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    • 8. 发明授权
    • Semiconductor device and its manufacturing method
    • 半导体器件及其制造方法
    • US08629529B2
    • 2014-01-14
    • US12519706
    • 2007-12-25
    • Naoya InoueIppei KumeJun KawaharaYoshihiro Hayashi
    • Naoya InoueIppei KumeJun KawaharaYoshihiro Hayashi
    • H01L27/06
    • H01L23/5228H01L23/5223H01L23/53238H01L27/0688H01L2924/0002H01L2924/3011H01L2924/00
    • A semiconductor device is produced by fabricating a capacitor element including a lower electrode, a capacitor insulating film, and an upper electrode, and a thin-film resistor element, in the same step. As the lower electrode of the capacitor element is lined with a lower layer wiring layer (Cu wiring), the lower electrode has extremely low resistance substantially. As such, even if the film thickness of the lower electrode becomes thinner, parasitic resistance does not increased. The resistor element is formed to have the same film thickness as that of the lower electrode of the capacitor element. Since the film thickness of the lower electrode is thin, it works as a resistor having high resistance. In the top layer of the passive element, a passive element cap insulating film is provided, which works as an etching stop layer when etching a contact of the upper electrode of the capacitor element.
    • 通过在同一步骤中制造包括下电极,电容器绝缘膜和上电极的电容器元件和薄膜电阻器元件来制造半导体器件。 由于电容器元件的下电极衬有下层布线层(Cu布线),所以下电极具有极低的电阻。 因此,即使下电极的膜厚变薄,寄生电阻也不会增加。 电阻元件形成为具有与电容器元件的下电极相同的膜厚度。 由于下部电极的膜厚薄,所以作为具有高电阻的电阻器。 在无源元件的顶层中,设置无源元件帽绝缘膜,当蚀刻电容器元件的上电极的接触时,其被用作蚀刻停止层。