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    • 1. 发明授权
    • Manufacturing method of CPP type magnetic sensor having current-squeezing path
    • 具有电流挤压路径的CPP型磁传感器的制造方法
    • US06929959B2
    • 2005-08-16
    • US10828120
    • 2004-04-20
    • Yoshihiro NishiyamaMasamichi SaitoDaigo Aoki
    • Yoshihiro NishiyamaMasamichi SaitoDaigo Aoki
    • G11B5/39H01L43/08H01L43/12H01L21/00
    • G11B5/3912G11B5/3932Y10S438/945Y10S438/95
    • On a multilayer film formed on a lower electrode layer, a resist layer having cutaway parts at a lower portion is formed, and on parts of the upper surface of the multilayer film which are not overlapped with the resist layer except for areas inside the cutaway parts, first gap layers are formed. Accordingly, a predetermined gap T1 can be formed between the first gap layers in the track width direction. Next, in the following step, two end surfaces of the multilayer film and the first gap layers in the track width direction are milled. Hence, according to the present invention, compared to the case in the past, the predetermined gap T1 provided between the first gap layers can be formed into a minute size with superior accuracy, the current path-squeezing structure can be easily formed, and a magnetic sensor having superior change in resistance (ΔR) and reproduction output can be manufactured.
    • 在形成在下电极层上的多层膜上,形成在下部具有切口部的抗蚀剂层,并且在多层膜的与上述抗蚀剂层重叠的上表面的除上述切除部之外的区域的部分 形成第一间隙层。 因此,可以在轨道宽度方向上的第一间隙层之间形成预定间隙T1。 接下来,在后续步骤中,研磨多层膜的两个端面和轨道宽度方向上的第一间隙层。 因此,根据本发明,与过去的情况相比,设置在第一间隙层之间的预定间隙T 1可以以高精度形成为微小尺寸,可以容易地形成电流路径挤压结构,以及 可以制造具有优异的电阻变化(DeltaR)和再现输出的磁传感器。