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    • 7. 发明授权
    • Instrument and method for observing selected stored images acquired from a scanning charged-particle beam
    • 用于观察从扫描带电粒子束获取的选定存储图像的仪器和方法
    • US06888137B1
    • 2005-05-03
    • US09593867
    • 2000-06-14
    • Atsushi YamadaTsutomu NegishiToshiharu KobayashiNorio Watanabe
    • Atsushi YamadaTsutomu NegishiToshiharu KobayashiNorio Watanabe
    • H01J37/20G01B15/00G01B15/08G01N23/225G01Q10/00G01Q30/04H01J37/22H01J37/28H01J37/00
    • H01J37/28H01J37/22
    • There is disclosed a scanning electron charged-particle beam instrument facilitating a search for a desired field of view on a specimen. Also, a method of observing a specimen image with this instrument is disclosed. In field of view search mode, low-magnification images are gained from plural regions on the specimen. The image signals gained from the regions are sent to corresponding image memories and stored there. At the same time, the X and Y coordinates of the specimen at the low magnification are stored. If the image is rotated, the angular position and the direction are simultaneously stored. The image signals stored in the image memories are supplied to a CRT, and plural specimen images are displayed on the CRT. If a human operator selects a desired one out of the displayed images, a control unit controls a stage control unit according to coordinates read out, driving an X-Y translation stage. The stage is moved to bring a specimen position corresponding to the selected image onto the optical axis of the electron beam.
    • 公开了一种扫描电子带电粒子束仪器,便于在样本上搜索期望的视场。 另外,公开了利用该仪器观察标本图像的方法。 在视野搜索模式下,从样本上的多个区域获得低倍率图像。 从这些区域获得的图像信号被发送到相应的图像存储器并存储在那里。 同时,存储低倍率下的样品的X和Y坐标。 如果图像旋转,则同时存储角位置和方向。 存储在图像存储器中的图像信号被提供给CRT,并且在CRT上显示多个标本图像。 如果人类操作者从所显示的图像中选择期望的一个,则控制单元根据读出的坐标来控制舞台控制单元,驱动X-Y平移舞台。 移动台以使与所选图像相对应的样本位置到电子束的光轴上。
    • 9. 发明授权
    • Scanning charged-particle beam instrument
    • 扫描带电粒子束仪
    • US06444991B1
    • 2002-09-03
    • US09619450
    • 2000-07-19
    • Atsushi YamadaTsutomu NegishiToshiharu KobayashiNorio Watanabe
    • Atsushi YamadaTsutomu NegishiToshiharu KobayashiNorio Watanabe
    • H01J3720
    • H01J37/20H01J2237/20242
    • There is disclosed a scanning electron charged-particle beam instrument in which the image does not escape during rotation even if the center of mechanical rotation is not coincident with the center of the image. The instrument is so operated that the center position of the image is fixed when a mechanical rotation is made if the center of mechanical rotation is not coincident with the center of the image. For this purpose, when the specimen stage assembly is rotated mechanically, the X-stage of the specimen stage assembly is driven to move in the X-direction. The Y-stage of the stage assembly is driven to move in the Y-direction. The distance L between the center of mechanical rotation and the moving speed of the X-Y stage are interlinked. The apparent speed of the rotational speed of the image on the viewing screen is made constant irrespective of the distance L. In practice, the moving speed of the X-Y stage is increased with increasing the distance L.
    • 公开了一种扫描电子带电粒子束仪器,其中即使机械旋转的中心与图像的中心不一致,图像在旋转期间也不会逸出。 如果机械旋转的中心与图像的中心不一致,则在进行机械旋转时,该仪器的操作使得图像的中心位置是固定的。 为此,当样品台组件机械旋转时,样品台组件的X级被驱动以沿X方向移动。 舞台组件的Y档被驱动沿Y方向移动。 机械旋转中心与X-Y平台的移动速度之间的距离L是相互连接的。 观看屏幕上的图像的转速的视在速度与距离L无关。实际上,X-Y平台的移动速度随着距离L的增加而增加。
    • 10. 发明授权
    • Method of inspecting holes using charged-particle beam
    • 使用带电粒子束检查孔的方法
    • US06787770B2
    • 2004-09-07
    • US10060944
    • 2002-01-30
    • Naoki KikuchiTsutomu NegishiYuki Ono
    • Naoki KikuchiTsutomu NegishiYuki Ono
    • G01N2304
    • G01N23/00
    • This disclosure is directed to a method of inspecting how contact holes or via holes are formed in a sample, such as a wafer. An electron beam is directed to the contact holes in succession. An absorbed current flowing through the sample is detected by a current amplifier. Data about the obtained absorbed current is stored in a memory. The electric current flowing through a reference sample and ground is measured, and the relation of the current to the etch depths of contact holes into the substrate is previously found. A control unit compares data about the measured current with the previously found relation and determines the depths of holes of interest into the substrate (i.e., inspects how they are etched).
    • 本公开涉及一种检查诸如晶片的样品中如何形成接触孔或通孔的方法。 电子束依次被引导到接触孔。 通过电流放大器检测流过样品的吸收电流。 关于获得的吸收电流的数据被存储在存储器中。 测量流过参考样品和地面的电流,并且预先发现电流与衬底中的接触孔的蚀刻深度之间的关系。 控制单元将关于测量的电流的数据与先前发现的关系进行比较,并确定感兴趣的空穴的深度(即,检查它们如何被蚀刻)。