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    • 10. 发明申请
    • MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
    • 测量装置,曝光装置和装置制造方法
    • US20100112733A1
    • 2010-05-06
    • US12580875
    • 2009-10-16
    • Yasunori Furukawa
    • Yasunori Furukawa
    • H01L21/66G01B9/02H01L21/26
    • G03F7/706G01M11/0264G01M11/0271
    • A measuring device configured to measure a wave aberration of an optical system to be measured includes a reflection optical element for reflecting light, having passed through a mask and the optical system to be measured, into the optical system to be measured, and a detector for detecting an interference fringe of light having passed through pinholes and openings. The mask has at least three pinhole-opening pairs, each including one pinhole and one opening having a larger diameter than the pinhole that are arranged point-symmetrically, the three pinhole-opening pairs having the common center of symmetry. The light to be measured formed in two of the three pairs is made to interfere with the reference light formed in the remaining pair, or, the light to be measured formed in one of the three pairs is made to interfere with the reference light formed in the other two pairs.
    • 被配置为测量待测光学系统的波像差的测量装置包括用于将已经通过掩模和待测量的光学系统的光反射到待测量的光学系统中的反射光学元件,以及用于 检测穿过针孔和开口的光的干涉条纹。 掩模具有至少三个针孔开口对,每个针孔开口对包括一个针孔和一个开口,其具有比针对对称布置的针孔更大的直径,三个针孔开口对具有共同的对称中心。 使被测量的光被形成为三对中的两对,使得与剩下的一对中形成的基准光干涉,或者使三对中的一个中形成的被测量的光与第一对中形成的基准光干涉 另外两对。