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1. 发明授权

US06527966B1 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US06527966B1
公开(公告)日：2003-03-04
申请号：US09445346
申请日：2000-05-01
申请人： Koji Shimomura , Yoshiaki Kinoshita , Satoru Funato , Yuko Yamaguchi
发明人： Koji Shimomura , Yoshiaki Kinoshita , Satoru Funato , Yuko Yamaguchi
IPC分类号： B44C122
CPC分类号： G03F7/0045 , G03F7/091 , H01L21/0276 , H01L21/31138 , H01L21/32137 , H01L21/32139
摘要： A method of forming a pattern in which production of reaction products in the interface between an organic anti-reflective coating and a radiation sensitive material coating is suppressed, the number of residues of an etchable layer formed after etching is decreased, and which provides a etched pattern having high resolution and good dimensional accuracy. According to the method, an etchable layer (11) composed of polysilicon coating an organic anti-reflective coating (12), and a radiation sensitive material coating (13) composed of a chemically amplified resist material containing as acid generators both (a) onium salt compound and (b) at least one of a sulfone compound and a sulfonate compound are formed on a semiconductor substrate (10), the radiation sensitive material coating (13) is imagewise exposed through the mask (14) and developed to form a patterned radiation sensitive material coating (13b). Thereafter, preferably the anti-reflective coating is etched using a mixture gas of SO2 and O2, further the etchable layer is dry-etched to form a pattern of the etchable layer.
摘要翻译：形成在有机抗反射涂层和辐射敏感材料涂层之间的界面中反应产物的产生被抑制的图案的方法，蚀刻后形成的可蚀刻层的残留数量减少，并且提供蚀刻图案具有高分辨率和良好的尺寸精度。根据该方法，由多晶硅涂覆有机抗反射涂层（12）组成的可蚀刻层（11）和由化学放大抗蚀剂材料组成的辐射敏感材料涂层（13），所述抗蚀剂材料包含（a）盐化合物和（b）在半导体衬底（10）上形成砜化合物和磺酸盐化合物中的至少一种，将辐射敏感材料涂层（13）通过掩模（14）成像曝光并显影以形成图案化辐射敏感材料涂层（13b）。此后，优选地使用SO 2和O 2的混合气体来蚀刻抗反射涂层，此外，可蚀刻的层被干蚀刻以形成可蚀刻层的图案。

2. 发明授权

US06284427B1 Process for preparing resists 有权
标题翻译：抗蚀剂的制备方法
公开(公告)号：US06284427B1
公开(公告)日：2001-09-04
申请号：US09308582
申请日：1999-08-05
申请人： Hiroshi Okazaki , Georg Pawlowski , Satoru Funato , Yoshiaki Kinoshita , Yuko Yamaguchi
发明人： Hiroshi Okazaki , Georg Pawlowski , Satoru Funato , Yoshiaki Kinoshita , Yuko Yamaguchi
IPC分类号： G03C173
CPC分类号： G03F7/039 , C08F8/00 , C08F8/14 , C08F8/18 , C08F212/14 , C08F257/02 , C08F2800/20 , C08F2810/30 , C08L25/18 , C09D125/18 , G03F7/0045 , Y10S430/119 , C08F12/14 , C08F216/125 , C08F220/14 , C08F220/06 , C08F112/14
摘要： A resist composition is prepared by reacting an alkali-soluble polymer having a phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used in stead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a basic catalyst and adding a photoacid generator directly to the reaction. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction.
摘要翻译：抗蚀剂组合物通过使酸性催化剂存在下使非酚质子溶剂如丙二醇单甲醚乙酸酯中的具有酚羟基或羧基的碱溶性聚合物与乙烯基醚化合物反应来制备，加入碱，并将光致酸产生剂直接加入到反应溶液中。当使用二碳酸二烷基酯代替乙烯基醚化合物时，通过在碱性催化剂的存在下进行反应并直接向反应中加入光致酸产生剂制备抗蚀剂组合物。因此，可以在不分离或纯化已经被催化反应取代的碱溶性聚合物的情况下制备抗蚀剂组合物。

3. 发明授权

US06686121B2 Process for preparing resists 有权
标题翻译：抗蚀剂的制备方法
公开(公告)号：US06686121B2
公开(公告)日：2004-02-03
申请号：US09824198
申请日：2001-04-02
申请人： Hiroshi Okazaki , Georg Pawlowski , Satoru Funato , Yoshiaki Kinoshita , Yuko Yamaguchi
发明人： Hiroshi Okazaki , Georg Pawlowski , Satoru Funato , Yoshiaki Kinoshita , Yuko Yamaguchi
IPC分类号： G03C173
CPC分类号： G03F7/039 , C08F8/00 , C08F8/14 , C08F8/18 , C08F212/14 , C08F257/02 , C08F2800/20 , C08F2810/30 , C08L25/18 , C09D125/18 , G03F7/0045 , Y10S430/119 , C08F12/14 , C08F216/125 , C08F220/14 , C08F220/06 , C08F112/14
摘要： A resist composition is prepared by reacting an alkali-soluble polymer having a phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used in stead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a basic catalyst and adding a photoacid generator directly to the reaction. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction.
摘要翻译：抗蚀剂组合物通过使酸性催化剂存在下使非酚质子溶剂如丙二醇单甲醚乙酸酯中的具有酚羟基或羧基的碱溶性聚合物与乙烯基醚化合物反应来制备，加入碱，并将光致酸产生剂直接加入到反应溶液中。当使用二碳酸二烷基酯代替乙烯基醚化合物时，通过在碱性催化剂的存在下进行反应并直接向反应中加入光致酸产生剂制备抗蚀剂组合物。因此，可以在不分离或纯化已经被催化反应取代的碱溶性聚合物的情况下制备抗蚀剂组合物。

4. 发明授权

US06479210B2 Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US06479210B2
公开(公告)日：2002-11-12
申请号：US09445345
申请日：2000-04-03
申请人： Yoshiaki Kinoshita , Satoru Funato , Yuko Yamaguchi
发明人： Yoshiaki Kinoshita , Satoru Funato , Yuko Yamaguchi
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： A chemically amplified resist composition is disclosed which shows a high sensitivity, high resolution, excellent processing adaptability and excellent processing stability, which can form good pattern profile and which is suited as a finely processable material for use in manufacturing integrated circuit elements or the like. The chemically amplified resist composition comprises at least (a) an organic material containing a substituent or substituents capable of being released in the presence of an acid and (b) compounds capable of generating an acid upon exposure to radiation (acid-generators), composed of at least one onium salt and at least one of sulfone compounds and sulfonate compounds. This chemically amplified resist composition preferably further contains a basic compound.
摘要翻译：公开了一种化学放大抗蚀剂组合物，其显示出高灵敏度，高分辨率，优异的加工适应性和优异的加工稳定性，其可以形成良好的图案轮廓，并且适合作为用于制造集成电路元件等的精细加工材料。化学放大抗蚀剂组合物至少包含（a）含有取代基的有机材料或能够在酸存在下释放的取代基和（b）在暴露于辐射（酸 - 发生剂）时能够产生酸的化合物，的至少一种鎓盐和至少一种砜化合物和磺酸盐化合物。该化学放大抗蚀剂组合物优选还含有碱性化合物。

5. 发明授权

US5846690A Radiation-sensitive composition containing plasticizer 失效
标题翻译：含增塑剂的辐射敏感组合物
公开(公告)号：US5846690A
公开(公告)日：1998-12-08
申请号：US615831
申请日：1996-03-14
申请人： Munirathna Padmanaban , Yoshiaki Kinoshita , Hiroshi Okazaki , Seiya Masuda , Natsumi Kawasaki , Satoru Funato , Georg Pawlowski
发明人： Munirathna Padmanaban , Yoshiaki Kinoshita , Hiroshi Okazaki , Seiya Masuda , Natsumi Kawasaki , Satoru Funato , Georg Pawlowski
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03F7/038 , G03F7/30
CPC分类号： G03F7/0045
摘要： A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor composed of (b1) a poly(N,O-acetal) having a general formula: ##STR1## wherein R.sup.3 is alkyl or substituted or unsubstituted aryl, R.sup.4 is a divalent group selected from alkylene, cycloalkylene, alkene or alkyne, R.sup.5 is alkyl, alkene, alkyne or cycloalkyl, X is --OCO--, --CO-- or --NHCO--, and p is a number not less than 1, and/or (b2) a phenol compound having a hydroxyl group which is protected by a group which can be cleaved in the presence of an acid, (c) a photosensitive compound capable of generating an acid when exposed to an active radiation, (d) a base capable of being decomposed when exposed to an active radiation to form a neutral compound derived therefrom, (e) a plasticizer, and (f) a solvent.
摘要翻译：公开了一种辐射敏感性组合物，其包括（a）不溶于水但可溶于或能够在碱性水溶液中溶胀或能够溶胀的粘合剂，（b）由（b1）聚（N，O-缩醛））具有以下通式：其中R 3是烷基或取代或未取代的芳基，R 4是选自亚烷基，亚环烷基，烯烃或炔烃的二价基团，R 5是烷基，烯烃，炔烃或环烷基，X是-OCO-， -CO-或-NHCO-，p为不小于1的数，和/或（b2）具有羟基的酚化合物，该羟基被酸可以被可被切割的基团保护，（c ）当暴露于活性辐射时能够产生酸的光敏化合物，（d）当暴露于活性辐射时能够分解以形成由其衍生的中性化合物的碱，（e）增塑剂，和（f）溶剂。

6. 发明授权

US5773191A Radiation-sensitive composition 失效
标题翻译：辐射敏感组合物
公开(公告)号：US5773191A
公开(公告)日：1998-06-30
申请号：US685850
申请日：1996-07-24
申请人： Munirathna Padmanaban , Yoshiaki Kinoshita , Satoru Funato , Natsumi Kawasaki , Hiroshi Okazaki , Georg Pawlowski
发明人： Munirathna Padmanaban , Yoshiaki Kinoshita , Satoru Funato , Natsumi Kawasaki , Hiroshi Okazaki , Georg Pawlowski
IPC分类号： G03F7/00 , G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , H01L21/027 , G03F7/032 , G03F7/30
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/11
摘要： A radiation-sensitive composition is disclosed which includes: (a) a copolymer represented by the general formula: ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group, Ar is a substituted or unsubstituted phenylene group or a substituted or unsubstituted cyclohexylene group, X is a divalent group represented by --SO.sub.2 -- or --CO--, m and n are individually an integer not less than 1; (b) a dissolution inhibitor composed of a compound represented by the general formula: ##STR2## wherein R.sup.3 is an alkyl group or a substituted or unsubstituted aryl group, R.sup.4 is an alkylene group, a cycloalkylene group, an alkenylene group or an alkynylene group, R.sup.5 is an alkyl group or an cycloalkyl group, Y is --OCO--, --CO-- or --NHCO--, and p is an integer not less than 1, or (b') a cross-linking agent; (c) a photosensitive compound capable of generating an acid when exposed to a radiation; and (e) a solvent.
摘要翻译：公开了一种辐射敏感性组合物，其包括：（a）由以下通式表示的共聚物：其中R 1为氢原子或甲基，R 2为取代或未取代的烷基或取代或未取代的芳基 Ar为取代或未取代的亚苯基或取代或未取代的亚环己基，X为-SO 2 - 或-CO-表示的二价基，m和n分别为1以上的整数，（b）由以下通式表示的化合物组成的溶解抑制剂：其中R3为烷基或取代或未取代的芳基，R4为亚烷基，亚环烷基，亚烯基或亚炔基，R5是烷基或环烷基，Y是-OCO-，-CO-或-NHCO-，p是不小于1的整数，或（b'）交联剂; （c）当暴露于辐射时能够产生酸的光敏化合物; 和（e）溶剂。

7. 发明授权

US5852128A Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials 失效
标题翻译：酸不稳定基团保护的羟基苯乙烯聚合物或其共聚物及其在辐射敏感材料上的应用
公开(公告)号：US5852128A
公开(公告)日：1998-12-22
申请号：US922321
申请日：1997-09-03
申请人： Munirathna Padmanaban , Georg Pawlowski , Yoshiaki Kinoshita , Hiroshi Okazaki , Seiya Masuda , Satoru Funato , Tetsu Yamamoto
发明人： Munirathna Padmanaban , Georg Pawlowski , Yoshiaki Kinoshita , Hiroshi Okazaki , Seiya Masuda , Satoru Funato , Tetsu Yamamoto
IPC分类号： C09D125/18 , C08F8/00 , C08F212/14 , C08F8/14
CPC分类号： C08F8/00 , C08F12/22 , C08F8/30 , C08F8/34 , C08F212/14
摘要： Acid-labile group protected hydroxystyrene polymers having recurrent pendant groups such as 1-(2-methanecarbonyl oxyethoxy)ethoxy group and 1-(2-N-methylcarbamatoethoxy) ethoxy group. A resist containing the polymer, a photo acid generator, a base, additives and a solvent is sensitive to UV, electron beam and X-ray. In the resist, acid is formed in the exposed area during irradiation, which deprotects acid-labile group catalytically during application of post-exposure baking. Positive patterns are formed after development using an alkaline solution.
摘要翻译：酸不稳定基团保护具有复发性侧基的羟基苯乙烯聚合物，例如1-（2-甲羰基氧基乙氧基）乙氧基和1-（2-N-甲基氨基甲酰基乙氧基）乙氧基。含有聚合物，光酸产生剂，碱，添加剂和溶剂的抗蚀剂对UV，电子束和X射线敏感。在抗蚀剂中，在照射期间在曝光区域形成酸，在施加曝光后烘烤时，催化剂对酸不稳定基团进行脱保护。使用碱性溶液在显影后形成阳性图案。

8. 发明授权

US5738972A Radiation sensitive composition 失效
标题翻译：辐射敏感组合物
公开(公告)号：US5738972A
公开(公告)日：1998-04-14
申请号：US864375
申请日：1997-05-28
申请人： Munirathna Padmanaban , Natsumi Suehiro , Yoshiaki Kinoshita , Satoru Funato , Seiya Masuda , Hiroshi Okazaki , Georg Pawlowski
发明人： Munirathna Padmanaban , Natsumi Suehiro , Yoshiaki Kinoshita , Satoru Funato , Seiya Masuda , Hiroshi Okazaki , Georg Pawlowski
IPC分类号： G03F7/00 , G03F7/004 , G03F7/033 , G03F7/039 , G03F7/085 , H01L21/027 , G03F7/38
CPC分类号： G03F7/0045 , Y10S430/106
摘要： A chemically amplified resist material comprising: a) a homopolymer or a copolymer of hydroxystyrene or hydroxystyrene partly protected by a group sensitive to an acid such as a tetrahydropyranyl or t-butoxycarbonyl group, b) a dissolution inhibitor such as poly(N,O-acetal) or phenol or bisphenol protected by a group cleavable with an acid, c) a photosensitive compound capable of generating an acid upon exposure, d) a base capable of degrading upon radiation to regulate the line width in a period between the exposure step and the processing steps after exposure, e) a low-molecular weight phenolic or polyphenolic compound having a structure represented by the following general formula or a mixture of the phenolic or polyphenolic compounds: ##STR1## where n is an integer of 1 to 5, m is an integer of 0 to 4, n+m.ltoreq.5, and p is an integer of 1 to 10, each R is a C.sub.1 -C.sub.12 alkyl group or an unsubstituted or substituted cycloalkyl group or a C.sub.1 -C.sub.5 hydroxyalkyl group, provided that hydrogen atoms may be substituted with a halogen atom and, when m is not less than 2, each R may be the same or different; A represents a hydrocarbon atomic grouping, having a valence of p, including an unsubstituted or substituted C.sub.1 -C.sub.100 alicyclic, chain aliphatic, or aromatic hydrocarbon or a combination thereof with the carbon atoms being optionally substituted with an oxygen atom, provided that when p is 1, A may represent a hydrogen atom and, when p is 2, A may represent --S--, --SO--, --SO.sub.2 --, --O--, --CO--, or a direct bond, and f) a solvent for dissolving the components a) to e).
摘要翻译：一种化学放大抗蚀剂材料，包括：a）部分由对酸如四氢吡喃基或叔丁氧基羰基敏感的基团部分保护的羟基苯乙烯或羟基苯乙烯的均聚物或共聚物，b）溶解抑制剂如聚（N，乙缩醛）或苯酚或双酚被被一个酸可裂解的基团保护，c）一种能够在暴露时产生酸的感光性化合物，d）能够在辐射下降解以在曝光步骤和曝光后的处理步骤，e）具有由以下通式表示的结构的低分子量酚或多酚化合物或酚类或多酚化合物的混合物：n为0〜4的整数，n + m = 5 ，p为1〜10的整数，R为C1-C12烷基或未取代或取代的环烷基或C1-C5羟烷基，条件是氢原子可被卤素原子取代， en不小于2，每个R可以相同或不同; A表示具有p价的烃原子团，包括未取代或取代的C1-C100脂环族，链脂族或芳族烃或其任选被氧原子取代的碳原子的组合，条件是当p为 1中，A可以表示氢原子，当p为2时，A可以表示-S-，-SO-，-SO2-，-O-，-CO-或直接键，f）溶解溶剂组件a）至e）。

9. 发明授权

US6110639A Radiation-sensitive composition and recording medium using the same 失效
标题翻译：辐射敏感组合物和使用其的记录介质
公开(公告)号：US6110639A
公开(公告)日：2000-08-29
申请号：US860451
申请日：1997-06-26
申请人： Seiya Masuda , Satoru Funato , Natsumi Kawasaki
发明人： Seiya Masuda , Satoru Funato , Natsumi Kawasaki
IPC分类号： G03F7/004 , G03F7/038
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/121
摘要： A radiation-sensitive composition comprising:an acid-generating compound capable of generating an acid upon exposure to radiation and represented by the formula (I): ##STR1## wherein X, Y and R.sup.1 to R.sup.5 have the following meanings: X and Y: independently a direct bond, C.sub.1 -C.sub.8 alkylene, C.sub.1 -C.sub.4 alkene, --O--R.sup.11 --O-- (wherein R.sup.11 is an alkylene group having 1 to 4 carbon atoms), --NH--, --O--, --S--, --SO.sub.2 --, --CO--, --COO-- or --CONR.sup.12 -- (wherein R.sup.12 is a hydrogen atom, C.sub.1 -C.sub.8 alkyl, alkylaryl, halogenated alkyl, halogenated aryl, a halogen atom, alkoxy, phenoxy, alkylsulfonyl-oxy, halogenated alkylsulfonyl-oxy, or substituted or unsubstituted arylsulfonyl-oxy);R.sup.1 to R.sup.4 : a hydrogen atom, C.sub.1 -C.sub.18 alkyl, aryl, hetero-aryl, a halogen atom, alkyl-substituted or aryl-substituted amino, alkyl-substituted or aryl-substituted amido, nitro, cyano, aldehyde, acetal, alkoxy, phenoxy, alkylsulfonyl-oxy, or substituted or unsubstituted arylsulfonyl-oxy;R.sup.5 : a hydrogen atom, alkyl, aryl, halogenated alkyl, halogenated aryl, halogenated hetero-aryl, alkylsulfonyl-oxy, halogenated alkylsulfonyl-oxy, or substituted or unsubstituted arylsulfonyl-oxy;a water-insoluble but aqueous alkaline solution-soluble binder; anda cross-linking compound capable of reacting with said binder in the presence of said acid to cause the binder to be cross-linked. Further, a radiation-sensitive recording medium can be obtained by forming a layer made of the radiation-sensitive composition on a substrate.
摘要翻译： PCT No.PCT / JP95 / 02764 Sec。 371日期：1997年6月26日 102（e）日期1997年6月26日PCT 1995年12月28日PCT PCT。出版物WO96 / 20432 日期：1996年7月4日一种辐射敏感性组合物，其包含：在暴露于辐射后能够产生酸并由式（I）表示的产酸化合物：其中X，Y和R 1至R 5具有以下含义：X和 Y：独立地是直接键合，C1-C8亚烷基，C1-C4链烯基，-O-R11-O-（其中R11是具有1-4个碳原子的亚烷基），-NH-，-O - ， - S-， -SO 2 - ， - CO - ， - COO-或-CONR 12 - （其中R 12是氢原子，C 1 -C 8烷基，烷基芳基，卤代烷基，卤代芳基，卤素原子，烷氧基，苯氧基，烷基磺酰基 - 氧基，卤代烷基磺酰基 - 氧基或取代或未取代的芳基磺酰基 - 氧基）; R1至R4：氢原子，C1-C18烷基，芳基，杂芳基，卤素原子，烷基取代或芳基取代的氨基，烷基取代或芳基取代的酰氨基，硝基，氰基，醛，缩醛，烷氧基，苯氧基，烷基磺酰基氧基或取代或未取代的芳基磺酰基 - 氧基; R5：氢原子，烷基，芳基，卤代烷基，卤代芳基，卤代杂芳基，烷基磺酰基氧基，卤代烷基磺酰基氧基或取代或未取代的芳基磺酰基氧基; 水不溶性但碱性溶液水溶性粘合剂; 和能够在所述酸存在下与所述粘合剂反应以使粘合剂交联的交联化合物。此外，通过在基板上形成由辐射敏感性组合物制成的层，可以获得辐射敏感记录介质。

10. 发明授权

US5383050A Organic nonlinear optical material 失效
标题翻译：有机非线性光学材料
公开(公告)号：US5383050A
公开(公告)日：1995-01-17
申请号：US132040
申请日：1993-10-05
申请人： Hironobu Yamamoto , Robert Johnson , Satoru Funato
发明人： Hironobu Yamamoto , Robert Johnson , Satoru Funato
IPC分类号： G02F1/35 , C07C45/81 , G02F1/355 , G02F1/361
CPC分类号： G02F1/3613 , C07C45/81 , G02F1/361 , G02F1/3611
摘要： The compounds 4-chloro-4'-hydroxybenzophenone, methyl 3,4-diaminobenzoate, N-(4-aminobenzenesulfonyl)-acetamide, methyl 4-hydroxy-3,5-dimethoxybenzoate, 2-chloro-4-cyano-6-methylaniline, 4'-hydroxy-2-phenylacetophenone and methyl 3,4-dihydroxybenzoate form high quality crystals with high melting point. They are useful for second order non-linear optical process devices such as wavelength conversion devices.
摘要翻译：化合物4-氯-4'-羟基二苯甲酮，3,4-二氨基苯甲酸甲酯，N-（4-氨基苯磺酰基） - 乙酰胺，4-羟基-3,5-二甲氧基苯甲酸甲酯，2-氯-4-氰基-6-甲基苯胺，4'-羟基-2-苯基苯乙酮和3,4-二羟基苯甲酸甲酯形成高品质的具有高熔点的晶体。它们对于诸如波长转换装置的二阶非线性光学工艺装置是有用的。

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