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1. 发明授权

US07306744B2 Method of manufacturing a nozzle plate 失效
标题翻译：制造喷嘴板的方法
公开(公告)号：US07306744B2
公开(公告)日：2007-12-11
申请号：US11116045
申请日：2005-04-27
申请人： Yoshihide Matsuo , Katsuji Arakawa
发明人： Yoshihide Matsuo , Katsuji Arakawa
IPC分类号： G01D15/00
CPC分类号： B41J2/1632 , B41J2/162 , B41J2/1623 , B41J2/1628 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1645 , B41J2/1646
摘要： A method of manufacturing a nozzle plate 2 is disclosed. The nozzle plate 2 has a plurality of nozzle openings 22 through each of which a droplet is adapted to be ejected. The method includes the steps of: preparing a processing substrate (silicon substrate 10) constituted from silicon as a main material, the processing substrate having two major surfaces; providing a supporting substrate 50 for supporting the processing substrate onto one major surface of the processing substrate 50; and forming the plurality of nozzle openings 22 on the other major surface of the processing substrate by subjecting the other major surface of the processing substrate to an etching process while the processing substrate is supported by the supporting substrate 50.
摘要翻译：公开了一种制造喷嘴板2的方法。喷嘴板2具有多个喷嘴开口22，每个喷嘴开口各自喷射液滴。该方法包括以下步骤：制备由硅作为主要材料构成的处理衬底（硅衬底10），处理衬底具有两个主表面; 提供用于将处理基板支撑在处理基板50的一个主表面上的支撑基板50; 并且在处理基板被支撑基板50支撑的同时，通过对处理基板的另一个主表面进行蚀刻处理，在处理基板的另一主表面上形成多个喷嘴开口22。

2. 发明申请

US20050269289A1 Method of manufacturing a nozzle plate 失效
标题翻译：制造喷嘴板的方法
公开(公告)号：US20050269289A1
公开(公告)日：2005-12-08
申请号：US11116045
申请日：2005-04-27
申请人： Yoshihide Matsuo , Katsuji Arakawa
发明人： Yoshihide Matsuo , Katsuji Arakawa
IPC分类号： B41J2/135 , B41J2/16 , G11B5/127
CPC分类号： B41J2/1632 , B41J2/162 , B41J2/1623 , B41J2/1628 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1645 , B41J2/1646
摘要： A method of manufacturing a nozzle plate 2 is disclosed. The nozzle plate 2 has a plurality of nozzle openings 22 through each of which a droplet is adapted to be ejected. The method includes the steps of: preparing a processing substrate (silicon substrate 10) constituted from silicon as a main material, the processing substrate having two major surfaces; providing a supporting substrate 50 for supporting the processing substrate onto one major surface of the processing substrate 50; and forming the plurality of nozzle openings 22 on the other major surface of the processing substrate by subjecting the other major surface of the processing substrate to an etching process while the processing substrate is supported by the supporting substrate 50.
摘要翻译：公开了一种制造喷嘴板2的方法。喷嘴板2具有多个喷嘴开口22，每个喷嘴开口各自喷射液滴。该方法包括以下步骤：制备由硅作为主要材料构成的处理衬底（硅衬底10），处理衬底具有两个主表面; 提供用于将处理基板支撑在处理基板50的一个主表面上的支撑基板50; 并且在处理基板被支撑基板50支撑的同时，通过对处理基板的另一个主表面进行蚀刻处理，在处理基板的另一主表面上形成多个喷嘴开口22。

3. 发明授权

US08746846B2 Nozzle plate, discharge head, method for producing the nozzle plate, method for producing the discharge head, and discharge device 有权
标题翻译：喷嘴板，排出头，喷嘴板的制造方法，排出头的制造方法以及排出装置
公开(公告)号：US08746846B2
公开(公告)日：2014-06-10
申请号：US12963119
申请日：2010-12-08
申请人： Katsuji Arakawa
发明人： Katsuji Arakawa
IPC分类号： B41J2/135 , B32B38/10 , B32B38/00
CPC分类号： B41J2/14314 , B41J2/16 , B41J2/1606 , B41J2/162 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1642 , B41J2/1646
摘要： A nozzle plate includes: a nozzle plate main body made of metal, the nozzle plate main body having nozzle rows formed of nozzles arranged in parallel and penetrating the nozzle plate main body in a thickness direction, wherein at the outer edge of the nozzles on a droplet discharge surface of the nozzle plate main body, a water-repellent film is provided, and primer treatment is performed on at least part of the periphery of the droplet discharge surface of the nozzle plate main body, the periphery outside the water-repellent film.
摘要翻译：喷嘴板包括：由金属制成的喷嘴板主体，喷嘴板主体具有由平行布置并沿着厚度方向贯穿喷嘴板主体的喷嘴形成的喷嘴列，其中在喷嘴板主体的外边缘处喷嘴板主体的液滴喷出面，设有防水膜，并且在喷嘴板主体的液滴喷出面的周围的至少一部分，防水膜外侧进行底漆处理。

4. 发明授权

US07536785B2 Method for manufacturing a droplet ejection head 有权
标题翻译：液滴喷射头的制造方法
公开(公告)号：US07536785B2
公开(公告)日：2009-05-26
申请号：US11295758
申请日：2005-12-07
申请人： Katsuji Arakawa , Yasutaka Matsumoto
发明人： Katsuji Arakawa , Yasutaka Matsumoto
IPC分类号： B21D53/00
CPC分类号： B41J2/1634 , B41J2/16 , B41J2/1623 , B41J2/1628 , B41J2/1642 , B41J2/1645 , B41J2/1646 , B41J2002/043 , Y10T29/42 , Y10T29/49401 , Y10T156/1056
摘要： A method for manufacturing a droplet ejection head includes a step of forming recessed sections for forming nozzles by etching half way through a first face of a silicon substrate, a step of bonding a first support substrate to the first face of the silicon substrate, a step of reducing the thickness of the silicon substrate by processing a second face of the silicon substrate that is opposite to the first face thereof, and making the recessed sections through holes, and a step of removing the first support substrate from the silicon substrate after the reduction of the thickness of the silicon substrate.
摘要翻译：一种液滴喷射头的制造方法，其特征在于，包括以下步骤：通过在硅基板的第一面上半蚀刻，形成喷嘴的凹部，将第一支撑基板接合到硅基板的第一面的工序; 通过处理与其第一面相反的硅衬底的第二面，并且使凹部穿过孔来减小硅衬底的厚度，以及在还原之后从硅衬底去除第一支撑衬底的步骤的硅衬底的厚度。

5. 发明授权

US07147795B2 Method for surface treatment 失效
标题翻译：表面处理方法
公开(公告)号：US07147795B2
公开(公告)日：2006-12-12
申请号：US10953879
申请日：2004-09-29
申请人： Hiroshi Koeda , Katsuji Arakawa , Kazufumi Oya
发明人： Hiroshi Koeda , Katsuji Arakawa , Kazufumi Oya
IPC分类号： B44C1/22
CPC分类号： H01L21/6838 , Y10T29/49822 , Y10T29/53274 , Y10T29/53683
摘要： A method for surface treatment includes: a first step in which a surface treatment apparatus 1 and a substrate 10 in a state where a front surface 102 of the substrate 10 faces the surface treatment apparatus 1 are conveyed to the inside of a decompression chamber to decompress a plurality of concave portions 32 (enclosed spaces); a second step in which the surface treatment apparatus 1 and the substrate 10 are brought out from the inside of the decompression chamber to environment under atmospheric pressure in a state where the substrate 10 is being attracted to the surface treatment apparatus 1 with the use of a difference between negative pressure inside the concave portions 32 and atmospheric pressure; and a third step in which the surface treatment is carried out to a back surface 101 of the substrate 10 with the substrate 10 being attracted by the surface treatment apparatus 1.
摘要翻译：表面处理方法包括：第一步骤，其中表面处理装置1和基板10处于基板10的前表面102面向表面处理装置1的状态，被输送到减压室的内部以减压多个凹部32（封闭空间）; 在基板10被吸引到表面处理装置1的状态下，使用表面处理装置1和基板10从压缩室的内部脱离到大气压环境的第二步骤凹部32内的负压与大气压的差; 以及第三步骤，其中基板10被表面处理装置1吸引而进行到基板10的背面101的表面处理。

6. 发明申请

US20060232655A1 Electrostatic actuator, liquid-jet head, liquid-jet apparatus, device including electrostatic actuator, method for manufacturing liquid-jet head 审中-公开
标题翻译：静电致动器，液体喷射头，液体喷射装置，包括静电致动器的装置，液体喷射头的制造方法
公开(公告)号：US20060232655A1
公开(公告)日：2006-10-19
申请号：US11404026
申请日：2006-04-13
申请人： Masahiro Fujii , Katsuji Arakawa
发明人： Masahiro Fujii , Katsuji Arakawa
IPC分类号： B41J2/39
CPC分类号： B41J2/16 , B41J2/14314 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1642 , B41J2/1646
摘要： An electrostatic actuator includes a silicon diaphragm, an opposing electrode opposing the diaphragm with intervention of a gap therebetween, and an insulating layer formed on a surface of the diaphragm, opposing the opposing electrode. A voltage is applied between the diaphragm and the opposing electrode. The insulating layer has a laminated structure including a dielectric layer formed of a material having a higher relative dielectric constant than silicon oxide, on the diaphragm, and a surface layer exhibiting higher reduction in surface charge density than that of the dielectric layer, formed on the dielectric layer.
摘要翻译：静电致动器包括硅隔膜，与隔膜相对的对置电极和介于其间的介质，以及形成在隔膜表面上的与相对电极相对的绝缘层。在隔膜和相对电极之间施加电压。绝缘层具有层叠结构，该层压结构包括由隔膜上具有比氧化硅更高的相对介电常数的材料形成的电介质层，以及形成在电介质层上的表面电荷密度降低的表面电荷密度的表面层电介质层。

7. 发明授权

US06424048B1 Semiconductor chip, semiconductor device, circuit board and electronic equipment and production methods for them 有权
标题翻译：半导体芯片，半导体器件，电路板及电子设备及其生产方法
公开(公告)号：US06424048B1
公开(公告)日：2002-07-23
申请号：US09601411
申请日：2000-08-14
申请人： Kazushige Umetsu , Jun Amako , Shinichi Yotsuya , Katsuji Arakawa
发明人： Kazushige Umetsu , Jun Amako , Shinichi Yotsuya , Katsuji Arakawa
IPC分类号： H01L2940
CPC分类号： B23K26/06 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0665 , H01L21/486 , H01L21/76898 , H01L23/481 , H01L25/0657 , H01L25/50 , H01L2223/54453 , H01L2224/16 , H01L2225/06513 , H01L2225/06541 , H01L2924/00014 , H01L2224/0401
摘要： A semiconductor chip having a vertical current conduction structure of a high aspect ratio and high reliability: a semiconductor device, a circuit substrate, and an electronic apparatus each containing such semiconductor chips; and a method for producing them. A prehole (3) is formed in a silicon substrate (10) surface-oriented to a (100) face by laser beam irradiation. The prehole (3) is enlarged by anisotropic etching to thereby form a through-hole (4). An electrically insulating film is formed on an inner wall of the through-hole (4). An electrically conducting material is provided inside the insulating film to thereby form a metal bump (30).
摘要翻译：具有高纵横比和高可靠性的垂直导电结构的半导体芯片：包含这种半导体芯片的半导体器件，电路基板和电子设备; 及其制造方法。在通过激光束照射对（100）面进行表面取向的硅衬底（10）中形成预孔（3）。通过各向异性蚀刻使预孔（3）扩大，从而形成通孔（4）。在通孔（4）的内壁上形成电绝缘膜。导电材料设置在绝缘膜的内部，从而形成金属凸块（30）。

8. 发明授权

US06375310B1 Ink jet head, manufacturing method therefor, and ink jet recording apparatus 有权
标题翻译：喷墨头，其制造方法和喷墨记录装置
公开(公告)号：US06375310B1
公开(公告)日：2002-04-23
申请号：US09180650
申请日：1998-11-12
申请人： Katsuji Arakawa , Hiroshi Koeda
发明人： Katsuji Arakawa , Hiroshi Koeda
IPC分类号： B41J204
CPC分类号： B41J2/1623 , B41J2/14233 , B41J2/14314 , B41J2/161 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1646 , B41J2002/14362 , B41J2002/14379 , B41J2202/19
摘要： An ink jet head in which a multi-nozzle structure is attained, and highly accurate alignment of ink jet head chips is realized, a method for manufacturing the ink jet head, and a recording apparatus on which the ink jet head is mounted. Guide protrusions (141) for alignment of ink jet head chips (41) are formed in an ink jet head chip bonded surface (134) of a nozzle plate (133), the ink jet head chips (41) are aligned by inserting the guide protrusions (141) of the nozzle plate (133) into guide grooves (51) of nozzle surfaces (42) of the ink jet head chips (41), and the nozzle plate (133) and the respective ink jet head chips (41) are bonded with each other by a bonding agent.
摘要翻译：实现多喷嘴结构的喷墨头，实现喷墨头芯片的高精度对准，喷墨头的制造方法和安装有喷墨头的记录装置。在喷嘴板（133）的喷墨头芯片接合表面（134）中形成用于喷墨头芯片（41）对准的导向突起（141），喷墨头芯片（41）通过插入导向件喷嘴板（133）的突出部（141）进入喷墨头芯片（41）的喷嘴表面（42）的引导槽（51）和喷嘴板（133）和各个喷墨头芯片（41）通过粘合剂彼此粘合。

9. 发明授权

US07637601B2 Droplet discharging head, droplet discharging apparatus, method for manufacturing droplet discharging head and method for manufacturing droplet discharging apparatus 失效
标题翻译：液滴喷射头，液滴喷射装置，液滴喷射头的制造方法和液滴喷射装置的制造方法
公开(公告)号：US07637601B2
公开(公告)日：2009-12-29
申请号：US11778276
申请日：2007-07-16
申请人： Kazufumi Oya , Katsuji Arakawa
发明人： Kazufumi Oya , Katsuji Arakawa
IPC分类号： B41J2/045
CPC分类号： B41J2/1631 , B41J2/161 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1642
摘要： A droplet discharging head includes: a nozzle substrate that has a plurality of nozzle holes; a cavity substrate that communicates with the nozzle holes and which has a plurality of independent discharge chambers, the discharge chambers generating pressure therein so as to discharge droplets through the nozzle holes; a reservoir substrate that has a reservoir concave section and is provided between the nozzle substrate and the cavity substrate, the reservoir concave section functioning a reservoir, the reservoir being shared for communicating with the discharge chambers; a resin thin film formed on an entire inner surface of the reservoir concave section by film deposition, the resin thin film not being formed in the reservoir substrate on a side of an adhesion interface with the nozzle substrate or the cavity substrate; and a bottom surface of the reservoir concave section functioning a diaphragm section, the diaphragm section including the resin thin film and buffering pressure fluctuation.
摘要翻译：液滴喷射头包括：具有多个喷嘴孔的喷嘴基板; 与喷嘴孔连通并且具有多个独立的排出室的空腔基板，所述排出室在其中产生压力，以便通过喷嘴孔排出液滴; 具有储存器凹部并设置在所述喷嘴基板和所述空腔基板之间的储存器基板，所述储存器凹部用于储存器，所述储存器被共享用于与所述排出室连通; 通过膜沉积在储存器凹部的整个内表面上形成的树脂薄膜，树脂薄膜不在与喷嘴基板或空腔基板的粘合界面的一侧上形成在储存器基板中; 并且所述储存器凹部的底面起隔膜部分的作用，所述隔膜部分包括所述树脂薄膜并缓冲压力波动。

10. 发明申请

US20080309718A1 NOZZLE PLATE, DROPLET DISCHARGE HEAD, METHOD FOR MANUFACTURING THE SAME AND DROPLET DISCHARGE DEVICE 有权
标题翻译：喷嘴板，喷射头卸料头，其制造方法和喷射装置
公开(公告)号：US20080309718A1
公开(公告)日：2008-12-18
申请号：US12120403
申请日：2008-05-14
申请人： Kazufumi Oya , Katsuji Arakawa
发明人： Kazufumi Oya , Katsuji Arakawa
IPC分类号： B41J2/14
CPC分类号： B41J2/1433 , B41J2/162 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632
摘要： A nozzle plate includes a silicon substrate, and a nozzle hole formed in the silicon substrate for discharging a liquid droplet provided with: a first nozzle portion formed perpendicularly to a surface of the silicon substrate; a second nozzle portion formed on a same axis as an axis of the first nozzle portion and having a cross-sectional area that is larger than a cross-sectional area of the first nozzle portion; and an inclined portion having a cross-sectional area gradually increasing from the first nozzle portion to the second nozzle portion.
摘要翻译：喷嘴板包括硅基板和形成在硅基板中的用于排出液滴的喷嘴孔，该液滴设置有垂直于硅基板的表面形成的第一喷嘴部分; 第二喷嘴部分，形成在与第一喷嘴部分的轴线相同的轴线上，并且具有比第一喷嘴部分的横截面面积大的横截面积; 以及具有从第一喷嘴部分到第二喷嘴部分的横截面积逐渐增加的倾斜部分。

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