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    • 10. 发明授权
    • Chemically amplified positive resist composition
    • 化学放大正光刻胶组合物
    • US06579659B2
    • 2003-06-17
    • US09824227
    • 2001-04-03
    • Yasunori UetaniAiri YamadaYoshiko MiyaYoshiyuki Takata
    • Yasunori UetaniAiri YamadaYoshiko MiyaYoshiyuki Takata
    • G03F7004
    • G03F7/039G03F7/0045Y10S430/106Y10S430/111
    • A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent. (A): At least one polymeric unit of an alicyclic lactcone selected from polymeric units represented by the following formulae (Ia) and (Ib): (B): At least one polymeric unit selected from a polymeric unit of 3-hydroxy-1-adamantyl (meth)acrylate represented by the following formula (II), a polymeric unit of a combination of a unit represented by the following formula (III) and a unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride and a polymeric unit of (&agr;)&bgr;-(meth)acryloyloxy-&ggr;-butyrolactone represented by the following formula (IV):
    • 包含具有以下聚合单元(A),(B)和(C)的树脂的性能如分辨率,轮廓,灵敏度,耐干蚀刻性,粘附性等的平衡优异的化学增幅型正光刻胶组合物; (A):选自由下式(Ia)和(Ib)表示的聚合单元的脂环族内聚焦的至少一种聚合单元:( B):至少一种选自聚合单元的聚合单元 由下式(II)表示的3-羟基-1-金刚烷基(甲基)丙烯酸酯,由下式(III)表示的单元的组合的单体和来自选自马来酸酐的不饱和二羧酸酐的单元 酸酐和衣康酸酐以及由下式(IV)表示的(α)β-(甲基)丙烯酰氧基-γ-丁内酯的聚合单元: