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    • 3. 发明授权
    • Halide compound mass spectrometry method and mass spectrometry apparatus
    • 卤化物复合质谱法和质谱仪
    • US06507020B2
    • 2003-01-14
    • US09736331
    • 2000-12-15
    • Yoshiro ShiokawaToshihiro Fujii
    • Yoshiro ShiokawaToshihiro Fujii
    • H01J4926
    • H01J49/145
    • A mass spectrometry apparatus is provided with an emitter for emitting metal ions, a reaction chamber where the detected gas is introduced and ionized by the metal ions, an aperture for guiding molecules of the ionized detected gas, and a mass spectrometer for measuring the guided molecules. The metal ions emitted from the emitter are caused to fly to the reaction chamber to ionize said detected gas. The detected gas is a halide compound. Further provision is made of a sample gas source for feeding a halide compound to the reaction chamber and an N2 gas source for feeding to the reaction chamber a gas (N2 etc.) to which the metal ions attach less easily than to the halide compound. It is therefore made possible to apply cation attachment of the Fujii system to mass spectrometry of a halide compound and enable precise measurement of fluoride compounds etc. having a large impact on global warming.
    • 质谱装置设置有用于发射金属离子的发射体,其中被检测到的气体被金属离子引入和离子化的反应室,用于引导电离检测气体的分子的引导孔和用于测量引导分子的质谱仪 。 使从发射体发射的金属离子飞到反应室,使所检测到的气体离子化。 所检测的气体是卤化物。 进一步提供用于向反应室供给卤化物的样品气体源和用于向反应室供给与金属卤化物相比更容易地附着金属离子的气体(N 2等)的N 2气体源。 因此,可以将Fujii系统的阳离子附着物应用于卤化物的质谱法,并能够精确测量对全球变暖具有很大影响的氟化物等。
    • 6. 发明授权
    • Method and apparatus for ion attachment mass spectrometry
    • 用于离子附着质谱的方法和装置
    • US06800848B2
    • 2004-10-05
    • US09870736
    • 2001-06-01
    • Yoshiro ShiokawaMegumi NakamuraTohru SasakiToshihiro Fujii
    • Yoshiro ShiokawaMegumi NakamuraTohru SasakiToshihiro Fujii
    • B01D5944
    • H01J49/145
    • An apparatus for ion attachment mass spectrometry provided with a reaction chamber for causing positively charged metal ions to attach to a gas to be detected; a mass spectrometer for mass separation and detection of the detection gas; an analysis chamber in which the mass spectrometer is placed; differential evacuation chambers for connecting the reaction chamber and analysis chamber; a data processor for receiving and processing the mass signal from the mass spectrometer; and vacuum gauges for measuring the total pressure of the reduced pressure atmosphere of the reduced pressure atmosphere reaction chamber, a differential evacuation chamber, and an analysis chamber. The total pressure signal from the vacuum gauge measured during the measurement is input to one of the data processor, introduction mechanism, and evacuation mechanism. The data processor has a processing means for performing quantitative analysis of each component utilizing the fact that sensitivity of each component has dependency on the total pressure of the reduced pressure atmosphere and that the dependency on total pressure differs for each component.
    • 一种用于离子附着质谱的装置,其具有用于使带正电荷的金属离子附着到待检测气体的反应室; 用于质量分离和检测气体的质谱仪; 分析室,放置质谱仪; 用于连接反应室和分析室的差分抽空室; 用于从质谱仪接收和处理质量信号的数据处理器; 以及用于测量减压气氛反应室的减压气氛的总压力,差示抽空室和分析室的真空计。 在测量期间测量的来自真空计的总压力信号被输入到数据处理器,引入机构和抽空机构之一。 数据处理器具有处理装置,用于利用每个部件的灵敏度依赖于减压气氛的总压力并且对于每个部件对总压力的依赖性的事实来对每个部件进行定量分析。
    • 8. 发明授权
    • Ion source for ion attachment mass spectrometry apparatus
    • 离子源离子附件质谱仪
    • US06479814B2
    • 2002-11-12
    • US09814799
    • 2001-03-23
    • Yoshiro ShiokawaMegumi NakamuraToshihiro Fujii
    • Yoshiro ShiokawaMegumi NakamuraToshihiro Fujii
    • H01J4916
    • H01J49/04
    • An ion source of an ion attachment mass spectrometry apparatus has an emitter and a voltage-impressed portion for impressing a bias voltage to the emitter. In the ion source, the emitter is heated to emit positive charge metal ions that are attached to a detected gas to ionize it. By changing the material of the emitter, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced. By shortening the distance between the reference-voltage-impressed portion and the ion emission point, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced to not more than 1010&OHgr;. It is also possible to form a thin film emitter on the surface of the reference-voltage-impressed portion. Due to this, it is possible to suppress the occurrence of fluctuations in the potential difference between the ion emitter and the reference-voltage-impressed portion, stabilize the amount of ion emission, and analyze the mass with a high accuracy.
    • 离子附着质谱装置的离子源具有用于向偏置电压施加偏压的发射极和电压施加部。 在离子源中,发射体被加热以发射附着于被检测气体的正电荷金属离子以使其离子化。 通过改变发射极的材料,发射极的离子发射点与电压压入部分的基准电压压入部分之间的电阻降低。 通过缩短参考电压施加部分和离子发射点之间的距离,发射极的离子发射点和电压施加部分的基准电压施加部分之间的电阻降低到不大于1010OMEGA 。 也可以在基准电压施加部分的表面上形成薄膜发射极。 由此,可以抑制离子发射体与基准电压印制部之间的电位差的波动的发生,稳定离子发射量,并且高精度地分析质量。