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    • 1. 发明授权
    • Hybrid bump capacitor
    • 混合电容器
    • US08384226B2
    • 2013-02-26
    • US12885722
    • 2010-09-20
    • Yikui (Jen) DongSteven L. HowardFreeman Y. ZhongDavid S. Lowrie
    • Yikui (Jen) DongSteven L. HowardFreeman Y. ZhongDavid S. Lowrie
    • H01L23/48H01L27/108H01L21/00
    • H01G4/228H01G4/30H01L23/5223H01L2924/0002H01L2924/3011H01L2924/00
    • A device fabricated on a chip is disclosed. The device generally includes (A) a first pattern and a second pattern both created in an intermediate conductive layer of the chip, (B) at least one via created in an insulating layer above the intermediate conductive layer and (C) a first bump created in a top conductive layer above the insulating layer. The first pattern generally establishes a first of a plurality of plates of a first capacitor. The via may be aligned with the second pattern. The first bump may (i) be located directly above the first plate, (ii) establish a second of the plates of the first capacitor, (iii) be suitable for flip-chip bonding, (iv) connect to the second pattern through the via such that both of the plates of the first capacitor are accessible in the intermediate conductive layer. The first pattern and the second pattern may be shaped as interlocking combs.
    • 公开了一种在芯片上制造的器件。 该装置通常包括(A)在芯片的中间导电层中产生的第一图案和第二图案,(B)在中间导电层上方的绝缘层中形成的至少一个通孔,(C)产生的第一凸起 在绝缘层上方的顶部导电层中。 第一图案通常建立第一电容器的多个板中的第一个。 通孔可以与第二图案对准。 第一凸块可以(i)位于第一板的正上方,(ii)建立第一电容器的第二板,(iii)适于倒装芯片接合,(iv)通过 通过使得第一电容器的两个板可在中间导电层中接近。 第一图案和第二图案可以被成形为互锁梳。
    • 2. 发明授权
    • Hybrid bump capacitor
    • 混合电容器
    • US07825522B2
    • 2010-11-02
    • US11741195
    • 2007-04-27
    • Yikui (Jen) DongSteven L. HowardFreeman Y. ZhongDavid S. Lowrie
    • Yikui (Jen) DongSteven L. HowardFreeman Y. ZhongDavid S. Lowrie
    • H01L23/48H01L27/108
    • H01G4/228H01G4/30H01L23/5223H01L2924/0002H01L2924/3011H01L2924/00
    • A device fabricated on a chip is disclosed. The device generally includes (A) a first pattern and a second pattern both created in an intermediate conductive layer of the chip, (B) at least one via created in an insulating layer above the intermediate conductive layer and (C) a first bump created in a top conductive layer above the insulating layer. The first pattern generally establishes a first of a plurality of plates of a first capacitor. The via may be aligned with the second pattern. The first bump may (i) be located directly above the first plate, (ii) establish a second of the plates of the first capacitor, (iii) be suitable for flip-chip bonding and (iv) connect to the second pattern through the via such that both of the plates of the first capacitor are accessible in the intermediate conductive layer.
    • 公开了一种在芯片上制造的器件。 该装置通常包括(A)在芯片的中间导电层中产生的第一图案和第二图案,(B)在中间导电层上方的绝缘层中形成的至少一个通孔,(C)产生的第一凸起 在绝缘层上方的顶部导电层中。 第一图案通常建立第一电容器的多个板中的第一个。 通孔可以与第二图案对准。 第一凸块可以(i)位于第一板的正上方,(ii)建立第一电容器的第二板,(iii)适于倒装芯片接合,以及(iv)通过 通过使得第一电容器的两个板可在中间导电层中接近。
    • 3. 发明申请
    • HYBRID BUMP CAPACITOR
    • 混合电容器
    • US20110006395A1
    • 2011-01-13
    • US12885722
    • 2010-09-20
    • Yikui (Jen) DongSteven L. HowardFreeman Y. ZhongDavid S. Lowrie
    • Yikui (Jen) DongSteven L. HowardFreeman Y. ZhongDavid S. Lowrie
    • H01L29/92H01L21/02
    • H01G4/228H01G4/30H01L23/5223H01L2924/0002H01L2924/3011H01L2924/00
    • A device fabricated on a chip is disclosed. The device generally includes (A) a first pattern and a second pattern both created in an intermediate conductive layer of the chip, (B) at least one via created in an insulating layer above the intermediate conductive layer and (C) a first bump created in a top conductive layer above the insulating layer. The first pattern generally establishes a first of a plurality of plates of a first capacitor. The via may be aligned with the second pattern. The first bump may (i) be located directly above the first plate, (ii) establish a second of the plates of the first capacitor, (iii) be suitable for flip-chip bonding, (iv) connect to the second pattern through the via such that both of the plates of the first capacitor are accessible in the intermediate conductive layer. The first pattern and the second pattern may be shaped as interlocking combs.
    • 公开了一种在芯片上制造的器件。 该装置通常包括(A)在芯片的中间导电层中产生的第一图案和第二图案,(B)在中间导电层上方的绝缘层中形成的至少一个通孔,(C)产生的第一凸起 在绝缘层上方的顶部导电层中。 第一图案通常建立第一电容器的多个板中的第一个。 通孔可以与第二图案对准。 第一凸块可以(i)位于第一板的正上方,(ii)建立第一电容器的第二板,(iii)适于倒装芯片接合,(iv)通过 通过使得第一电容器的两个板可在中间导电层中接近。 第一图案和第二图案可以被成形为互锁梳。