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    • 6. 发明授权
    • Polishing composition and polishing method using the same
    • 抛光组合物和抛光方法使用相同
    • US07481950B2
    • 2009-01-27
    • US10673779
    • 2003-09-29
    • Shuhei YamadaAkihiro Kawase
    • Shuhei YamadaAkihiro Kawase
    • C09K5/00
    • H01L21/30625C09G1/02C09K3/1409C09K3/1463
    • A polishing composition of the present invention, which is used in precision polishing the surface of a wafer for semiconductor devices, remarkably reduces haze that occurs on the surface of the wafer. The polishing composition includes silicon dioxide, an alkaline compound, a water-soluble polymer, and water. The silicon dioxide is colloidal silica or fumed silica. The average primary particle diameter DSA of the colloidal silica is from 5 to 30 nm, and the average secondary particle diameter DN4 of the colloidal silica is from 5 to 120 nm. The average primary particle diameter DSA of the fumed silica is from 5 to 30 nm, and the average secondary particle diameter DN4 of the fumed silica is from 5 to 200 nm.
    • 用于精密抛光半导体器件的晶片表面的本发明的抛光组合物显着地减少了晶片表面发生的雾度。 抛光组合物包括二氧化硅,碱性化合物,水溶性聚合物和水。 二氧化硅是胶体二氧化硅或热解二氧化硅。 胶体二氧化硅的平均一次粒径DSA为5〜30nm,胶体二氧化硅的平均二次粒径DN4为5〜120nm。 热解二氧化硅的平均一次粒径DSA为5〜30nm,热解法二氧化硅的平均二次粒径DN4为5〜200nm。
    • 7. 发明授权
    • Testing method and testing apparatus for liquid crystal panel
    • 液晶面板测试方法和测试仪器
    • US07307444B2
    • 2007-12-11
    • US11190029
    • 2005-07-26
    • Kazushige UmetsuShuhei Yamada
    • Kazushige UmetsuShuhei Yamada
    • G01R31/00
    • G01N21/958G01N2021/9513G02F1/1309G02F2203/69
    • The present invention provides a technique enabling the amount of time required to evaluate the light fastness of a liquid crystal panel to be shortened. A method of testing the light fastness of a liquid crystal panel comprising a pair of substrates and a liquid crystal layer interposed between the substrates comprises the steps of: irradiating a test subject area of the liquid crystal panel with a laser beam, with at least one of the wavelength, the irradiation energy, and the irradiation duration of the laser beam set as a variable parameter; irradiating the liquid crystal panel with an observation beam and detecting the condition of the observation beam after passing through the liquid crystal panel; and evaluating the light fastness of the liquid crystal panel on the basis of a difference in the condition of the observation beam corresponding to the setting of the variable parameter of the laser beam.
    • 本发明提供了能够缩短液晶面板的耐光性评价所需的时间的技术。 一种测试包括一对基板和介于基板之间的液晶层的液晶面板的耐光性的方法包括以下步骤:用激光束照射液晶面板的测试对象区域,至少一个 的波长,照射能量和激光束的照射持续时间设置为可变参数; 用观察光束照射液晶面板,并检测通过液晶面板后的观察光束的状态; 并根据与激光束的可变参数的设定对应的观察光束的条件差来评价液晶面板的耐光性。
    • 10. 发明申请
    • Testing method and testing apparatus for liquid crystal panel
    • 液晶面板测试方法和测试仪器
    • US20060055931A1
    • 2006-03-16
    • US11190029
    • 2005-07-26
    • Kazushige UmetsuShuhei Yamada
    • Kazushige UmetsuShuhei Yamada
    • G01N21/00
    • G01N21/958G01N2021/9513G02F1/1309G02F2203/69
    • The present invention provides a technique enabling the amount of time required to evaluate the light fastness of a liquid crystal panel to be shortened. A method of testing the light fastness of a liquid crystal panel comprising a pair of substrates and a liquid crystal layer interposed between the substrates comprises the steps of: irradiating a test subject area of the liquid crystal panel with a laser beam, with at least one of the wavelength, the irradiation energy, and the irradiation duration of the laser beam set as a variable parameter; irradiating the liquid crystal panel with an observation beam and detecting the condition of the observation beam after passing through the liquid crystal panel; and evaluating the light fastness of the liquid crystal panel on the basis of a difference in the condition of the observation beam corresponding to the setting of the variable parameter of the laser beam.
    • 本发明提供了能够缩短液晶面板的耐光性评价所需的时间的技术。 一种测试包括一对基板和介于基板之间的液晶层的液晶面板的耐光性的方法包括以下步骤:用激光束照射液晶面板的测试对象区域,至少一个 的波长,照射能量和激光束的照射持续时间设置为可变参数; 用观察光束照射液晶面板,并检测通过液晶面板后的观察光束的状态; 并根据与激光束的可变参数的设定对应的观察光束的条件差来评价液晶面板的耐光性。