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1. 发明授权

US08795477B2 Methods of making, and, analyte sensor 有权
标题翻译：制作方法和分析物传感器
公开(公告)号：US08795477B2
公开(公告)日：2014-08-05
申请号：US12907345
申请日：2010-10-19
申请人： Yi Wang , Timothy P. Henning , Edmund T. Marciniec
发明人： Yi Wang , Timothy P. Henning , Edmund T. Marciniec
IPC分类号： C23C14/34
CPC分类号： C23C14/3464 , C23C14/0694 , C23C14/205 , H01M4/8885 , Y02E60/50
摘要： The subject invention provides conductive stripes, suitable for use as electrodes, and methods of making conductive stripes.
摘要翻译：本发明提供适合用作电极的导电条纹，以及制造导电条纹的方法。

2. 发明申请

US20110031110A1 Methods of Making, and, Analyte Sensor 有权
标题翻译：制作方法和分析物传感器
公开(公告)号：US20110031110A1
公开(公告)日：2011-02-10
申请号：US12907345
申请日：2010-10-19
申请人： Yi Wang , Timothy P. Henning , Edmund T. Marciniec
发明人： Yi Wang , Timothy P. Henning , Edmund T. Marciniec
IPC分类号： C23C14/14 , C23C14/34
CPC分类号： C23C14/3464 , C23C14/0694 , C23C14/205 , H01M4/8885 , Y02E60/50
摘要： The subject invention provides conductive stripes, suitable for use as electrodes, and methods of making conductive stripes.
摘要翻译：本发明提供适合用作电极的导电条纹，以及制造导电条纹的方法。

3. 发明授权

US3982976A Method of evaluating the cleanliness of silicon wafers 失效
标题翻译：评估硅片清洁度的方法
公开(公告)号：US3982976A
公开(公告)日：1976-09-28
申请号：US530637
申请日：1974-12-09
申请人： Edmund T. Marciniec
发明人： Edmund T. Marciniec
IPC分类号： H01L21/306 , H01L21/3065 , H01L7/50
CPC分类号： H01L21/02046 , H01L21/3065
摘要： The cleanliness of silicon wafers is evaluated. At various stages of I.C. manufacture, silicon wafers may contain undesirable inorganic and organic contaminants and residues, the presence of which may be due to initial growing and slicing or to subsequent manufacturing steps such as the removal of photoresists. The present method involves differential etching of the silicon wafers. In a manner that removes silicon at a much faster rate than the contaminants and residues are removed. The differential etching is effected by subjecting the wafers to a low pressure, low temperature, RF, reactive plasma which includes a halocarbon gas, and oxygen for a time sufficient to texture the wafer. The differential etching continues at least until the onset of texturing which replicates the pattern of contaminants or residues initially present thereon for visual inspection.
摘要翻译：评估硅片的清洁度。在I.C.的各个阶段硅晶片可能含有不需要的无机和有机污染物和残留物，其存在可能是由于初始生长和切片或其后的制备步骤，如去除光致抗蚀剂。本方法包括硅晶片的差分蚀刻。以一种以比污染物快得多的速度除去硅的方式，残留物被去除。微差蚀刻通过使晶片经受包括卤代烃气体在内的低压，低温，RF反应等离子体和氧气足以使晶片纹理化而实现。差异蚀刻至少持续到纹理的开始，复制了最初存在于其上的污染物或残留物的图案以用于目视检查。

4. 发明授权

US5520787A Diagnostic flow cell device 失效
标题翻译：诊断流通池装置
公开(公告)号：US5520787A
公开(公告)日：1996-05-28
申请号：US400412
申请日：1995-03-03
申请人： Ted J. Hanagan , Lance K. Safford , Steven G. Schultz , Jay R. Ford , Edmund T. Marciniec , Kenneth S. Johnson , John D. Norlie, Jr.
发明人： Ted J. Hanagan , Lance K. Safford , Steven G. Schultz , Jay R. Ford , Edmund T. Marciniec , Kenneth S. Johnson , John D. Norlie, Jr.
IPC分类号： G01N33/48 , B01L3/00 , C12Q1/00 , G01N21/05 , G01N27/416 , G01N33/483 , G01N33/52 , G01N27/26
CPC分类号： B01L3/5027 , C12Q1/001 , B01L2200/0689 , B01L2300/0636 , B01L2300/0645 , B01L2300/0654 , B01L2300/0816 , B01L2300/0877 , B01L2300/0887 , B01L2400/0406 , B01L3/502707 , Y10S435/817
摘要： The present invention provides a diagnostic flow cell for determining the presence or amount of an analyte which may be contained in a test sample. The flow cell comprises a spacing layer having a longitudinal void disposed between a pair of opposed substrates. The spacing layer and the opposed substrates define a flow channel wherein reagent means can be immobilized. When the immobilized reagent means is contacted with an analyte, the reagent means can produce an electrically, optically, or electrically and optically detectable response to the analyte. Hence, the reagent means that is immobilized within the flow channel can comprise (i) a counter electrode, a reference electrode and a working electrode, (ii) an optically sensitive dye or (iii) a counter electrode, a reference electrode and a working electrode and an optically sensitive dye. The flow cell can be interfaced with means for introducing a test sample into and out of the flow cell's flow channel and detection means for detecting a signal generated by the immobilized reagent means.The present invention also provides methods for detecting the presence or amount of an analyte which may be contained in a test sample.
摘要翻译：本发明提供了一种用于确定可能包含在测试样品中的分析物的存在或量的诊断流动池。流动池包括具有设置在一对相对基板之间的纵向空隙的间隔层。间隔层和相对的基底限定了流动通道，其中试剂装置可以被固定。当固定的试剂装置与分析物接触时，试剂装置可以产生对分析物的电学，光学或电学和光学上可检测的响应。因此，固定在流路内的试剂装置可以包括（i）对电极，参比电极和工作电极，（ii）光敏染料或（iii）对电极，参比电极和工作电极和光敏染料。流动池可以与用于将测试样品引入和流出流动池的流动通道的装置接口，以及用于检测由固定化试剂装置产生的信号的检测装置。本发明还提供了用于检测可能包含在测试样品中的分析物的存在或量的方法。

5. 发明授权

US4298786A Thin film thermal print head 失效
标题翻译：薄膜热敏打印头
公开(公告)号：US4298786A
公开(公告)日：1981-11-03
申请号：US81003
申请日：1979-10-01
申请人： Edmund T. Marciniec
发明人： Edmund T. Marciniec
IPC分类号： B41J2/335 , G03F7/00 , H05K3/10 , H05B3/16
CPC分类号： B41J2/3351 , B41J2/33515 , B41J2/3353 , B41J2/33535 , B41J2/3355 , B41J2/3357 , B41J2/3359 , G03F7/00 , H05K3/107 , Y10T29/49083 , Y10T29/49099
摘要： A dielectric substrate for a thin film dot matrix thermal print head has its working surface etched or otherwise treated for selective removal of the dielectric material in all areas that are to constitute electrical connectors for the resistance heater print elements, to a depth approximately equal to the sum of the thicknesses of all of the conductive films to be applied to the substrate surface in those areas, following which the working surface of the substrate is selectively coated with films of high-resistance electrically conductive material and low-resistance conductive material, with suitable adhesion films as required, to complete the operating elements of the print head. An outer protective wear-resistant film may also be employed on the entire print head surface or on only the electrical connector areas. The print head has its resistance heater print elements and its blank spaces all raised to approximately the same level as the outer surfaces of the electrical connectors affording improved performance and longer operating life; the etching of the substrate is effected by a process that leaves positive transition slopes to assure effective electrical connections to the print elements.
摘要翻译：用于薄膜点阵热敏打印头的电介质衬底具有蚀刻或其它处理的工作表面，用于选择性地去除构成用于电阻加热器打印元件的电连接器的所有区域中的电介质材料，其深度大致等于在这些区域中施加到基板表面的所有导电膜的厚度之和，随后基板的工作表面选择性地涂覆有高电阻导电材料和低电阻导电材料的膜，具有合适的粘贴膜根据需要，完成打印头的操作元件。外部保护性耐磨膜也可以用于整个打印头表面或仅在电连接器区域上。打印头具有其电阻加热器打印元件，并且其空白空间均与电连接器的外表面升高到大致相同的水平，提供改进的性能和更长的使用寿命; 衬底的蚀刻通过留下正转移斜率以确保与印刷元件的有效电连接的过程来实现。

6. 发明授权

US4206541A Method of manufacturing thin film thermal print heads 失效
标题翻译：制造薄膜热敏打印头的方法
公开(公告)号：US4206541A
公开(公告)日：1980-06-10
申请号：US918845
申请日：1978-06-26
申请人： Edmund T. Marciniec
发明人： Edmund T. Marciniec
IPC分类号： B41J2/335 , G03F7/00 , H05K3/10 , H05B3/16
CPC分类号： B41J2/3351 , B41J2/33515 , B41J2/3353 , B41J2/33535 , B41J2/3355 , B41J2/3357 , B41J2/3359 , G03F7/00 , H05K3/107 , Y10T29/49083 , Y10T29/49099
摘要： A dielectric substrate for a thin film dot matrix thermal print head has its working surface etched or otherwise treated to selectively remove the dielectric material, in all areas which will constitute electrical connectors for the resistance heater print elements, to a depth at least equal to the sum of the thicknesses of all of the conductive films to be applied to the substrate surface in those areas, following which the working surface of the substrate is selectively coated with films of high-resistance electrically conductive material and low-resistance conductive material, with suitable adhesion films as required, to complete the print head. An outer protective wear-resistant film is also employed. The resultant print head has its resistance heater print elements and blank surface elements raised at least to the same level as the outer surfaces of the electrical connectors, and preferably slightly higher, to provide improved performance and operating life.
摘要翻译：用于薄膜点阵热敏打印头的电介质基底具有蚀刻或以其它方式处理的工作表面，以在将构成电阻加热器印刷元件的电连接器的所有区域中选择性地去除介电材料至至少等于在这些区域中施加到基板表面的所有导电膜的厚度之和，随后基板的工作表面选择性地涂覆有高电阻导电材料和低电阻导电材料的膜，具有合适的粘贴膜根据需要，完成打印头。还采用外部保护性耐磨膜。所得的打印头具有其电阻加热器打印元件和空白表面元件至少升高到与电连接器的外表面相同的水平面，并且优选略高，以提供改进的性能和使用寿命。

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