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1. 发明授权

US4939494A Surface-mounted-type inductance element 失效
标题翻译：表面安装式电感元件
公开(公告)号：US4939494A
公开(公告)日：1990-07-03
申请号：US342216
申请日：1989-04-24
申请人： Yoshiaki Masuda , Hiraku Imaizumi , Takashi Shioura , Tadashi Mitsui , Tokio Tadano
发明人： Yoshiaki Masuda , Hiraku Imaizumi , Takashi Shioura , Tadashi Mitsui , Tokio Tadano
IPC分类号： H01F27/02 , H01F27/29
CPC分类号： H01F27/022 , H01F27/292 , H01F2005/043 , H01F2005/046
摘要： A surface-mounted-type inductance element comprising a coil structure having a bobbin; the bobbin including a portion around which wires are coiled, a pair of flanges integrally formed at opposing ends of the bobbin, a pair of bases integrally formed at lower edge portions of the flanges in a manner to project laterally from the flanges, and a plurality of external terminals attached to each of the bases in a manner to penetrate the base, each the external terminal including a first portion projecting laterally from the base and a second portion projecting downward from the base, around which first portion of each the external terminal a termination of any one of the wires is wound; a mold covering the coil structure in a manner to allow the second portions of the external terminals to be projected outward from the mold, the mold being formed of resin material exhibiting heat resistance; and a pair of cores assembled to the coil structure through the mold.
摘要翻译：一种表面安装型电感元件，包括具有线轴的线圈结构; 所述线轴包括线圈绕线的部分，在所述线轴的相对端部一体形成的一对凸缘，以从所述凸缘侧向突出的方式一体形成在所述凸缘的下边缘部的一对基座，外部端子以穿过基座的方式附接到每个基座，每个外部端子包括从基部横向突出的第一部分和从基部向下突出的第二部分，每个外部端子的第一部分任何一根电线的端接被缠绕; 模具，其以允许外部端子的第二部分从模具向外突出的方式覆盖线圈结构，模具由具有耐热性的树脂材料形成; 以及通过模具组装到线圈结构的一对芯。

2. 发明授权

US4424504A Ferrite core 失效
标题翻译：铁氧体磁芯
公开(公告)号：US4424504A
公开(公告)日：1984-01-03
申请号：US388636
申请日：1982-06-15
申请人： Tadashi Mitsui , Hiraku Imaizumi
发明人： Tadashi Mitsui , Hiraku Imaizumi
IPC分类号： A45D20/12 , H01F27/255 , H01F27/26 , H01F27/24
CPC分类号： H01F27/266 , H01F27/255
摘要： The new structure of a ferrite core for the use of a power transformer and/or a choke coil has been found. The core is assembled by a pair of identical core halves, and each core half comprises (a) a circular center boss (6), (b) a pair of outer walls (7, 8) positioned at both the sides of said boss for mounting a coil, (c) a pair of base plates (9, 10) coupling said center boss and said outer walls, (d) each of the outer walls being substantially rectangular with an external linear wall and an inner curved wall, (e) the core half being symmetrical with regard to the first plane including a center axis of said boss and being parallel with the external linear walls of said outer walls, (f) a concaved opening (R) being provided between said base plates in the first side of the core half with regard to the reference plane which includes a center axis of said boss and is perpendicular to said first plane, (g) the length (B.sub.1) between said reference plane to the end of the first side which includes said concaved opening (R) being longer than the length (B.sub.2) between said reference plane to the end of the second side which does not have said opening (R), and (h) said length (B.sub.2) being the same as the radius (a.sub.1) of the center boss.
摘要翻译：已经发现用于使用电力变压器和/或扼流线圈的铁氧体磁心的新结构。芯部由一对相同的半部组装，每个芯部半部包括（a）圆形中心凸台（6），（b）位于所述凸台的两侧的一对外壁（7,8），用于安装线圈，（c）连接所述中心凸台和所述外壁的一对基板（9,10），（d）每个外壁具有大致矩形的外部线性壁和内部弯曲壁，（e ），所述芯半体关于所述第一平面对称，所述第一平面包括所述凸台的中心轴线并且与所述外壁的外部直线壁平行;（f）在所述第一平面相对于包括所述凸台的中心轴并且垂直于所述第一平面的参考平面的芯部半部的侧面，（g）所述参考平面与包括所述凹部的第一侧的端部之间的长度（B1）开口（R）比所述参考平面与端部之间的长度（B2）长不具有所述开口（R）的第二侧，和（h）所述长度（B2）与中心凸台的半径（a1）相同。

3. 发明授权

US08144338B2 Pattern measurement apparatus and pattern measurement method 有权
标题翻译：图案测量装置和图案测量方法
公开(公告)号：US08144338B2
公开(公告)日：2012-03-27
申请号：US12546587
申请日：2009-08-24
申请人： Tadashi Mitsui
发明人： Tadashi Mitsui
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01B2210/56
摘要： A pattern measurement method includes: acquiring sectional shapes of a first pattern corresponding to process parameters, respectively; using the acquired sectional shapes to calculate predicted spectral waveforms which would be obtained when light is applied to the first pattern, and adding information on the corresponding process parameters to the calculated predicted spectral waveforms, respectively, to form a waveform library; setting a process parameter to obtain a desired shape, and acquiring an actual spectral waveform of a second pattern actually created from the first pattern using the set process parameter; performing waveform matching between the actual spectral waveform and the predicted spectral waveforms to acquire matching scores for respective waveform matching, and calculating an optimum process parameter providing the maximum matching score; generating an optimum pattern sectional shape corresponding to the optimum process parameter to measure the optimum pattern sectional shape.
摘要翻译：模式测量方法包括：分别获取对应于过程参数的第一模式的截面形状; 使用所获取的截面形状来计算当将光施加到第一图案时将获得的预测光谱波形，以及将相应的处理参数的信息分别加到计算的预测光谱波形上以形成波形库; 设置处理参数以获得期望的形状，并且使用所设置的处理参数获取实际从第一图案创建的第二图案的实际光谱波形; 执行实际光谱波形与预测光谱波形之间的波形匹配，以获得相应波形匹配的匹配分数，以及计算提供最大匹配分数的最佳处理参数; 产生对应于最佳工艺参数的最佳图案截面形状，以测量最佳图案截面形状。

4. 发明授权

US08041105B2 Pattern evaluation method, computer-readable medium, and semiconductor device manufacturing method 有权
标题翻译：模式评估方法，计算机可读介质和半导体器件制造方法
公开(公告)号：US08041105B2
公开(公告)日：2011-10-18
申请号：US11896043
申请日：2007-08-29
申请人： Tadashi Mitsui
发明人： Tadashi Mitsui
IPC分类号： G06K9/00 , H03C3/00 , H03D3/00
CPC分类号： G06T7/001 , G03F1/84 , G03F1/86 , G06T7/13 , G06T7/181 , G06T2207/10056 , G06T2207/30148
摘要： A pattern evaluation method includes: acquiring a plurality of examination images obtained in regard to an evaluation target pattern, at least one of the plurality of examination images being different from the other examination images; detecting all edges of the evaluation target pattern in each of the examination images; executing alignment of the evaluation target pattern in the respective examination images with a sub-pixel accuracy based on the detected edges; superimposing the aligned pattern edges to generate a single combined edge; measuring the combined edge; and evaluating the evaluation target pattern based on a result of the measurement.
摘要翻译：图案评估方法包括：获取关于评估对象图案获得的多个检查图像，所述多个检查图像中的至少一个与其他检查图像不同; 检测每个检查图像中的评估对象图案的所有边缘; 基于检测到的边缘，以各个检测图像的子像素精度执行评价对象图案的对准; 叠加对齐的图案边缘以产生单个组合边缘; 测量组合边缘; 以及基于测量结果评估评估目标模式。

5. 发明授权

US08036445B2 Pattern matching method, program and semiconductor device manufacturing method 有权
标题翻译：模式匹配方法，程序和半导体器件制造方法
公开(公告)号：US08036445B2
公开(公告)日：2011-10-11
申请号：US11255024
申请日：2005-10-21
申请人： Atsushi Onishi , Tadashi Mitsui , Yuichiro Yamazaki
发明人： Atsushi Onishi , Tadashi Mitsui , Yuichiro Yamazaki
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06K9/6211 , G06T7/12 , G06T7/33 , G06T2207/10056 , G06T2207/30148
摘要： A pattern matching method includes: detecting an edge of a pattern in a pattern image obtained by imaging the pattern; segmenting the detected pattern edge to generate a first segment set consisting of first segments; segmenting a pattern edge on reference data which serves as a reference for evaluating the pattern to generate a second segment set consisting of second segments; combining any of the segments in the first segment set with any of the segments in the second segment set to define a segment pair consisting of first and second segments; calculating the compatibility coefficient between every two segment pairs in the defined segment pairs; defining new segment pairs by narrowing down the defined segment pairs by calculating local consistencies of the defined segment pairs on the basis of the calculated compatibility coefficients and by excluding segment pairs having lower local consistencies; determining an optimum segment pair by repeating the calculating the compatibility coefficient and the defining new segment pairs by narrowing down the segment pairs; calculating a feature quantity of a shift vector that links the first and second segments making up the optimum segment pair; and performing position matching between the pattern image and the reference data on the basis of the calculated feature quantity of the shift vector.
摘要翻译：模式匹配方法包括：通过对图案进行成像而获得的图案图像中的图案的边缘进行检测; 分割检测到的图案边缘以产生由第一段组成的第一段组; 在作为用于评估图案的基准的参考数据上分割图形边缘以生成由第二段组成的第二段集合; 将第一段组中的任何段与第二段集合中的任何段组合以限定由第一和第二段组成的段对; 计算定义的段对中每两个段对之间的兼容性系数; 通过基于所计算的兼容性系数计算定义的段对的局部一致性并排除具有较低本地一致性的段对来缩小定义的段对，来定义新的段对; 通过重复计算所述兼容性系数和通过缩小所述片段对来限定新的片段对来确定最佳片段对; 计算链接构成最佳段对的第一和第二段的移位向量的特征量; 并且基于所计算的移位矢量的特征量，在图案图像和参考数据之间执行位置匹配。

6. 发明授权

US08019149B2 Pattern shape evaluation method and pattern shape evaluation apparatus utilizing the same 有权
标题翻译：图案形状评价方法和利用该图案形状评价装置的图案形状评价装置
公开(公告)号：US08019149B2
公开(公告)日：2011-09-13
申请号：US12562173
申请日：2009-09-18
申请人： Hideaki Abe , Tadashi Mitsui
发明人： Hideaki Abe , Tadashi Mitsui
IPC分类号： G06K9/00 , G01N21/86
CPC分类号： G06K9/342 , G06K9/48
摘要： A pattern shape evaluation method for deciding whether a pair of patterns are disconnected or connected. The method includes extracting a plurality of pattern contour points that make up a contour of a pattern in a measurement region, and creating two pattern contour point sequences based on the plurality of pattern contour points. Each of the two pattern contour point sequences includes a set of the pattern contour points. In the pattern contour point sequence, each of distances between neighboring pattern contour points is equal to or smaller than a predetermined value. The method includes calculating an angle between a line passing through two of the pattern contour points which provide a shortest distance between the two pattern contour point sequences and a reference line arbitrarily defined with respect to the measurement region. The method further includes deciding whether the patterns are disconnected or connected, based on the angle.
摘要翻译：用于判断一对图案是断开连接还是连接的图案形状评估方法。该方法包括提取构成测量区域中的图案轮廓的多个图案轮廓点，并且基于多个图案轮廓点创建两个图案轮廓点序列。两个图案轮廓点序列中的每一个包括一组图案轮廓点。在图案轮廓点序列中，相邻图案轮廓点之间的距离中的每一个等于或小于预定值。该方法包括计算通过提供两个图案轮廓点序列之间的最短距离的两个图案轮廓点之间的线与相对于测量区域任意定义的参考线之间的角度。该方法还包括基于角度来决定图案是断开还是连接。

7. 发明授权

US07879309B2 Method for preparing functional nanomaterials utilizing endothermic reaction 失效
标题翻译：利用吸热反应制备功能性纳米材料的方法
公开(公告)号：US07879309B2
公开(公告)日：2011-02-01
申请号：US12716917
申请日：2010-03-03
申请人： Tadashi Mitsui , Takashi Sekiguchi , Mika Gamo , Yafei Zhang , Toshihiro Ando
发明人： Tadashi Mitsui , Takashi Sekiguchi , Mika Gamo , Yafei Zhang , Toshihiro Ando
IPC分类号： C09C1/56 , B01J19/08 , C01B31/02 , D01F9/12
CPC分类号： B82Y30/00 , B82Y40/00 , C01B21/064 , C01B32/152 , C01B32/162 , C01B32/174 , C01B32/956 , C01B2202/02 , C01B2202/06 , C01P2004/03 , C01P2004/13 , C01P2004/133 , Y10S977/736 , Y10S977/744 , Y10S977/843 , Y10S977/846
摘要： A method is disclosed whereby a functional nanomaterial such as a monolayer carbon nanotube, a monolayer boron nitride nanotube, a monolayer silicon carbide nanotube, a multilayer carbon nanotube with the number of layers controlled, a multilayer boron nitride nanotube with the number of layers controlled, a multilayer silicon carbide nanotube with the number of layers controlled, a metal containing fullerene, and a metal containing fullerene with the number of layers controlled is produced at a high yield. According to the method, when a multilayer carbon nanotube (3) is formed by a chemical vapor deposition or a liquid phase growth process, an endothermic reaction aid (H2S) is introduced in addition to a primary reactant (CH4, H2) in the process to form a monolayer carbon nanotube (4).
摘要翻译：公开了一种方法，其中功能纳米材料如单层碳纳米管，单层氮化硼纳米管，单层碳化硅纳米管，多层控制的多层碳纳米管，多层氮化硼纳米管的层数控制，以高产率制造具有控制层数的多层碳化硅纳米管，含有金属的富勒烯和含有控制层数的富勒烯金属。根据该方法，当通过化学气相沉积或液相生长工艺形成多层碳纳米管（3）时，除了主反应物（CH4，H2）之外还引入吸热反应助剂（H 2 S）形成单层碳纳米管（4）。

8. 发明授权

US07787687B2 Pattern shape evaluation apparatus, pattern shape evaluation method, method of manufacturing semiconductor device, and program 有权
标题翻译：图案形状评价装置，图案形状评价方法，半导体装置的制造方法以及程序
公开(公告)号：US07787687B2
公开(公告)日：2010-08-31
申请号：US11589057
申请日：2006-10-30
申请人： Yumiko Miyano , Tadashi Mitsui
发明人： Yumiko Miyano , Tadashi Mitsui
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06K9/32 , G06T2207/30148
摘要： A pattern shape evaluation method includes acquiring design data accompanied by an evaluation area in which information on a particular evaluation area within a pattern of a semiconductor device is added to the design data for the pattern, acquiring an image of the pattern, generating edge data for the pattern from the image of the pattern, aligning the design data accompanied by the evaluation area with the edge data and evaluating the shape of the pattern within the evaluation area after the alignment.
摘要翻译：图案形状评估方法包括获取伴随有评估区域的设计数据，其中将关于半导体器件的图案内的特定评估区域的信息添加到图案的设计数据中，获取图案的图像，生成边缘数据，来自图案的图案的图案，将伴随评估区域的设计数据与边缘数据对齐，并且在对准之后评估评估区域内的图案的形状。

9. 发明申请

US20100158389A1 Pattern evaluation method, pattern matching method and computer readable medium 失效
标题翻译：模式评估方法，模式匹配方法和计算机可读介质
公开(公告)号：US20100158389A1
公开(公告)日：2010-06-24
申请号：US12659294
申请日：2010-03-03
申请人： Tadashi Mitsui
发明人： Tadashi Mitsui
IPC分类号： G06K9/48
CPC分类号： G06T7/0004 , G03F7/7065 , G06K9/6202 , G06T2207/30148
摘要： A pattern evaluation method includes: generating first array data from edge data on a pattern to be evaluated, the edge data on the pattern to be evaluated being shape data including edge points of the pattern to be evaluated; generating second array data from edge data on a reference pattern, the edge data on the reference pattern including edge points of the reference pattern which serves as an inspection standard of the pattern to be evaluated; subjecting each component of the second array data to array conversion processing, the array conversion processing being designed to convert a value of the component of the second array data into a function value of a value of a distance from that component to the edge point closest thereto, thereby generating third array data; executing arithmetic processing between the first array data and the third array data to generate fourth array data; and using a component of the fourth array data to calculate a numerical value representative of an relation between the pattern to be evaluated and the reference pattern.
摘要翻译：图案评估方法包括：从要评估的图案上的边缘数据生成第一阵列数据，待评估的图案上的边缘数据是包括要评估的图案的边缘点的形状数据; 在参考图案上从边缘数据生成第二阵列数据，参考图案上的边缘数据包括用作待评估图案的检查标准的参考图案的边缘点; 对所述第二阵列数据的每个分量进行阵列转换处理，所述阵列转换处理被设计为将所述第二阵列数据的分量的值转换为距离所述分量至所述边缘点的距离的值的函数值从而产生第三阵列数据; 执行第一阵列数据和第三阵列数据之间的算术处理以产生第四阵列数据; 以及使用第四阵列数据的分量来计算表示要评估的图案与参考图案之间的关系的数值。

10. 发明授权

US06278114B1 Method and apparatus for measuring dimensions of a feature of a specimen 失效
标题翻译：用于测量样本特征尺寸的方法和装置
公开(公告)号：US06278114B1
公开(公告)日：2001-08-21
申请号：US09184074
申请日：1998-11-02
申请人： Tadashi Mitsui
发明人： Tadashi Mitsui
IPC分类号： H01J3726
CPC分类号： H01J37/28 , H01J2237/2814
摘要： An electron microscope for measuring a dimension of a feature of a specimen includes a focusing lens for focusing an electron beam onto the specimen and a supplying circuit for supplying an exciting current supplied to the focusing lens. A control circuit controls the supplying circuit to vary the exciting current which is supplied to the focusing lens and obtains dimension data of a feature of the specimen at each of the exciting currents which is supplied to the focusing lens. An actual dimension of the feature is determined based on the obtained dimension data. Further, a profile of the feature may be determined based on the changes observed in the dimension data.
摘要翻译：用于测量样本特征尺寸的电子显微镜包括：聚焦透镜，用于将电子束聚焦到样本上;以及供应电路，用于提供供给聚焦透镜的激励电流。控制电路控制供电电路来改变提供给聚焦透镜的激励电流，并且在提供给聚焦透镜的每个激励电流处获得样品特征的尺寸数据。基于获得的尺寸数据确定特征的实际尺寸。此外，可以基于在尺寸数据中观察到的变化来确定特征的轮廓。

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