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1. 发明授权

US4593986A Apparatus for developing or peeling alkali-type photosensitive film 失效
标题翻译：用于显影或剥离碱性感光膜的装置
公开(公告)号：US4593986A
公开(公告)日：1986-06-10
申请号：US707499
申请日：1985-03-04
申请人： Yoshiaki Tomisawa , Seiji Kinoda , Eiji Fujita , Masanori Murata , Toshio Takeuchi , Ken Ogawa
发明人： Yoshiaki Tomisawa , Seiji Kinoda , Eiji Fujita , Masanori Murata , Toshio Takeuchi , Ken Ogawa
IPC分类号： G03F7/00 , G03F7/30 , G03D5/04
CPC分类号： G03F7/3092
摘要： A developing or peeling solution for developing or imagewisely peeling an alkali-type photosensitive film containing a suspension of released photosensitive film is regenerated by introducing one or more reagents and a gas for depositing the suspension in floating state and removing the floated deposit by a skimmer from the developing or peeling solution. The regenerated developing or peeling solution can be used again and again for the development or peeling.
摘要翻译：通过引入一种或多种试剂和用于在浮置状态下沉积悬浮液的气体并通过撇渣器除去漂浮的沉积物来再生用于显影或剥离含有释放的感光膜的悬浮液的碱性感光膜的显影或剥离溶液显影或剥离溶液。再生的显影或剥离溶液可以一次又一次地用于显影或剥离。

2. 发明授权

US4517282A Process for developing or peeling alkali-type photosensitive film and apparatus used therein 失效
标题翻译：用于显影或剥离碱式感光膜的方法及其中使用的装置
公开(公告)号：US4517282A
公开(公告)日：1985-05-14
申请号：US434041
申请日：1982-10-12
申请人： Yoshiaki Tomisawa , Seiji Kinoda , Eiji Fujita , Masanori Murata , Toshio Takeuchi , Ken Ogawa
发明人： Yoshiaki Tomisawa , Seiji Kinoda , Eiji Fujita , Masanori Murata , Toshio Takeuchi , Ken Ogawa
IPC分类号： G03F7/00 , G03F7/30 , G03C3/00 , G03C5/30
CPC分类号： G03F7/3092
摘要： A developing or peeling solution for developing or imagewisely peeling an alkali-type photosensitive film containing a suspension of released photosensitive film is regenerated by introducing one or more reagents and a gas for depositing the suspension in floating state and removing the floated deposit by a skimmer from the developing or peeling solution. The regenerated developing or peeling solution can be used again and again for the development or peeling.
摘要翻译：通过引入一种或多种试剂和用于在浮置状态下沉积悬浮液的气体并通过撇渣器除去漂浮的沉积物来再生用于显影或剥离含有释放的感光膜的悬浮液的碱性感光膜的显影或剥离溶液显影或剥离溶液。再生的显影或剥离溶液可以一次又一次地用于显影或剥离。

3. 发明授权

US4559295A Process for regenerating solution for developing or peeling alkali-type photosensitive film 失效
标题翻译：用于显影或剥离碱性感光膜的再生溶液的方法
公开(公告)号：US4559295A
公开(公告)日：1985-12-17
申请号：US697769
申请日：1985-02-04
申请人： Yoshiaki Tomisawa , Toshio Takeuchi , Keijiro Honda , Susumu Takahashi , Seiji Kinoda
发明人： Yoshiaki Tomisawa , Toshio Takeuchi , Keijiro Honda , Susumu Takahashi , Seiji Kinoda
IPC分类号： G03F7/30 , G03C5/24 , G03C11/24 , G03F7/26
CPC分类号： G03F7/3092
摘要： A developing or peeling solution for developing or imagewisely peeling an alkali-type photosensitive film containing a suspension of released photosensitive film is regenerated by introducing one or more reagents and a gas for depositing the suspension in floating state and removing the floated deposit by a skimmer from the developing or peeling solution, while a part or whole of the resulting treated solution is taken out of the system.
摘要翻译：通过引入一种或多种试剂和用于在浮置状态下沉积悬浮液的气体并通过撇渣器除去漂浮的沉积物来再生用于显影或剥离含有释放的感光膜的悬浮液的碱性感光膜的显影或剥离溶液显影或剥离溶液，而将所得处理溶液的一部分或全部从系统中取出。

4. 发明授权

US4519690A Process for developing or peeling alkali-type photosensitive film and apparatus used therein 失效
标题翻译：用于显影或剥离碱式感光膜的方法及其中使用的装置
公开(公告)号：US4519690A
公开(公告)日：1985-05-28
申请号：US510911
申请日：1983-07-05
申请人： Yoshiaki Tomisawa , Toshio Takeuchi , Keijiro Honda , Susumu Takahashi , Seiji Kinoda
发明人： Yoshiaki Tomisawa , Toshio Takeuchi , Keijiro Honda , Susumu Takahashi , Seiji Kinoda
IPC分类号： G03F7/30 , G03D5/04
CPC分类号： G03F7/3092
摘要： A developing or peeling solution for developing or imagewisely peeling an alkali-type photosensitive film containing a suspension of released photosensitive film is regenerated by introducing one or more reagents and a gas for depositing the suspension in floating state and removing the floated deposit by a skimmer from the developing or peeling solution, while a part or whole of the resulting treated solution is taken out of the system.
摘要翻译：通过引入一种或多种试剂和用于在浮置状态下沉积悬浮液的气体并通过撇渣器除去漂浮的沉积物来再生用于显影或剥离含有释放的感光膜的悬浮液的碱性感光膜的显影或剥离溶液显影或剥离溶液，而将所得处理溶液的一部分或全部从系统中取出。

5. 发明授权

US4398728A Pressure seal structure and pressure sealed transfer mechanism 失效
标题翻译：压力密封结构和压力密封转移机构
公开(公告)号：US4398728A
公开(公告)日：1983-08-16
申请号：US270101
申请日：1981-06-03
申请人： Hiromu Sukegawa , Yoshiaki Tomisawa
发明人： Hiromu Sukegawa , Yoshiaki Tomisawa
IPC分类号： B32B15/04 , B29C63/02 , B29L9/00 , B32B15/08 , B32B15/09 , F16J15/16 , H05K3/02 , H05K3/38 , F16J15/32 , F16J15/46
CPC分类号： F16J15/168 , H05K3/022 , Y10S277/906
摘要： A seal structure for pressure sealing between a fixed member and a movable member. The seal structure is made of a flexible seal member formed with two opposite edges, one edge being fixed to the fixed member, while the other edge lies against and contacts the movable member. A free part of the flexible seal member between the two edges thereof is generally bent around, as seen from the free part of the flexible seal member closest to its fixed edge looking towards its free part closest to its contact edge. A first space is defined on the generally concave side of the flexible seal member, and a second space is defined on the generally convex side of the flexible seal member. A higher fluid pressure present in the first space presses the contact edge of the flexible seal member firmly against the movable member. A pressure sealed transfer mechanism including two rollers in contact with one another, and two such seal structures, for transferring a sheet between a higher pressure space and a lower pressure space, is also described.
摘要翻译：一种用于在固定构件和可动构件之间进行压力密封的密封结构。密封结构由形成有两个相对边缘的柔性密封构件制成，一个边缘固定到固定构件，而另一个边缘抵靠并接触可动构件。柔性密封构件在其两个边缘之间的自由部分通常是弯曲的，从最靠近其固定边缘的柔性密封构件的自由部分看，朝向其最接近其接触边缘的自由部分。第一空间限定在柔性密封构件的大致凹侧上，第二空间限定在柔性密封构件的大致凸形侧上。存在于第一空间中的较高流体压力将柔性密封构件的接触边缘牢固地压靠在可动构件上。还描述了一种压力密封的传送机构，其包括彼此接触的两个辊和用于在较高压力空间和较低压力空间之间传送片材的两个这样的密封结构。

6. 发明授权

US4986869A Method employing input and output staging chamber devices for reduced pressure lamination 失效
标题翻译：采用输入和输出分级室装置进行减压层压的方法
公开(公告)号：US4986869A
公开(公告)日：1991-01-22
申请号：US307937
申请日：1989-02-09
申请人： Yoshiaki Tomisawa , Tadaji Satou , Nobuyuki Hayashi , Yusuke Miyamae
发明人： Yoshiaki Tomisawa , Tadaji Satou , Nobuyuki Hayashi , Yusuke Miyamae
IPC分类号： H05K3/38 , B29C63/02 , B29L9/00 , B32B37/22 , G03F1/00 , G03F7/16 , H05K3/06 , H05K3/28
CPC分类号： B32B37/226 , B32B38/185 , H05K3/281 , B29C2791/006 , B29L2031/3425 , B32B2309/68 , H05K2203/068 , H05K2203/085 , Y10T156/1052 , Y10T156/1343
摘要： In this method for reduced pressure lamination of a light sensitive material in film form to a printed circuit base board, when adhering the light sensitive material in film form comprising a flexible support either continuous or cut to the dimensions of the base board and a light sensitive layer to the printed circuit base board under reduced pressure, a main container for carrying out the adhesion and an intake container and an exit container connected thereto are provided, the base board is supplied to the intake container set to atmospheric pressure, and thereafter the pressure in the intake container is reduced, next the base board is supplied into the main container at reduced pressure and the light sensitive material in film form is adhered to the base board, next the light sensitive material in film form is in the case that it is continuous to the dimensions of the base board, and after supplying the base board to which the light sensitive material in film form has been adhered to the exit container at reduced pressure, the exit container is set to atmospheric pressure and the base board to which the light sensitive material in film form has been ahdered is ejected from the exit container. A reduced pressure adhesion device is also described for performing the method.
摘要翻译：在这种将薄膜形式的感光材料减压层压到印刷电路基板的方法中，当将感光材料粘合到膜形式中时，包括连续或切割到基板的尺寸的柔性支撑件和光敏感在减压下向印刷电路基板施加层，设置用于进行粘合的主容器和与其连接的进气容器和出口容器，将基板供给到设定为大气压的进气容器，然后将压力在进气容器内减少，接下来基板在减压下被供给到主容器中，并且将膜形式的感光材料粘附到基板上，接下来，薄膜形式的感光材料是在在基板的尺寸连续，并且在供给已经粘附有膜形式的感光材料的基板之后在出口容器的减压下将出口容器设定为大气压，将从膜形成的感光材料成形的基板从出口容器中排出。还描述了用于执行该方法的减压粘合装置。

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