会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明授权
    • Projection exposure apparatus and method
    • 投影曝光装置及方法
    • US06362926B1
    • 2002-03-26
    • US09721956
    • 2000-11-27
    • Yasuhiro OmuraYutaka IchiharaTetsuo Takahashi
    • Yasuhiro OmuraYutaka IchiharaTetsuo Takahashi
    • G02B1700
    • G02B17/0892G02B13/143G02B17/08G03F7/70225G03F7/70275G03F7/70808G03F7/70825G03F7/70833
    • The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member(M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.
    • 本发明涉及一种投影曝光装置(10),该投影曝光装置(10)用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版(R)成像到基板(W)上。 本发明还涉及一种具有适合于投影曝光装置的折叠构件(M1)的光学系统(C),以及用于制造光学系统的方法。 投影曝光装置包括能够保持标线的照明光学系统(IS)和光罩台(RS),使得其图案化表面的法线在重力方向上。 该装置还包括能够将其表面保持平行于重力方向的基板的基底台(WS)。 光学系统包括第一成像光学系统(A),其包括沿第一光轴布置的凹面反射镜和屈光光学构件。 第一成像光学系统(A)形成图案化表面的中间图像。 光学系统还包括具有第二光轴的第二成像光学系统(B),并且在基板上形成中间图像的缩小图像。 第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。 第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成,并且第一和第二光轴被定位成使得它们基本上 平行于重力方向。