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    • 2. 发明授权
    • Near field analysis apparatus having irradiation-side guide light and light-collection-side guide light
    • 近场分析装置具有照射侧引导灯和集光侧引导光
    • US07235807B2
    • 2007-06-26
    • US11316402
    • 2005-12-22
    • Yoshihito NaritaShigeyuki KimuraFuminori SatoAtsushi Yamada
    • Yoshihito NaritaShigeyuki KimuraFuminori SatoAtsushi Yamada
    • G01N21/86
    • G01Q60/22
    • A near field analysis apparatus comprising: an irradiation optical system comprising an irradiation-side adjustable optical system for adjusting the position or angle of an optical axis thereof, and irradiating irradiation-side guide light onto an adjustment surface via the irradiation-side adjustable optical system; a light collecting optical system comprising a light-collection-side adjustable optical system for adjusting the position or angle of an optical axis thereof, and irradiating light-collection-side guide light onto the adjustment surface via the light-collection-side adjustable optical system; an irradiation-side adjustment device for adjusting the position or angle of the irradiation-side adjustable optical system such that the spots of the guide light, which are observed at the adjustment surface, match; and a light-collection-side adjustment device for adjusting the position or angle of the light-collection-side adjustable optical system such that the spots of the guide light, which are observed at the adjustment surface, match.
    • 一种近场分析装置,包括:照射光学系统,包括用于调节其光轴的位置或角度的照射侧可调节光学系统,并且经由照射侧可调节光学系统将照射侧引导光照射到调整表面上 ; 光收集光学系统,包括用于调节其光轴的位置或角度的采光侧可调光学系统,以及经由采光侧可调节光学系统将光收集侧引导光照射到调节表面上 ; 照射侧调节装置,用于调节照射侧可调节光学系统的位置或角度,使得在调节表面观察到的引导光点相匹配; 以及采集侧调整装置,其用于调整所述收光侧可调光学系统的位置或角度,使得在所述调整面观察到的所述引导光的光斑匹配。
    • 3. 发明申请
    • Near field analysis apparatus
    • 近场分析仪
    • US20060131493A1
    • 2006-06-22
    • US11316402
    • 2005-12-22
    • Yoshihito NaritaShigeyuki KimuraFuminori SatoAtsushi Yamada
    • Yoshihito NaritaShigeyuki KimuraFuminori SatoAtsushi Yamada
    • H01J40/14
    • G01Q60/22
    • A near field analysis apparatus comprising: an irradiation optical system comprising an irradiation-side adjustable optical system for adjusting the position or angle of an optical axis thereof, and irradiating irradiation-side guide light onto an adjustment surface via the irradiation-side adjustable optical system; a light collecting optical system comprising a light-collection-side adjustable optical system for adjusting the position or angle of an optical axis thereof, and irradiating light-collection-side guide light onto the adjustment surface via the light-collection-side adjustable optical system; an irradiation-side adjustment device for adjusting the position or angle of the irradiation-side adjustable optical system such that the spots of the guide light, which are observed at the adjustment surface, match; and a light-collection-side adjustment device for adjusting the position or angle of the light-collection-side adjustable optical system such that the spots of the guide light, which are observed at the adjustment surface, match.
    • 一种近场分析装置,包括:照射光学系统,包括用于调节其光轴的位置或角度的照射侧可调节光学系统,并且经由照射侧可调节光学系统将照射侧引导光照射到调整表面上 ; 光收集光学系统,包括用于调节其光轴的位置或角度的采光侧可调光学系统,以及经由采光侧可调节光学系统将光收集侧引导光照射到调节表面上 ; 照射侧调节装置,用于调节照射侧可调节光学系统的位置或角度,使得在调节表面观察到的引导光点相匹配; 以及采集侧调整装置,其用于调整所述收光侧可调光学系统的位置或角度,使得在所述调整面观察到的所述引导光的光斑匹配。
    • 5. 发明授权
    • Probe opening fabricating apparatus, and near-field optical microscope using the same
    • 探头开口制造装置和使用其的近场光学显微镜
    • US06812449B2
    • 2004-11-02
    • US10796088
    • 2004-03-10
    • Tsutomu InoueFuminori SatoYoshihito Narita
    • Tsutomu InoueFuminori SatoYoshihito Narita
    • H01J4014
    • G01Q60/22
    • An opening fabricating apparatus for creating an opening with desired dimensions at a mask tip of a near-field optical microscope, and a near-field optical microscope using the same are provided. The apparatus comprising: a light source 116; reflection means 140, light detection means 124; press means 128, 130 pressing a probe tip against said reflection means; storage means 142; calculation means 144 figuring out the quantity of light of the reflected light for the acquisition of said opening with desired dimensions from the calibration information stored in said storage means; and press control means 126 controlling pressing of said probe tip against said reflection means so as to allow the quantity of light of said reflected light to become equal to the quantity figured out by said calculation means. The probe opening fabricating apparatus is capable of readily fabricating an opening of desired dimensions with a high reproducibility.
    • 提供了一种用于在近场光学显微镜的掩模尖端处产生具有期望尺寸的开口的开口制造装置和使用其的近场光学显微镜。 该装置包括:光源116; 反射装置140,光检测装置124; 按压装置128,130将探针尖端压靠在所述反射装置上; 存储装置142; 计算装置144根据存储在所述存储装置中的校准信息计算用于从所述开口获取所需开口的反射光的光量; 以及按压控制装置126,控制所述探头尖靠在所述反射装置上,以便使所述反射光的光量等于由所述计算装置计算出的量。 探头开口制造装置能够以高再现性容易地制造所需尺寸的开口。
    • 9. 发明授权
    • Near-field microscope
    • 近场显微镜
    • US06710331B2
    • 2004-03-23
    • US09986012
    • 2001-11-07
    • Yoshihito NaritaShigeyuki Kimura
    • Yoshihito NaritaShigeyuki Kimura
    • H01J314
    • G01Q60/22G01Q10/06G01Q30/06Y10S977/862
    • A near-field microscope comprising: a probe for scattering a near-field light; light emitting device including a light source for emitting light to a sample or said probe; and light sampling device for sampling and detecting a light that includes information of the sample scattered by said probe, said microscope comprising: control device for spacing said sample or probe from a field of a near-field light generated by said light emission or disposing the sample or probe at a position that is shallow in a field of near-field light, thereby detecting a noise by said light sampling device; inserting said sample or probe deeply into a field of near-field light generated by said light emission, thereby detecting light intensity by said light sampling device; and computing device for computing a measurement result obtained by subtracting a noise from said light intensity.
    • 一种近场显微镜,包括:用于散射近场光的探针; 发光器件包括用于向样品或所述探针发射光的光源; 以及用于采样和检测包括由所述探针散射的样品的信息的光的光取样装置,所述显微镜包括:用于将所述样品或探针与由所述发光产生的近场光的场隔开的控制装置, 在近场光场中的浅的位置处的样品或探针,从而通过所述光采样装置检测噪声; 将所述样品或探针深深地插入由所述发光产生的近场光的场中,从而由所述光采样装置检测光强度; 以及用于计算通过从所述光强减去噪声而获得的测量结果的计算装置。