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    • 3. 发明授权
    • Method for producing optically active naphthalene compound
    • 光学活性萘化合物的制造方法
    • US09181217B2
    • 2015-11-10
    • US14240466
    • 2012-08-24
    • Koji MatsuyamaMasanori HatsudaMasahiko YoshinagaMitsuhiro YadaKoichi Tanimoto
    • Koji MatsuyamaMasanori HatsudaMasahiko YoshinagaMitsuhiro YadaKoichi Tanimoto
    • C07B53/00C07C25/06C07C255/03C07D401/04
    • C07D401/04C07B53/00C07C25/06C07C255/03
    • The present invention provides an industrially advantageous method for producing an optically active naphthalene compound useful as a therapeutic agent for dermatitis or the like. Specifically, the present invention provides a method for producing an optically active naphthalene compound [I], which comprises: a step of reacting a compound [a-1] and a compound [b-1] with each other in the presence of a base and a catalyst that is composed of a Pd compound and a tertiary phosphine ligand (step a); a step of asymmetrically hydrogenating a compound [c-1] in the presence of a hydrogen donor and a complex that is prepared from a ruthenium compound and a chiral ligand, or alternatively in the presence of an optically active oxazaborolidine compound (a CBS catalyst) and a boron hydride compound (step b); and a step of treating a compound [d-1] with a reducing agent (step c). (In the above formulae, Ra and Rb represent the same or different lower alkyl groups; and X1 represents a halogen atom.).
    • 本发明提供了用于制造用作皮炎等的治疗剂的光学活性萘化合物的工业上有利的方法。 具体而言,本发明提供了一种光学活性萘化合物[I]的制造方法,其特征在于,在碱的存在下,使化合物[a-1]和化合物[b-1] 和由Pd化合物和叔膦配体组成的催化剂(步骤a); 在氢供体和由钌化合物和手性配体制备的络合物的存在下,或者在光学活性的恶唑硼烷化合物(CBS催化剂)存在下,不对称地氢化化合物[c-1] 和硼氢化合物(步骤b); 和用还原剂处理化合物[d-1](步骤c)的步骤。 (上述式中,Ra和Rb表示相同或不同的低级烷基,X1表示卤素原子。
    • 5. 发明申请
    • METHOD FOR PRODUCING OPTICALLY ACTIVE NAPHTHALENE COMPOUND
    • 用于生产光学活性萘基化合物的方法
    • US20150152082A1
    • 2015-06-04
    • US14240466
    • 2012-08-24
    • Koji MatsuyamaMasanori HatsudaMasahiko YoshinagaMitsuhiro YadaKoichi Tanimoto
    • Koji MatsuyamaMasanori HatsudaMasahiko YoshinagaMitsuhiro YadaKoichi Tanimoto
    • C07D401/04C07C255/03C07C25/06
    • C07D401/04C07B53/00C07C25/06C07C255/03
    • The present invention provides an industrially advantageous method for producing an optically active naphthalene compound useful as a therapeutic agent for dermatitis or the like. Specifically, the present invention provides a method for producing an optically active naphthalene compound [I], which comprises: a step of reacting a compound [a-1] and a compound [b-1] with each other in the presence of a base and a catalyst that is composed of a Pd compound and a tertiary phosphine ligand (step a); a step of asymmetrically hydrogenating a compound [c-1] in the presence of a hydrogen donor and a complex that is prepared from a ruthenium compound and a chiral ligand, or alternatively in the presence of an optically active oxazaborolidine compound (a CBS catalyst) and a boron hydride compound (step b); and a step of treating a compound [d-1] with a reducing agent (step c). (In the above formulae, Ra and Rb represent the same or different lower alkyl groups; and X1 represents a halogen atom.)
    • 本发明提供了用于制造用作皮炎等的治疗剂的光学活性萘化合物的工业上有利的方法。 具体而言,本发明提供了一种光学活性萘化合物[I]的制造方法,其特征在于,在碱的存在下,使化合物[a-1]和化合物[b-1] 和由Pd化合物和叔膦配体组成的催化剂(步骤a); 在氢供体和由钌化合物和手性配体制备的络合物的存在下,或者在光学活性的恶唑硼烷化合物(CBS催化剂)存在下,不对称地氢化化合物[c-1] 和硼氢化合物(步骤b); 和用还原剂处理化合物[d-1](步骤c)的步骤。 (上式中,Ra和Rb表示相同或不同的低级烷基,X1表示卤素原子。)
    • 10. 发明授权
    • Photosensitive resin composition
    • 感光树脂组合物
    • US06727042B2
    • 2004-04-27
    • US10169927
    • 2002-07-11
    • Toru TakagiMitsuhiro YadaTakeshi Saitou
    • Toru TakagiMitsuhiro YadaTakeshi Saitou
    • C03F7027
    • G03F7/0388C08G59/1438C08G59/182C08K5/0025C08L63/00C08L63/10C08L67/00G03F7/027H01L23/49894H01L2924/0002H05K3/287C08L2666/22H01L2924/00
    • A photosensitive resin composition according to the invention includes (A) a photosensitive resin, (B) an epoxy resin, (C) a photopolymerization initiator, and (D) a polymerizable unsaturated compound and/or a solvent, which photosensitive resin (A) is obtained by allowing an epoxy resin (a) to react with a compound (b) having one primary alcoholic hydroxyl group and one functional group selected from a carboxyl group and a secondary amino group per molecule and an unsaturated monobasic acid (c) to yield a reaction product (I) and allowing a saturated or unsaturated polybasic acid anhydride (d) to react with the reaction product (I). The photosensitive resin composition of the invention is used as a solder resist in printed circuit boards, can be satisfactorily developed in a dilute basic aqueous solution and can yield a cured film that is excellent in flexibility, water resistance, adhesion, solder heat resistance, electroless gold plating resistance and pressure cooker test (PCT) resistance.
    • 根据本发明的感光性树脂组合物包含(A)感光性树脂,(B)环氧树脂,(C)光聚合引发剂和(D)可聚合不饱和化合物和/或溶剂,该感光性树脂(A) 通过使环氧树脂(a)与每分子具有一个伯醇羟基和一个选自羧基和仲氨基的官能团和不饱和一元酸(c)的化合物(b)反应,得到 反应产物(I)并使饱和或不饱和多元酸酐(d)与反应产物(I)反应。 本发明的感光性树脂组合物用作印刷电路板中的阻焊剂,可以在稀碱水溶液中令人满意地显影,并且可以得到柔软性,耐水性,粘合性,焊料耐热性,无电解的优异的固化膜 镀金电阻和压力锅试验(PCT)电阻。