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1. 发明授权

US4399266A Laddery lower alkylpolysilsesquioxane having heat-resistant thin film-formability and process for preparing same 失效
标题翻译：具有耐热薄膜成形性的梯形低级烷基聚硅倍半氧烷及其制备方法
公开(公告)号：US4399266A
公开(公告)日：1983-08-16
申请号：US353811
申请日：1982-03-02
申请人： Yoshio Matsumura , Ikuo Nozue , Osahiko Tomomitsu , Takashi Ukachi , Taro Suminoe
发明人： Yoshio Matsumura , Ikuo Nozue , Osahiko Tomomitsu , Takashi Ukachi , Taro Suminoe
IPC分类号： C08G77/04 , C08G77/06 , C08G77/32 , C08G77/00
CPC分类号： C08G77/04 , C08G77/06 , C08G77/32
摘要： A laddery lower alkylpolysilsesquioxane represented by the formula: ##STR1## wherein R and R' represent same or different lower alkyl groups, and n represents an average degree of polymerization, said laddery lower alkylpolysilsesquioxane having a heat-resistant thin film-formability, characterized in that 15 to 30% by weight of the lower alkylpolysilsesquioxane is occupied by the portion having a standard polystyrene-reduced molecular weight of 20,000 or less as measured by gel permeation chromatography. Said silicone resin in which R and R' are methyl is prepared by dissolving CH.sub.3 SiCl.sub.3 in a ketone or an ether, adding water to this solution with stirring to hydrolyze CH.sub.3 SiCl.sub.3, condensing the hydrolyzate and, if necessary, subjecting the resulting condensate to a treatment for adjusting the proportion of the low molecular weight portion in the product.
摘要翻译：由下式表示的梯状低级烷基聚硅倍半氧烷：其中R和R'表示相同或不同的低级烷基，n表示平均聚合度，所述梯状低级烷基聚硅倍半氧烷具有耐热薄膜可成形性，其特征在于通过凝胶渗透色谱法测定，低分子量聚硅氧烷的15〜30重量％被标准聚苯乙烯缩小分子量为20,000以下的部分占据。其中R和R'为甲基的所述有机硅树脂通过将CH 3 SiCl 3溶解在酮或醚中制备，在搅拌下向该溶液中加入水以水解CH 3 SiCl 3，冷凝水解产物，如果需要，将所得缩合物进行处理调节产品中低分子量部分的比例。

2. 发明授权

US4626556A Solvent-soluble organopolysilsesquioxane, process for producing the same, and semi-conductor using the same 失效
标题翻译：溶剂可溶性有机倍半硅氧烷，其制造方法和使用其的半导体
公开(公告)号：US4626556A
公开(公告)日：1986-12-02
申请号：US779617
申请日：1985-09-25
申请人： Ikuo Nozue , Osahiko Tomomitsu , Yoshiji Yumoto , Yoshio Matsumura
发明人： Ikuo Nozue , Osahiko Tomomitsu , Yoshiji Yumoto , Yoshio Matsumura
IPC分类号： C08F2/46 , C08G77/06 , C08G77/20 , G03F7/075 , H01B3/46 , H01L21/312
CPC分类号： H01L21/02137 , C08G77/06 , C08G77/20 , C08K5/0025 , G03F7/0757 , H01B3/465 , H01L21/02282 , H01L21/02345 , H01L21/3122
摘要： A novel raddery organopolysilsesquioxane having lower alkyl groups and alkenyl groups as the side chains and, if necessary, having aryl groups and/or hydrogen atoms bonded as the side chains can be produced by adding water to a solution of a lower-alkyltrihalogenosilane, an alkenyltrihalogenosilane, and, if necessary, an aryltrihalogenosilane and/or a trihalogenosilane in an organic solvent, and heating the resulting mixture. The aforesaid organopolysilsesquioxane can be used for forming a patterned surface-protecting layer or insulating layer for a semiconductor device, in the form of a mixture with a compound which generates crosslinking-reaction-active species upon irradiation with light or an ionizing radiation.
摘要翻译：具有低级烷基和烯基作为侧链的新型有机聚硅氧烷倍半硅氧烷，如果需要，可以通过将低级烷基三卤代硅烷，链烯基三卤代硅烷，如果需要，在有机溶剂中加入芳基三卤代硅烷和/或三卤代硅烷，并加热所得混合物。上述有机聚倍半硅氧烷可以用于形成用于半导体器件的图案化表面保护层或绝缘层，其形式为与在光照射或电离辐射下产生交联反应活性物质的化合物的混合物。

3. 发明授权

US4349664A Doped acetylene polymer and process for production thereof 失效
标题翻译：掺杂的乙炔聚合物及其生产方法
公开(公告)号：US4349664A
公开(公告)日：1982-09-14
申请号：US166995
申请日：1980-07-09
申请人： Yoshio Matsumura , Ikuo Nozue , Takashi Ukachi
发明人： Yoshio Matsumura , Ikuo Nozue , Takashi Ukachi
IPC分类号： C08K5/00 , C08K5/56 , H01B1/12 , H01L51/00 , H01L51/30 , C08F6/00
CPC分类号： H01L51/00 , C08K5/0008 , C08K5/56 , H01B1/125 , H01L51/0041 , Y02E10/549
摘要： Doped acetylene polymers are produced by immersing an acetylene polymer under an inert gas atmosphere in an organic solvent solution of a dopant selected from the group consisting of a platinum group metal complex, a carbonium salt, an oxonium salt and a parabenzoquinone derivative. According to this process, a doped acetylene polymer having any desired electrical conductivity can be produced and the doped acetylene polymer thus obtained has excellent properties as an organic semiconductor material for solar batteries, various sensors, etc.
摘要翻译：掺杂的乙炔聚合物通过将乙炔聚合物在惰性气体气氛下浸渍在选自铂族金属络合物，碳鎓盐，氧鎓盐和对氨基苯醌衍生物的掺杂剂的有机溶剂溶液中来制备。根据该方法，可以制造具有任何所需导电性的掺杂乙炔聚合物，由此获得的掺杂乙炔聚合物具有优异的性能，作为太阳能电池，各种传感器等的有机半导体材料。

4. 发明授权

US06270939B1 Radiation-sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06270939B1
公开(公告)日：2001-08-07
申请号：US09638955
申请日：2000-08-16
申请人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
发明人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
IPC分类号： G03F7023
CPC分类号： G03F7/0226 , G03F7/0048 , G03F7/0085
摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
摘要翻译：一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

5. 发明授权

US6020104A Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent 失效
标题翻译：使用单一单羧酸酯溶剂的辐射敏感树脂组合物
公开(公告)号：US6020104A
公开(公告)日：2000-02-01
申请号：US237660
申请日：1999-01-27
申请人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
发明人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
IPC分类号： G03C1/00 , C08K5/28 , C08L61/06 , G03C1/72 , G03F7/004 , G03F7/008 , G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/0226 , G03F7/0048 , G03F7/0085
摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
摘要翻译：一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

6. 发明授权

US5478691A Radiation-sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US5478691A
公开(公告)日：1995-12-26
申请号：US259167
申请日：1994-06-13
申请人： Satoshi Miyashita , Akihiro Yamanouchi , Ikuo Nozue , Takao Miura
发明人： Satoshi Miyashita , Akihiro Yamanouchi , Ikuo Nozue , Takao Miura
IPC分类号： C08G8/08 , G03F7/023 , G03F7/30
CPC分类号： C08G8/08 , G03F7/0236
摘要： A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alakli-soluble novolak resin comprises a mixture of:95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 2,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I'): ##STR1## wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol repreented by the above structural formula (I) or (I') with at least one aldehyde] and5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): ##STR2## wherein n is 0, 1, 2 or 3, with at least one aldehyde]. In the resin composition, the mixture of Resin A and Resin B may further contain Resin C which is an ester of Resin B with a 1,2-quinonediazidesulfonic acid. The radiation-sensitive resin compopsition is suitable for use as a positive type resist having high sensitivity, excellent developability, high resolution and excellent heat resistance.
摘要翻译：一种包含碱溶性酚醛清漆树脂和1,2-醌二叠氮化合物的辐射敏感性树脂组合物，其中所述可溶解酚醛清漆树脂包括：95-50重量份具有标准聚苯乙烯缩小重量的树脂A - 平均分子量为2,000-20,000 [树脂A为选自由间甲酚和至少一种由结构式（I）或（I'）表示的苯酚缩聚得到的树脂中的至少一种树脂：其中m为2或3，与至少一种醛和通过间甲酚，对甲酚和至少一种由上述结构所代表的苯酚缩聚获得的树脂式（I）或（I'）与至少一种醛]和5-50重量份具有标准聚苯乙烯换算的重均分子量为200-2,000的树脂B [树脂B是通过缩聚至少一种由结构式（II）表示的苯酚：其中， s 0,1,2或3与至少一个醛]。在树脂组合物中，树脂A和树脂B的混合物可以进一步含有作为树脂B与1,2-醌二叠氮磺酸的酯的树脂C. 辐射敏感性树脂组合物适用于具有高灵敏度，显影性，高分辨率和优异耐热性的正型抗蚀剂。

7. 发明授权

US5405720A Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent 失效
标题翻译：含有醌二叠氮化合物，碱溶性树脂和单一单羧酸酯溶剂的辐射敏感组合物
公开(公告)号：US5405720A
公开(公告)日：1995-04-11
申请号：US196497
申请日：1994-02-15
申请人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
发明人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
IPC分类号： G03C1/00 , C08K5/28 , C08L61/06 , G03C1/72 , G03F7/004 , G03F7/008 , G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/0226 , G03F7/0048 , G03F7/0085
摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
摘要翻译：一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

8. 发明授权

US5215857A 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent 失效
标题翻译：含有2-羟基丙酸甲酯，2-羟基丙酸乙酯或3-甲氧基丙酸甲酯作为溶剂的含有辐射敏感性树脂组合物的1,2-醌二叠氮化物
公开(公告)号：US5215857A
公开(公告)日：1993-06-01
申请号：US726140
申请日：1991-07-03
申请人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
发明人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
IPC分类号： G03F7/004 , G03F7/008 , G03F7/022
CPC分类号： G03F7/0226 , G03F7/0048 , G03F7/0085
摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
摘要翻译：一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

9. 发明授权

US5238774A Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent 失效
标题翻译：包含1,2-醌二叠氮化合物，碱溶性树脂和单一单羧酸酯溶剂的辐射敏感组合物
公开(公告)号：US5238774A
公开(公告)日：1993-08-24
申请号：US710113
申请日：1991-06-04
申请人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
发明人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
IPC分类号： G03F7/004 , G03F7/008 , G03F7/022
CPC分类号： G03F7/0085 , G03F7/0048 , G03F7/0226
摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
摘要翻译：一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

10. 发明授权

US5087548A Positive type radiation-sensitive resin composition 失效
标题翻译：阳离子型辐射敏感性树脂组合物
公开(公告)号：US5087548A
公开(公告)日：1992-02-11
申请号：US282958
申请日：1988-12-05
申请人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita , Kiyoshi Honda
发明人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita , Kiyoshi Honda
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
摘要： A positive type radiation-sensitive resin composition which comprises a 1,2-quinonediazide compound and an alkali-soluble novolac resin produced by poly-condensing phenols represented by the formulas (I) and (II) in a molar ratio of (I)/(II) of 1/99 to 100/0 with a carbonyl compound: ##STR1## wherein R.sup.1 and R.sup.2, which may be the same or different, represent hydroxyl groups, hydrogen atoms, alkyl groups, aryl groups, aralkyl groups, alkenyl groups, halogen atoms, alkoxy groups, alkoxycarbonyl groups, aroxycarbonyl groups, alkanoyloxy groups, aroyloxy groups, acyl groups, cyano groups or nitro groups, ##STR2## wherein R.sup.3, R.sup.4 and R.sup.5, which may be the same or different, represent hydrogen atoms, alkyl groups, aryl groups, aralkyl groups, alkenyl groups, halogen atoms, alkoxy groups, alkoxycarbonyl groups, aroxycarbonyl groups, alkanoyloxy groups, aroyloxy groups, acyl groups, cyano groups or nitro groups. The above positive type radiation-sensitive resin composition is excellent in dry-etching resistance, resolution and heat resistance, and appropriate as a positive type resist for producing integrated circuits in which a resist pattern is formed, and also as a positive type resist for producing a mask.
摘要翻译：一种阳离子型辐射敏感性树脂组合物，其包含1,2-醌二叠氮化合物和由式（I）和（II）表示的聚缩醛的酚缩合树脂，摩尔比为（I）/ （II），其中羰基化合物：其中R 1和R 2可以相同或不同，表示羟基，氢原子，烷基，芳基，芳烷基，烯基，卤素原子，烷氧基，烷氧基羰基，芳氧基羰基，烷酰氧基，芳氧基，酰基，氰基或硝基，其中R3，R4和R5可以相同，不同的，表示氢原子，烷基，芳基，芳烷基，烯基，卤素原子，烷氧基，烷氧基羰基，芳氧基羰基，烷酰氧基，芳氧基，酰基，氰基或硝基。上述正型辐射敏感性树脂组合物的耐干蚀刻性，分辨率和耐热性优异，并且适合作为用于制造其中形成抗蚀剂图案的集成电路的正型抗蚀剂，并且作为用于生产抗蚀剂图案的正型抗蚀剂一个面具

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