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1. 发明授权

US07575850B2 Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US07575850B2
公开(公告)日：2009-08-18
申请号：US12021149
申请日：2008-01-28
申请人： Yoshiyuki Takata , Satoshi Yamamoto , Satoshi Yamaguchi
发明人： Yoshiyuki Takata , Satoshi Yamamoto , Satoshi Yamaguchi
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and at least two salts selected from a salt represented by the formula (II): wherein Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+ represents an organic counter ion and R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —CO— or —O—, and a salt represented by the formula (III): A′+−O3S—R23 (III) wherein R23 represents a C1-C8 linear or branched chain perfluoroalkyl group and A′+ represents an organic counter ion.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：树脂，其包含具有酸不稳定基团的结构单元和由式（I）表示的结构单元：其中R1表示氢原子或甲基，环X表示 C 1 -C 30环烃基，其中一个-CH 2 - 被-COO-取代，并且C 3 -C 30环烃基中的至少一个氢原子可以被取代，p表示1〜4的整数，本身在碱性水溶液中不溶或难溶，但是通过酸的作用而溶于碱性水溶液中，以及选自式（II）表示的盐中的至少两种盐：其中Y1和Y2各自独立地表示氟原子或C1-C6全氟烷基，A +表示有机抗衡离子，R21表示可以被取代的C1-C30烃基，C1-C30烃基中的至少一个-CH2-可以是取代基 d与-CO-或-O-，以及由式（III）表示的盐：<？in-line-formula description =“In-line formula”end =“lead”？> A'+ - O3S-R23 （III）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R23表示C1-C8直链或支链全氟烷基，A'+表示有机抗衡离子。

2. 发明申请

US20080176168A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION 审中-公开
公开(公告)号：US20080176168A1
公开(公告)日：2008-07-24
申请号：US11961867
申请日：2007-12-20
申请人： Kaoru Araki , Satoshi Yamaguchi , Satoshi Yamamoto
发明人： Kaoru Araki , Satoshi Yamaguchi , Satoshi Yamamoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A chemically amplified resist composition comprising: (A) a salt represented by the formula (I): wherein R21 represents a C1-C30 hydrocarbon group which may be substituted, and at least one —CH2— in the hydrocarbon group may be substituted by —CO— or —O—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents at least one organic cation selected from a cation represented by the formula (Ia): wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, a cation represented by the formula (Ib): wherein P4 and P5 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, and a cation represented by the formula (Ic): wherein P10, P11, P12, P13, P14, P15, P16, P17, P18, P19, P20 and P21 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, B represents a sulfur or oxygen atom and m represents 0 or 1, (B) a salt represented by the formula (II): A′+−O3S-Q3 (II) wherein Q3 represents a C1-C10 perfluoroalkyl group or a C4-C8 perfluorocycloalkyl group, and A′+ represents an organic cation represented by the formula (IIa): wherein P6 and P7 each independently represent a C1-C12 alkyl group or a C3-C12 cycloalkyl group, or P6 and P7 are bonded to form a C3-C12 divalent acyclic hydrocarbon group which forms a ring together with the adjacent S+, and at least one —CH2— in the divalent acyclic hydrocarbon group may be substituted with —CO—, —O— or —S—, P8 represents a hydrogen atom, P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted, or P8 and P9 are bonded to form a divalent acyclic hydrocarbon group which forms a 2-oxocycloalkyl group together with the adjacent —CHCO—, and at least one —CH2— in the divalent acyclic hydrocarbon group may be replaced with —CO—, —O— or —S—; and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

3. 发明申请

US20080213695A1 Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US20080213695A1
公开(公告)日：2008-09-04
申请号：US11987672
申请日：2007-12-03
申请人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
发明人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by (I): wherein R21 represents a C1-C30 hydrocarbon group, Q1 and Q2 each represent a fluorine atom, and A+ represents at least one organic cation represented by (Ia): wherein P1-P3 each represent C1-C30 alkyl group, a cation represented by (Ib): wherein P4 and P5 each represent a hydrogen atom, and a cation represented by (Ic): wherein P10-P21 each represent hydrogen atom, B represents sulfur or oxygen atom and m represents 0 or 1; (B) a salt (II): wherein R22 represents C1-C30 hydrocarbon group, Q3 and Q4 each represent fluorine atom, and A′+ represents an organic cation (IIa): wherein P6 and P7 are each a C1-C12 alkyl group, P8 represents hydrogen atom, P9 represents C1-C12 alkyl group; and (C) a resin which contains a structural unit having an acid-labile group.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：（A）由（I）表示的盐：其中R 21表示C 1 -C 30烃基，Q 1和 Q 2各自表示氟原子，A 0 +表示由（Ia）表示的至少一种有机阳离子：其中P 1〜 SUP> 3各自表示C1-C30烷基，由（Ib）表示的阳离子：其中P 4和P 5各自表示氢原子，和由（Ic）表示的阳离子：其中P为10〜21个，各自表示氢原子，B表示硫或氧原子，m表示0或1; （B）盐（II）：其中R 22表示C 1 -C 30烃基，Q 3和Q 4各自表示氟原子，并且A' +表示有机阳离子（IIa）：其中P 6和P 7各自为C 1 -C 12烷基， SUP> 8表示氢原子，P 9表示C1-C12烷基; 和（C）含有具有酸不稳定基团的结构单元的树脂。

4. 发明授权

US07741007B2 Chemicallly amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US07741007B2
公开(公告)日：2010-06-22
申请号：US11987672
申请日：2007-12-03
申请人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
发明人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by the formula (1) wherein R21, Q1, Q2, and A+ defined in the specification; (B) a salt represented by the formula (II): wherein R22, Q3, Q4, and A′+ are defined in the specification; and (C) a resin which contains a structural unit having a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：（A）由式（1）表示的盐，其中在说明书中定义的R 21，Q 1，Q 2和A + （B）由式（II）表示的盐：其中R 22，Q 3，Q 4和A'+在本说明书中定义; 和（C）含有具有酸不稳定基团的结构单元的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

5. 发明授权

US11167637B2 Fuel filler structure for fuel tank 有权
公开(公告)号：US11167637B2
公开(公告)日：2021-11-09
申请号：US14390693
申请日：2012-04-12
申请人： Satoshi Yamamoto , Chiaki Kataoka , Masaki Akagi
发明人： Satoshi Yamamoto , Chiaki Kataoka , Masaki Akagi
IPC分类号： B60K15/04
摘要： To obtain a fuel filler structure for a fuel tank wherein when causing an opening and closing valve to close, it can be ensured that the opening and closing valve does not rapidly rotate to a closed position in which it closes a fuel fill inlet, and when causing the opening and closing valve to open, the opening and closing valve can be opened with a small force. A fuel filler structure is equipped with a damper on the near side of a flapper valve in the insertion direction of a fuel nozzle. When the flapper valve rotates to an open position, the damper does not act on the flapper valve, and when the flapper valve rotates to a closed position, the damper acts on the flapper valve.

6. 发明授权

US10642119B2 Electrochromic compound, electrochromic composition, and electrochromic element 有权
公开(公告)号：US10642119B2
公开(公告)日：2020-05-05
申请号：US15585201
申请日：2017-05-03
申请人： Satoshi Yamamoto , Toshiya Sagisaka , Masato Shinoda , Daisuke Goto
发明人： Satoshi Yamamoto , Toshiya Sagisaka , Masato Shinoda , Daisuke Goto
IPC分类号： C09K11/06 , G02F1/153 , C09K9/02 , G02F1/1516
CPC分类号： G02F1/153 , C09K9/02 , C09K2211/1029 , C09K2211/1044 , G02F1/15165
摘要： An electrochromic compound represented by the following formula (I) is provided:

where each of R1 to R8 and R11 to R18 independently represents any one of a hydrogen atom, a halogen atom, a monovalent organic group, the monovalent organic group having a substituent, a polymerizable functional group, and the polymerizable functional group having a substituent; and each of R9, R10, R19, and R20 independently represents any one of a hydrogen atom, an alkyl group, and an aryl group.

7. 发明授权

US10534236B2 Electrochromic compound, electrochromic composition, and electrochromic display element 有权
公开(公告)号：US10534236B2
公开(公告)日：2020-01-14
申请号：US15737115
申请日：2016-06-17
申请人： Satoshi Yamamoto , Daisuke Goto , Toshiya Sagisaka , Masato Shinoda , Mamiko Inoue , Fuminari Kaneko , Tohru Yashiro
发明人： Satoshi Yamamoto , Daisuke Goto , Toshiya Sagisaka , Masato Shinoda , Mamiko Inoue , Fuminari Kaneko , Tohru Yashiro
IPC分类号： G02F1/15 , C07D265/28 , G09F9/30 , C09K9/02 , C08F20/36 , C07D265/38 , G02F1/1516
摘要： Provided is an electrochromic compound represented by the following general formula (I) or (II) where R1 to R13 are each independently a hydrogen atom, a halogen atom, a monovalent organic group, or a polymerizable functional group, and at least one of the R1 to the R13 is a polymerizable functional group.

8. 发明授权

US09869918B2 Electrochromic apparatus, electrochromic element, and method of manufacturing electrochromic element 有权
公开(公告)号：US09869918B2
公开(公告)日：2018-01-16
申请号：US14988992
申请日：2016-01-06
申请人： Takahiko Matsumoto , Keiichiroh Yutani , Hidekazu Yaginuma , Koh Fujimura , Fuminari Kaneko , Mamiko Inoue , Sukchan Kim , Satoshi Yamamoto , Tohru Yashiro
发明人： Takahiko Matsumoto , Keiichiroh Yutani , Hidekazu Yaginuma , Koh Fujimura , Fuminari Kaneko , Mamiko Inoue , Sukchan Kim , Satoshi Yamamoto , Tohru Yashiro
IPC分类号： G02F1/155 , G02F1/1343
CPC分类号： G02F1/155 , G02F1/13439 , G02F2001/1552
摘要： An electrochromic apparatus including a first support, a first electrode, a first transparent conductive layer, an electrochromic layer, a second support, a second electrode, a second transparent conductive layer, and an electrolyte layer is provided. The first and second supports have first and second surfaces, respectively, on each of which a plurality of grooves is formed. The grooves on the second surface are facing the grooves on the first surface. The first and second electrodes are disposed at each one of the plurality of grooves of the first and second supports, respectively. The first and second transparent conductive layers are in contact with the first and second surfaces, respectively. The electrochromic layer is in contact with the first transparent conductive layer. The electrolyte layer is between the electrochromic layer and the second transparent conductive layer.

9. 发明授权

US09312036B2 Jet pump measurement pipe repair method 有权
标题翻译：喷射泵测量管修复方法
公开(公告)号：US09312036B2
公开(公告)日：2016-04-12
申请号：US13315887
申请日：2011-12-09
申请人： Yuki Minato , Toshihiro Yasuda , Kunihiko Kinugasa , Hajime Mori , Satoshi Yamamoto , Jun Suzuki , Tadahiro Mitsuhashi
发明人： Yuki Minato , Toshihiro Yasuda , Kunihiko Kinugasa , Hajime Mori , Satoshi Yamamoto , Jun Suzuki , Tadahiro Mitsuhashi
IPC分类号： G21C15/25 , F04F5/54 , G21C17/017 , G21C19/14 , G21C17/10
CPC分类号： G21C15/25 , F04F5/54 , G21C17/017 , G21C17/10 , G21C19/14 , Y02E30/40 , Y10T29/49735
摘要： In a jet pump measurement pipe repair method according to the present embodiment, a breakage part of a measurement pipe horizontally fixed to a lower part of a jet pump provided in reactor water in a reactor pressure vessel is repaired. The method has: a step of cutting and removing the measurement pipe including the breakage part; a step of retaining a connection pipe for connecting the remaining measurement pipe on the jet pump by means of a clamp; and a step of connecting ends of the remaining measurement pipe by means of the connection pipe.
摘要翻译：在根据本实施例的喷射泵测量管道修复方法中，修复水平固定到设置在反应堆压力容器中的反应器水中的喷射泵的下部的测量管的断裂部分。该方法具有：切断除去包含断裂部的测量管的步骤; 保持用于通过夹具连接喷射泵上的剩余测量管的连接管的步骤; 以及通过连接管连接剩余测量管的端部的步骤。

10. 发明授权

US09291893B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09291893B2
公开(公告)日：2016-03-22
申请号：US13281145
申请日：2011-10-25
申请人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
发明人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

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