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    • 3. 发明授权
    • Methods and arrangement for utilization rate display
    • 利用率显示的方法和布置
    • US07903576B2
    • 2011-03-08
    • US11835233
    • 2007-08-07
    • Eldad MatityahuRobert ShawDennis Angelo Ramirez CarpioKy Hong LeDong Su Lee
    • Eldad MatityahuRobert ShawDennis Angelo Ramirez CarpioKy Hong LeDong Su Lee
    • H04J1/16
    • H04L43/045H04L41/0213H04L43/0876H04L43/12
    • An arrangement in a network device for displaying statistical data pertaining to data traffic that traverses the network device is provided. The arrangement includes a power supply arrangement for providing power to circuitry of the network device. The arrangement also includes a set of network ports, which includes a set of input network ports for receiving the data traffic and a set of output network ports for outputting the data traffic from the network device. The arrangement further includes logic arrangement for analyzing data traffic and for displaying statistical data pertaining to the data traffic. The arrangement yet also includes a visual display arrangement, which is configured to display the statistical data, whereas the data traffic is configured to traverse the network device between the set of input network ports and the set of output network ports irrespective whether power is provided to the circuitry of the network device.
    • 提供了一种用于显示有关跨越网络设备的数据业务的统计数据的网络设备中的布置。 该装置包括用于向网络设备的电路提供电力的电源装置。 该装置还包括一组网络端口,其包括用于接收数据业务的一组输入网络端口和用于从网络设备输出数据业务的一组输出网络端口。 该装置还包括用于分析数据业务并显示与数据业务相关的统计数据的逻辑装置。 该配置还包括视觉显示装置,其被配置为显示统计数据,而数据业务被配置为遍历所述一组输入网络端口和所述一组输出网络端口之间的网络设备,而不管是否提供电力 网络设备的电路。
    • 7. 发明申请
    • METHODS AND ARRANGEMENT FOR UTILIZATION RATE DISPLAY
    • 利用率显示的方法和布置
    • US20090040932A1
    • 2009-02-12
    • US11835233
    • 2007-08-07
    • Eldad MatityahuRobert ShawDennis Angelo Ramirez CarpioKy Hong LeDong Su Lee
    • Eldad MatityahuRobert ShawDennis Angelo Ramirez CarpioKy Hong LeDong Su Lee
    • G06F11/00
    • H04L43/045H04L41/0213H04L43/0876H04L43/12
    • An arrangement in a network device for displaying statistical data pertaining to data traffic that traverses the network device is provided. The arrangement includes a power supply arrangement for providing power to circuitry of the network device. The arrangement also includes a set of network ports, which includes a set of input network ports for receiving the data traffic and a set of output network ports for outputting the data traffic from the network device. The arrangement further includes logic arrangement for analyzing data traffic and for displaying statistical data pertaining to the data traffic. The arrangement yet also includes a visual display arrangement, which is configured to display the statistical data, whereas the data traffic is configured to traverse the network device between the set of input network ports and the set of output network ports irrespective whether power is provided to the circuitry of the network device.
    • 提供了一种用于显示有关跨越网络设备的数据业务的统计数据的网络设备中的布置。 该装置包括用于向网络设备的电路提供电力的电源装置。 该装置还包括一组网络端口,其包括用于接收数据业务的一组输入网络端口和用于从网络设备输出数据业务的一组输出网络端口。 该装置还包括用于分析数据业务并显示与数据业务相关的统计数据的逻辑装置。 该配置还包括视觉显示装置,其被配置为显示统计数据,而数据业务被配置为遍历所述一组输入网络端口和所述一组输出网络端口之间的网络设备,而不管是否提供电力 网络设备的电路。
    • 10. 发明授权
    • Method for depositing a platinum layer on a silicon wafer
    • 在硅晶片上沉积铂层的方法
    • US5981390A
    • 1999-11-09
    • US914397
    • 1997-08-19
    • Dong Su LeeDong il ChunDong Yeon ParkJo Woong HaEui Joon YoonMin Hong KimHyun Jung Woo
    • Dong Su LeeDong il ChunDong Yeon ParkJo Woong HaEui Joon YoonMin Hong KimHyun Jung Woo
    • H01L21/285H01L21/203H01L21/28H01L21/288H01L21/316H01L21/3205H01L41/08H01L41/09H01L21/283H01L21/477
    • C23C14/5806C23C14/14H01L21/32051
    • The present invention relates to a method of depositing a platinum thin-film on a silicon wafer. The method includes the steps of depositing a platinum layer on an insulating oxide layer under an oxidation atmosphere to form a mixture film consisted of platinum grains, platinum oxide grains and oxygen adhered to those grains (hereinafter, "the mixture film" to be referred as "oxygen containing platinum thin-film"); depositing an additional platinum thin-film to a desired thickness on the oxygen containing platinum thin-film under a complete inert atmosphere; and annealing the silicon substrate at a temperature of 400 to 1,300.degree. C. in order to remove oxygen present in the independent form or in platinum oxide form within the oxygen containing platinum thin-film and to stabilize the entire platinum thin-film. The oxygen containing platinum thin-film layer serves as a glue layer during the depositing step of additional platinum thin-film layer and is converted into pure platinum condition after the annealing step, whereby the silicon substrate substantially does not have any glue layer between the platinum layer and the insulating layer of the silicon substrate.
    • 本发明涉及在硅晶片上沉积铂薄膜的方法。 该方法包括以下步骤:在氧化气氛下在绝缘氧化物层上沉积铂层,形成由铂颗粒,氧化铂颗粒和附着在这些晶粒上的氧构成的混合膜(以下将“混合膜”称为 “含氧铂金薄膜”); 在完全惰性气氛下在含氧铂薄膜上沉积另外的铂薄膜至所需厚度; 并在400〜1300℃的温度下退火硅衬底,以便除去含氧铂金薄膜中独立形式或氧化铂形式存在的氧并稳定整个铂薄膜。 含铂的铂薄膜层在附加的铂薄膜层的沉积步骤中用作胶层,并且在退火步骤之后转化为纯铂状态,由此硅衬底在铂之间基本上不具有任何胶层 层和硅衬底的绝缘层。