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1. 发明授权

US10415135B2 Thin film formation method and thin film formation apparatus 有权
公开(公告)号：US10415135B2
公开(公告)日：2019-09-17
申请号：US13704568
申请日：2011-06-13
申请人： Yohei Hinata , Kyokuyo Sai , Yoshiyuki Otaki , Ichiro Shiono , Yousong Jiang
发明人： Yohei Hinata , Kyokuyo Sai , Yoshiyuki Otaki , Ichiro Shiono , Yousong Jiang
IPC分类号： C23C14/54 , C23C14/34 , C23C14/50 , G02B5/28
摘要： A thin film formation method is provided, by which needless film formation due to trial film formation is omitted and film formation efficiency can be improved. This invention is a method for sputtering targets to form a film A having an intended film thickness of T1 as the first thin film on a substrate and monitor substrate held and rotated by a rotation drum and, subsequently, furthermore sputtering the targets used in forming the film A to form a film C having an intended film thickness of T3 as the second thin film, which is another thin film having the same composition as the film A; comprising film thickness monitoring steps S4 and S5, a stopping step S7, an actual time acquisition step S8, an actual rate calculating step S9 and a necessary time calculating step S24.

2. 发明申请

US20130081942A1 Thin Film Formation Method and Thin Film Formation Apparatus 有权
标题翻译：薄膜形成方法和薄膜形成装置
公开(公告)号：US20130081942A1
公开(公告)日：2013-04-04
申请号：US13704568
申请日：2011-06-13
申请人： Yohei Hinata , Kyokuyo Sai , Yoshiyuki Otaki , Ichiro Shiono , Yousong Jiang
发明人： Yohei Hinata , Kyokuyo Sai , Yoshiyuki Otaki , Ichiro Shiono , Yousong Jiang
IPC分类号： C23C14/54
CPC分类号： C23C14/545 , C23C14/3464 , C23C14/3492 , C23C14/505 , C23C14/54 , C23C14/547 , G02B5/28
摘要： A thin film formation method is provided, by which needless film formation due to trial film formation is omitted and film formation efficiency can be improved. This invention is a method for sputtering targets to form a film A having an intended film thickness of T1 as the first thin film on a substrate and monitor substrate held and rotated by a rotation drum and, subsequently, furthermore sputtering the targets used in forming the film A to form a film C having an intended film thickness of T3 as the second thin film, which is another thin film having the same composition as the film A; comprising film thickness monitoring steps S4 and S5, a stopping step S7, an actual time acquisition step S8, an actual rate calculating step S9 and a necessary time calculating step S24.
摘要翻译：提供了一种薄膜形成方法，由此省略了由于试制成膜而形成的不必要的成膜，并且可以提高成膜效率。本发明是一种用于溅射靶材以形成具有预定的膜厚度T1作为第一薄膜的薄膜A的方法，该基材和由旋转滚筒保持和旋转的监测基板，随后进一步溅射形成膜A形成具有期望的膜厚度T3的膜C作为第二薄膜，其是具有与膜A相同组成的另一薄膜; 包括膜厚监测步骤S4和S5，停止步骤S7，实际时间获取步骤S8，实际速率计算步骤S9和必要时间计算步骤S24。

3. 发明授权

US08625111B2 Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter 有权
标题翻译：光学薄膜厚度计和薄膜成型设备配有光学薄膜厚度计
公开(公告)号：US08625111B2
公开(公告)日：2014-01-07
申请号：US13381032
申请日：2010-06-29
申请人： Kyokuyo Sai , Yohei Hinata , Yoshiyuki Otaki , Yousong Jiang
发明人： Kyokuyo Sai , Yohei Hinata , Yoshiyuki Otaki , Yousong Jiang
IPC分类号： G01B11/28
CPC分类号： G01B11/06 , C23C14/34 , C23C14/547 , G01B11/0625
摘要： An optical film thickness meter capable of measuring an optical film thickness and spectroscopic characteristics highly accurately, and a thin film forming apparatus with the optical film thickness meter are provided. The optical film thickness meter includes a light projector, a light receiver, a monochromator, and a reflection mirror having a reflection surface substantially perpendicularly to the optical axis of measurement light on the side opposite to an actual substrate. The actual substrate is disposed having a predetermined angle to the optical axis. The measurement light passes through the actual substrate twice, whereby a change in transmissivity can be increased, and control accuracy of thickness measurement is improved. Measurement errors caused by a difference in transmission positions is prevented. Since the measurement light which has not passed through the measurement substrate twice is not detected by the light receiver, the optical film thickness and spectroscopic characteristics is measured highly accurately.
摘要翻译：提供了能够高精度地测量光学膜厚度和光谱特性的光学膜厚计，以及具有该光学膜厚计的薄膜形成装置。光学薄膜厚度计包括光投射器，光接收器，单色仪和具有与实际基板相对的一侧上的大致垂直于测量光的光轴的反射表面的反射镜。实际的基板设置成与光轴成预定的角度。测量光通过实际基板两次，从而可以提高透射率的变化，并提高厚度测量的控制精度。防止由传输位置差异引起的测量误差。由于没有通过测量基板两次的测量光不被光接收器检测到，因此高精度地测量光学膜厚度和光谱特性。

4. 发明申请

US20120105872A1 OPTICAL FILM THICKNESS METER AND THIN FILM FORMING APPARATUS PROVIDED WITH OPTICAL FILM THICKNESS METER 有权
标题翻译：光学薄膜厚度计和薄膜形成装置的光学薄膜厚度计
公开(公告)号：US20120105872A1
公开(公告)日：2012-05-03
申请号：US13381032
申请日：2010-06-29
申请人： Kyokuyo Sai , Yohei Hinata , Yoshiyuki Otaki , Yousong Jiang
发明人： Kyokuyo Sai , Yohei Hinata , Yoshiyuki Otaki , Yousong Jiang
IPC分类号： G01B11/28
CPC分类号： G01B11/06 , C23C14/34 , C23C14/547 , G01B11/0625
摘要： An optical film thickness meter capable of measurement of an optical film thickness and spectroscopic characteristics with high accuracy and a thin film forming apparatus provided with the optical film thickness meter are provided. The optical film thickness meter includes a light projector (11), a reflection mirror (17), a light receiver (19), and a monochromator (20), and the reflection mirror (17) has a reflection surface disposed substantially perpendicularly to the optical axis of measurement light on the side opposite to an actual substrate (S) with respect to an incident direction of the measurement light. Also, the actual substrate (9) is disposed having a predetermined inclination angle (α) with respect to the optical axis of the measurement light. The measurement light (outgoing light and reflection light) passes through the actual substrate (S) twice, whereby a change amount in transmissivity (light amount) can be increased, and control accuracy of film thickness measurement can be improved. Also, occurrence of a measurement error caused by a difference in transmission positions can be prevented, and since the measurement light which has not passed through the measurement substrate twice along a predetermined path is no longer detected on the light receiver (19) side, the optical film thickness and spectroscopic characteristics can be measured with high accuracy.
摘要翻译：提供了能够高精度地测量光学膜厚度和光谱特性以及设置有光学膜厚计的薄膜形成装置的光学膜厚计。光学薄膜厚度计包括光投影仪（11），反射镜（17），光接收器（19）和单色仪（20），反射镜（17）具有基本垂直于相对于测量光的入射方向与实际基板（S）相反的一侧的测量光的光轴。此外，实际的基板（9）相对于测量光的光轴具有预定的倾斜角（α）。测量光（出射光和反射光）通过实际基板（S）两次，从而可以提高透射率（光量）的变化量，并且可以提高膜厚测量的控制精度。此外，可以防止由于发送位置的差异而引起的测量误差的发生，并且由于在光接收器（19）侧不再检测未沿着预定路径通过测量基板的测量光两次，可以高精度地测量光学膜厚度和光谱特性。

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