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    • 1. 发明授权
    • Apparatus and method for thin film deposition
    • 用于薄膜沉积的装置和方法
    • US08092598B2
    • 2012-01-10
    • US10559944
    • 2005-07-20
    • Yong-Ku BaekSeung-Hoon Lee
    • Yong-Ku BaekSeung-Hoon Lee
    • C23C16/00
    • C23C16/45551C23C16/4412C23C16/45574C23C16/45589C23C16/509C30B25/14H01J2237/332
    • Disclosed herein is a thin film deposition apparatus having a reaction chamber for forming a thin film on a plurality of substrates rested on a susceptor. The apparatus comprises: a gas supply means for supplying a plurality of gases to the inside of the reaction chamber from the outside, the gases including a reaction gas; a gas distribution means for distributing and spraying the gases supplied from the gas supply means so as to conform to the purpose of a process; a gas retaining means having a plurality of reaction cells for partitionally accommodating and retaining the respective gases distributed from the gas distribution means; a rotation driving means for rotating the gas retaining means such that the gases retained in the respective reaction cells are exposed to the substrates in sequence; and a gas exhaust means for pumping the gases retained by the gas retaining means to the outside of the reaction chamber.
    • 本文公开了一种薄膜沉积设备,其具有用于在搁置在基座上的多个基板上形成薄膜的反应室。 该装置包括:从外部向反应室内部供给多个气体的气体供给装置,所述气体包括反应气体; 气体分配装置,用于分配和喷射从气体供应装置供应的气体以符合工艺的目的; 气体保持装置,具有多个用于部分地容纳和保持从气体分配装置分配的各种气体的反应池; 旋转驱动装置,用于旋转气体保持装置,使得保留在各个反应池中的气体依次暴露于基板; 以及用于将由气体保持装置保留的气体泵送到反应室外部的排气装置。
    • 2. 发明申请
    • Apparatus and method for thin film deposition
    • 用于薄膜沉积的装置和方法
    • US20070095286A1
    • 2007-05-03
    • US10559944
    • 2005-07-20
    • Yong-Ku BaekSeung-Hoon Lee
    • Yong-Ku BaekSeung-Hoon Lee
    • C23C16/00
    • C23C16/45551C23C16/4412C23C16/45574C23C16/45589C23C16/509C30B25/14H01J2237/332
    • Disclosed herein is a thin film deposition apparatus having a reaction chamber for forming a thin film on a plurality of substrates rested on a susceptor. The apparatus comprises: a gas supply means for supplying a plurality of gases to the inside of the reaction chamber from the outside, the gases including a reaction gas; a gas distribution means for distributing and spraying the gases supplied from the gas supply means so as to conform to the purpose of a process; a gas retaining means having a plurality of reaction cells for partitionally accommodating and retaining the respective gases distributed from the gas distribution means; a rotation driving means for rotating the gas retaining means such that the gases retained in the respective reaction cells are exposed to the substrates in sequence; and a gas exhaust means for pumping the gases retained by the gas retaining means to the outside of the reaction chamber.
    • 本文公开了一种薄膜沉积设备,其具有用于在搁置在基座上的多个基板上形成薄膜的反应室。 该装置包括:从外部向反应室内部供给多个气体的气体供给装置,所述气体包括反应气体; 气体分配装置,用于分配和喷射从气体供应装置供应的气体以符合工艺的目的; 气体保持装置,具有多个用于部分地容纳和保持从气体分配装置分配的各种气体的反应池; 旋转驱动装置,用于旋转气体保持装置,使得保留在各个反应池中的气体依次暴露于基板; 以及用于将由气体保持装置保留的气体泵送到反应室外部的排气装置。