-fast laser programmed with the appropriate wavelength (λ), pulse width (τ), spectral width (Δλ), spot size, bite size and fluence. The end structure may have features (such as vias, insulating areas, or inkjet printed areas) patterned in the last (top) layer applied or at deeper layers within the layered structure, and can be used as components of organic light emitting didoes (OLEDs) and organic thin film transistors (OTFTs). The method of the present invention includes determining the product's specifications, providing a substrate, selecting a layer, applying the layer, patterning the layer and determining if more layers need to be added to the multi-layered thin film structure.

10. 发明申请

US20050230366A1 System for and method of manufacturing gravure printing plates 审中-公开
公开(公告)号：US20050230366A1
公开(公告)日：2005-10-20
申请号：US11062328
申请日：2005-02-18
申请人： Chen-Hsiung Cheng , Xinbing Liu
发明人： Chen-Hsiung Cheng , Xinbing Liu
IPC分类号： B23K26/00 , B23K26/38 , B41C1/05 , B41N1/06 , B41N6/00 , G03F7/00
CPC分类号： B41C1/05
摘要： A method of operating a laser drilling system to manufacture gravure printing plates without etching or the use of hazardous chemicals includes activating a laser drilling system, including a picosecond laser, light valves, and a mechanism adapted to rotate a gravure cylinder blank. Operation of the light valves, includes setting the light valves to block and/or allow pulses of laser energy propagating from the laser drilling system that can ablate a linear pattern of cells along a substantially entire length of the gravure cylinder blank. Drilling of cells includes targeting the laser drilling system on the gravure cylinder blank, such that ablation of materials occurs as sub-beams propagate along an optical path to the target area and impinge upon the gravure cylinder blank, wherein specific cells within the target area of the gravure cylinder blank are drilled or not drilled according to settings of the light valves.

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