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    • 1. 发明授权
    • Field emission display with diode-type field emitters
    • 具有二极管型场发射器的场发射显示
    • US06307323B1
    • 2001-10-23
    • US09474528
    • 1999-12-29
    • Yoon Ho SongJin Ho LeeSeung Youl KangKyoung Ik Cho
    • Yoon Ho SongJin Ho LeeSeung Youl KangKyoung Ik Cho
    • G05G310
    • B82Y10/00G09G3/22H01J31/126H01J2201/30457H01J2201/30469H01J2201/319
    • A field emission display in which field emission devices are applied to a flat panel display. A field emission display with diode-type field emitters includes an upper plate and a lower plate, the upper plate and the lower plate are vacuum-packaged in parallel. The lower plate includes a plurality of column signal buses and a plurality of row signal buses, film type field emitters, and switching devices. The column signal buses and the row signal buses are made of metallic material. Pixels are defined by the column signal buses and the row signal buses. A film type field emitter and a switching device are formed inside each pixel. The switching device controls the field emitter on the basis of scan signals and data signals. The scan signals and data signals are loaded to the switching devices through the column signal buses and the row signal buses. The switching device includes at least three electrodes for connection with the column signal bus, the row signal bus, and the field emitter.
    • 场发射装置用于平板显示器的场致发射显示器。 具有二极管型场致发射体的场发射显示器包括上板和下板,上板和下板被并联真空包装。 下板包括多个列信号总线和多个行信号总线,薄膜型场发射器和开关装置。 列信号总线和行信号总线由金属材料制成。 像素由列信号总线和行信号总线定义。 在每个像素内部形成有膜型场发射器和开关器件。 开关装置根据扫描信号和数据信号控制场发射器。 扫描信号和数据信号通过列信号总线和行信号总线加载到开关装置。 开关装置包括用于与列信号总线,行信号总线和场发射器连接的至少三个电极。
    • 3. 发明授权
    • Field emission display device
    • 场致发射显示装置
    • US06204608B1
    • 2001-03-20
    • US09442486
    • 1999-11-18
    • Yoon Ho SongJin Ho LeeSeung Youl KangSung Yool ChoiKyoung Ik Cho
    • Yoon Ho SongJin Ho LeeSeung Youl KangSung Yool ChoiKyoung Ik Cho
    • G09G330
    • G09G3/22G09G2300/0842
    • A field emission display device is disclosed. The device comprises an upper plate and a lower plate that are vacuum-packaged in parallel, wherein the lower plate is composed of matrix-addressable pixels, wherein the pixel formed on an insulation substrate comprises a field emitter array, a control thin-film transistor having a drain connected to an emitter electrode of the emitter array, and an addressing thin-film transistor having a drain connected to a gate electrode of the control thin-film transistor. Designing the control thin-film transistor to have a large parasitic capacitance between the source and the gate, one can obtain an active matrix display having a memory function and eliminate a conventional complex fabricating process of a memory capacitor, thereby simplify a panel fabricating process remarkably and largely increase the aperture ratio of a pixel. Furthermore, in the present invention, introducing glass for a substrate material instead of conventional single crystal silicon wafer, one can cheaply produce a large size panel and easily carry out a vacuum packaging that is indispensable for fabricating a field emission display.
    • 公开了一种场致发射显示装置。 该装置包括平行真空包装的上板和下板,其中下板由可矩阵寻址的像素组成,其中形成在绝缘基板上的像素包括场致发射阵列,控制薄膜晶体管 具有连接到发射极阵列的发射极的漏极,以及具有连接到控制薄膜晶体管的栅电极的漏极的寻址薄膜晶体管。 将控制薄膜晶体管设计成在源极和栅极之间具有大的寄生电容,可以获得具有存储功能的有源矩阵显示器,并消除了存储电容器的常规复杂制造工艺,从而显着地简化了面板制造工艺 并大大提高像素的开口率。 此外,在本发明中,为了代替传统的单晶硅晶片引入用于基板材料的玻璃,可以廉价地生产大尺寸面板,并且容易地实现对于制造场致发射显示器而言不可或缺的真空包装。
    • 7. 发明授权
    • Method of manufacturing a vacuum device
    • 制造真空装置的方法
    • US5953580A
    • 1999-09-14
    • US925197
    • 1997-09-08
    • Sung Weon KangJin Ho LeeKyoung Ik ChoHyung Joun Yoo
    • Sung Weon KangJin Ho LeeKyoung Ik ChoHyung Joun Yoo
    • H01L21/205H01J9/02H01L20/100
    • H01J9/025
    • A method of manufacturing a vacuum device utilizing a sputtering process is disclosed. According to the present invention, the vacuum device includes a silicon substrate. An emission electrode having a sharp ended tip is formed by etching the silicon substrate. An insulating layer is formed on the silicon substrate so as to make the entire structure of the emission electrode to be exposed, with the emission electrode being surrounded by the insulating layer. A gate electrode is then formed adjacent to the sharp ended tip of the emission electrode. According to the present invention, it has advantages that the emission electrode is manufactured by forming the silicon pillar using the isotropic etching and anisotropic etching and the gate electrode can be easily formed adjacent to the emission electrode by using the sputtering method after the gate insulating layer is formed. Further, the distance between the emission electrode and the gate electrode may be easily adjusted, and the vacuum device may be operated with the desired voltage by controlling the distance between the emission electrode and the gate electrode of the vacuum device.
    • 公开了一种使用溅射工艺制造真空装置的方法。 根据本发明,真空装置包括硅基板。 通过蚀刻硅衬底形成具有尖端的尖端的发射电极。 在硅衬底上形成绝缘层,以使发射电极的整个结构被暴露,发射电极被绝缘层包围。 然后在发射电极的尖端处形成栅电极。 根据本发明,具有通过使用各向同性蚀刻和各向异性蚀刻形成硅柱来制造发射电极的优点,并且通过在栅绝缘层之后使用溅射法容易地在栅极电极附近形成栅电极 形成了。 此外,可以容易地调节发射电极和栅电极之间的距离,并且可以通过控制发射电极和真空装置的栅电极之间的距离,以期望的电压来操作真空装置。