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    • 9. 发明授权
    • Method of continuously forming a large area functional deposited film by
microwave PCVD and apparatus for the same
    • 通过微波PCVD连续形成大面积功能沉积膜的方法及其设备
    • US5397395A
    • 1995-03-14
    • US295487
    • 1994-08-25
    • Masafumi SanoMasahiro Kanai
    • Masafumi SanoMasahiro Kanai
    • H01L21/205C23C16/50C23C16/511C23C16/54H01L31/04C23C16/48
    • C23C16/511C23C16/545
    • A method and apparatus for forming a large area functional deposited film by a microwave PCVD method by continuously moving an elongated member in its lengthwise direction, and forming a columnar film-forming chamber the side wall of which is an intermediate portion of the moving elongated member. A deposited film forming raw material gas is introduced into the film-forming space via a gas supply device. Microwave plasma in the film-forming space is generated by radiating microwave energy from a microwave applicator while continuously, at the same time as that of the introduction of the raw material gas, moving a movable sheet made of a dielectric material which is positioned in contact with a microwave introduction opening and the surface of the microwave introduction opening. A deposited film can then be formed on the surface of the elongated member which constitutes the side wall and which is being continuously moved, the side wall constituted by the elongated member being exposed to the microwave plasma.
    • 一种通过微波PCVD法形成大面积功能沉积膜的方法和装置,其通过在长度方向连续移动细长构件,并形成柱状成膜室,其侧壁是移动细长构件的中间部分 。 沉积的成膜原料气体经由气体供给装置引入成膜空间。 在成膜空间中的微波等离子体通过从微波施加器发射微波能量而产生,同时连续地引入原料气体的微波等离子体,移动由接触位置的介电材料制成的可动片材 微波引入开口和微波引入开口的表面。 然后可以在构成侧壁并被连续移动的细长构件的表面上形成沉积膜,由细长构件构成的侧壁暴露于微波等离子体。