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1. 发明授权

US08934092B2 Surface defect inspection method and apparatus 有权
标题翻译：表面缺陷检查方法及装置
公开(公告)号：US08934092B2
公开(公告)日：2015-01-13
申请号：US13838460
申请日：2013-03-15
申请人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
发明人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/9501 , G01N2021/4716
摘要： A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.
摘要翻译：一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行在样品表面的线照射区域上的光束的线照明。线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

2. 发明申请

US20100265494A1 SURFACE DEFECT INSPECTION METHOD AND APPARATUS 有权
标题翻译：表面缺陷检查方法和装置
公开(公告)号：US20100265494A1
公开(公告)日：2010-10-21
申请号：US12727752
申请日：2010-03-19
申请人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
发明人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
IPC分类号： G01N21/88 , G01N21/00 , G01J3/00
CPC分类号： G01N21/9501 , G01N2021/4716
摘要： A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.
摘要翻译：一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行在样品表面的线照射区域上的光束的线照明。线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

3. 发明申请

US20080304055A1 SURFACE DEFECT INSPECTION METHOD AND APPARATUS 失效
标题翻译：表面缺陷检查方法和装置
公开(公告)号：US20080304055A1
公开(公告)日：2008-12-11
申请号：US12109548
申请日：2008-04-25
申请人： Yoshimasa OSHIMA , Toshiyuki Nakao , Shigeru Matsui
发明人： Yoshimasa OSHIMA , Toshiyuki Nakao , Shigeru Matsui
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N2021/4716
摘要： A surface defect inspection apparatus is structured to add detection signals of multi-directionally detected scattered lights to detect a tiny defect and to individually process the respective detection signals to prevent an error failing to detect an anisotropic defect.
摘要翻译：表面缺陷检查装置被构造成添加多方向检测的散射光的检测信号以检测微小的缺陷，并且分别处理各个检测信号以防止错误检测各向异性缺陷。

4. 发明授权

US08400629B2 Surface defect inspection method and apparatus 失效
公开(公告)号：US08400629B2
公开(公告)日：2013-03-19
申请号：US13221314
申请日：2011-08-30
申请人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
发明人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/9501 , G01N2021/4716
摘要： A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

5. 发明授权

US07710557B2 Surface defect inspection method and apparatus 失效
标题翻译：表面缺陷检查方法及装置
公开(公告)号：US07710557B2
公开(公告)日：2010-05-04
申请号：US12109548
申请日：2008-04-25
申请人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
发明人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/9501 , G01N2021/4716
摘要： A surface defect inspection apparatus is structured to add detection signals of multi-directionally detected scattered lights to detect a tiny defect and to individually process the respective detection signals to prevent an error failing to detect an anisotropic defect.
摘要翻译：表面缺陷检查装置被构造成添加多方向检测的散射光的检测信号以检测微小的缺陷，并且分别处理各个检测信号以防止错误检测各向异性缺陷。

6. 发明授权

US08035808B2 Surface defect inspection method and apparatus 有权
标题翻译：表面缺陷检查方法及装置
公开(公告)号：US08035808B2
公开(公告)日：2011-10-11
申请号：US12727752
申请日：2010-03-19
申请人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
发明人： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/9501 , G01N2021/4716
摘要： A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.
摘要翻译：一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行在样品表面的线照射区域上的光束的线照明。线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

7. 发明申请

US20130107247A1 Inspecting Method and Inspecting Apparatus For Substrate Surface 有权
标题翻译：基板表面检查方法及检查装置
公开(公告)号：US20130107247A1
公开(公告)日：2013-05-02
申请号：US13672742
申请日：2012-11-09
申请人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
发明人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
IPC分类号： G01B11/30
CPC分类号： G01B11/303 , G01N21/47 , G01N21/94 , G01N21/9501
摘要： An inspecting method and apparatus for inspecting a substrate surface includes illuminating a light to the substrate surface having a film, detection of a scattered light or reflected light from a plurality of positions of the substrate surface to obtain a plurality of electrical signals, comparison of the plurality of electrical signals and a database which indicates a relationship between the electrical signals and surface roughness, and calculation of a surface roughness value based on the result of comparison.
摘要翻译：用于检查基板表面的检查方法和装置包括将光照射到具有膜的基板表面，从基板表面的多个位置检测散射光或反射光以获得多个电信号，多个电信号和指示电信号和表面粗糙度之间的关系的数据库，以及基于比较结果的表面粗糙度值的计算。

8. 发明申请

US20110080578A1 Method and Its Apparatus For Inspecting Defects 有权
标题翻译：检测缺陷的方法及其设备
公开(公告)号：US20110080578A1
公开(公告)日：2011-04-07
申请号：US12964249
申请日：2010-12-09
申请人： Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima
发明人： Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/9503
摘要： A defect inspection apparatus is capable of inspecting an extremely small defect present on the top and edge surfaces of a sample such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed. The defect inspection apparatus has an illumination optical system, a plurality of detection optical units and a signal processor. One or more of the detection optical units receives either light diffracted from an edge portion of the sample or light diffracted from an edge grip holding the sample. The one or more of the detection optical units shields the diffracted light received by the detection optical unit based on a signal obtained by monitoring an intensity of the diffracted light received by the detection optical unit in order to inspect a sample portion located near the edge portion and a sample portion located near the edge grip.
摘要翻译：缺陷检查装置能够以高灵敏度和高速检查诸如半导体衬底或薄膜衬底的样品的顶部和边缘表面上存在的极小缺陷。缺陷检查装置具有照明光学系统，多个检测光学单元和信号处理器。一个或多个检测光学单元接收从样品的边缘部分衍射的光或从夹持样品的边缘把手衍射的光。一个或多个检测光学单元基于通过监视由检测光学单元接收的衍射光的强度而获得的信号来屏蔽由检测光学单元接收的衍射光，以便检查位于边缘部分附近的样本部分以及位于边缘把手附近的样品部分。

9. 发明授权

US07869024B2 Method and its apparatus for inspecting defects 有权
公开(公告)号：US07869024B2
公开(公告)日：2011-01-11
申请号：US12414727
申请日：2009-03-31
申请人： Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima
发明人： Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima
IPC分类号： G01N21/00 , G01J4/00
CPC分类号： G01N21/9501 , G01N21/9503
摘要： A defect inspection apparatus is capable of inspecting an extremely small defect present on the top and edge surfaces of a sample such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed. The defect inspection apparatus has an illumination optical system, a plurality of detection optical units and a signal processor. One or more of the detection optical units receives either light diffracted from an edge portion of the sample or light diffracted from an edge grip holding the sample. The one or more of the detection optical units shields the diffracted light received by the detection optical unit based on a signal obtained by monitoring an intensity of the diffracted light received by the detection optical unit in order to inspect a sample portion located near the edge portion and a sample portion located near the edge grip.

10. 发明授权

US07675613B2 Defect inspection method 失效
标题翻译：缺陷检查方法
公开(公告)号：US07675613B2
公开(公告)日：2010-03-09
申请号：US12362950
申请日：2009-01-30
申请人： Toshiyuki Nakao , Yoshimasa Oshima , Yuta Urano
发明人： Toshiyuki Nakao , Yoshimasa Oshima , Yuta Urano
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N2021/887
摘要： A method for inspecting a defect of a surface of a sample includes irradiating a laser beam on the sample surface a plurality of times so that at least part of an illumination field of the laser beam on the sample surface illuminates a first area of the sample surface each of the plurality of times, detecting a plurality of scattered light rays from the first area caused by the plurality of times of irradiations, correcting errors of detection timings for the plurality of detected scattered light rays, correcting at least one of adding and averaging the plurality of scattered light rays, determining a defect on the sample surface based on a calculation result in accordance with the at least one of the adding and averaging.
摘要翻译：用于检查样品表面的缺陷的方法包括：将激光束多次照射在样品表面上，使得样品表面上的激光束的照明场的至少一部分照射样品表面的第一区域多次检测由多次照射引起的来自第一区域的多个散射光线，校正多个检测到的散射光线的检测定时的误差，校正至少一个加法和平均化多个散射光线，根据加法和平均中的至少一个，基于计算结果确定样品表面上的缺陷。

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