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    • 3. 发明授权
    • Method for continuously generating highly concentrated ozone gas
    • 连续生成高浓度臭氧气体的方法
    • US06344130B1
    • 2002-02-05
    • US09443346
    • 1999-11-19
    • Kunihiko KoikeGoichi InoueTatsuo Fukuda
    • Kunihiko KoikeGoichi InoueTatsuo Fukuda
    • C25C100
    • C01B13/10B01D53/0462B01D53/0476B01D53/053B01D2253/106B01D2256/14B01D2257/106B01D2259/40062B01D2259/40088B01D2259/403
    • A method for generating highly concentrated ozone gas by adsorbing ozone gas generated by an ozonizer with an absorbent within an adsorption column and then separating highly concentrated ozone gas from the adsorption column. Three adsorption columns are arranged in parallel. Each of the adsorption columns is controlled to repeat four steps of an ozone gas adsorbing step, a stabilizing and pressurizing step, an ozone gas desorbing step and a cooling down step. Each of the ozone gas adsorbing step and the ozone gas desorbing step has operation time set twice the operation time of each of the stabilizing and pressurizing step and the cooling down step. An ozone gas concentrating unit comprises three adsorption columns which are set to operate one after another by ⅓ cycle lag. Highly concentrated ozone gas separated at the desorbing step of each adsorption column is once stored in an ozone gas storage vessel.
    • 一种利用吸附塔吸附臭氧发生器产生的臭氧气体吸附高浓度臭氧气体的方法,然后从吸附塔中分离出高浓度的臭氧气体。 三个吸附柱平行布置。 控制每个吸附塔重复臭氧气体吸附步骤,稳定和加压步骤,臭氧气体解吸步骤和冷却步骤的四个步骤。 每个臭氧气体吸附步骤和臭氧气体解吸步骤的操作时间设定为稳定和加压步骤和冷却步骤中的每一个的操作时间的两倍。 臭氧气体浓缩单元包括三个吸附塔,这些吸附塔被设置成一个接一个地循环运行1个循环滞后。 在每个吸附塔的解吸步骤分离的高浓度臭氧气体一次储存在臭氧气体储存容器中。
    • 5. 发明授权
    • Equipment diagnosis system
    • 设备诊断系统
    • US5533413A
    • 1996-07-09
    • US456968
    • 1995-06-01
    • Yasunori KobayashiShin TanabeTatsuo FukudaMasazumi MiyazawaHideki ImaiMoriyuki Wani
    • Yasunori KobayashiShin TanabeTatsuo FukudaMasazumi MiyazawaHideki ImaiMoriyuki Wani
    • G05B23/02G07C3/00G01N19/00
    • G07C3/00G05B23/0283
    • An equipment diagnosis system for diagnosing the functional state, the deterioration state, the remaining life time state, etc, of various equipment, and comprising an equipment state model portion for modelling the state of a diagnosis target equipment and for outputting information of the functional state, deterioration, remaining life time, etc, of the diagnosis target equipment on the basis of input information; stress information supply means for supplying the equipment stage model portion with appropriate information on stress which is applied to the diagnosis target equipment; comparison means for comparing information outputted from the equipment state model portion with information which is obtained on the basis of an actual maintenance result; and model correction means for correcting a parameter of the equipment state model portion on the basis of the comparison result.
    • 一种用于诊断各种设备的功能状态,劣化状态,剩余寿命状态等的设备诊断系统,并且包括用于对诊断对象设备的状态建模并用于输出功能状态的信息的设备状态模型部分 ,恶化,剩余寿命等,基于输入信息; 应力信息提供装置,用于向设备级模型部分提供适用于诊断对象设备的应力信息; 比较装置,用于将从设备状态模型部分输出的信息与根据实际维护结果获得的信息进行比较; 以及模型校正装置,用于基于比较结果来校正设备状态模型部分的参数。
    • 7. 发明授权
    • Method for decomposing a cleaning gas for cleaning a film deposition chamber
    • 分解用于清洗成膜室的清洁气体的方法
    • US06544488B1
    • 2003-04-08
    • US09505141
    • 2000-02-15
    • Tatsuo Fukuda
    • Tatsuo Fukuda
    • B01D5346
    • B01D53/54B01D53/68B01D2257/204B01D2257/40B01D2258/0216Y10S423/10
    • A predetermined gas, which differs from a cleaning gas and is not required to be decomposed for evacuation, is introduced into a film deposition chamber provided upstream of a main process, wherein a cleaning gas for cleaning the film deposition chamber is introduced into the film deposition chamber, and plasma is developed to decompose the cleaning gas, thereby cleaning up the film deposition chamber. Plasma is developed before introduction of the cleaning gas. Alternatively, subsequent to the main process, a predetermined gas, which differs from the cleaning gas and is not required to be decomposed for evacuation, is introduced into the film deposition chamber, and plasma development is continued from the main process. A cleaning gas may be evacuated after substantially totally decomposed.
    • 将不同于清洁气体并且不需要分解用于抽真空的预定气体引入到设置在主工艺上游的成膜室中,其中用于清洁成膜室的清洁气体被引入成膜沉积 开发等离子体以分解清洁气体,从而清洁成膜室。 在引入清洁气体之前开发等离子体。 或者,在主工序之后,将不同于清洁气体并且不需要分解用于抽真空的预定气体引入成膜室,并且从主工艺继续等离子体显影。 清洁气体可以在基本完全分解之后被排空。